N-type diamond-doped field effect transistor with field plate structure
A field effect transistor, diamond technology, applied in semiconductor devices, electrical components, circuits, etc., can solve problems such as hard breakdown of electrode edges, and achieve the effects of increasing breakdown voltage, increasing withstand voltage characteristics, and eliminating electric field concentration.
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[0028] The present invention will be described in detail below with reference to the drawings and specific embodiments.
[0029] The invention discloses a field effect transistor with an n-type doped diamond field plate structure, such as figure 1 As shown, it includes a diamond substrate 1. On the diamond substrate 1, a mesa 3 formed by an n-type doped single crystal diamond epitaxial film 2 is laid. On the mesa 3, two strip-shaped dielectric layers 4 are laid along each dielectric layer. Drain 6 and source 5 are laid on the outer edges of 4 and mesa 3, and a gate 7 is laid between two dielectric layers 4. The dielectric layer 4, drain 6, source 5 and gate 7 form a field plate Structure, source 5, drain 6 and gate 7 are respectively deposited with active extraction electrode 9, drain extraction electrode 10 and gate extraction electrode 11, the source extraction electrode 9, drain extraction electrode 10 and gate extraction electrode 11 pass blunt The layers 8 are completely sep...
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