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236results about How to "Improve withstand voltage characteristics" patented technology

Method for preventing short-circuit failure of high-voltage aluminum-electrolyzing capacitor for switching power supply

The invention discloses a method for preventing the short-circuit failure of a high-voltage aluminum-electrolyzing capacitor for a switching power supply, which comprises an optimizing step for an aging working procedure and a step for improving the flash-fire voltage of an electrolyte, wherein the optimizing step for the aging working procedure comprises the following substeps of: in the aging process of a product, aging by adopting a segmented voltage-raising mode, prolonging the aging time step by step after entering a high-voltage stage, and raising the highest aging voltage to be 1.5 times of the working voltage of the capacitor to improve the strength of continuously restoring a dielectric film by the electrolyte; and the step for improving the flash-fire voltage of the electrolyte comprises the following substeps of: adopting a non-water-system electrolyte to decrease the concentration of hydroxyl ions and reduce the generation of oxygen-ion discharge. By optimizing an aging process, the insulating performance of the dielectric film is improved, and the pressure-resisting characteristic of the product is improved; by optimizing electrolyte components, the flash-fire voltage of the electrolyte is improved, and flash-fire breakdown is prevented from occurring when the voltage is excessive; and by optimizing electrolytic paper, the short circuit of the product due to the breakage of the electrolytic paper is prevented.
Owner:ZHAOQING BERYL ELECTRONICS TECH

Multistreaming high-precision rotary ring type flow sensor and working method thereof

The invention relates to a multistreaming high-precision rotary ring type flow sensor which comprises a flow meter shell, a flow meter top cover, an upper impeller shell component, an impeller component, a lower impeller shell component, a filter screen, a diversion component, an external measuring room and an inner measuring room, wherein a fluid flows into from the water inlet of the flow meter shell, changes direction along the slope of the diversion component to flow upwards, then flows through the fan-shaped hole of the filter screen to the external measuring room, enters into the wedge-shaped water inlet of the upper impeller shell component along the diagonal line direction, enters into the inner measuring room through the wedge-shaped water inlet, and forms multiple streams so as to uniformly push the impeller component to rotate; and at the same time, the fluid changes the movement direction to move downwards into the center hole of the filter screen, then flows out from the water outlet of the flow meter shell through the center hole of the diversion component. In the invention, the multistreaming principle is utilized, so that the momentary rotation speed of an impeller can correspond to the momentary flow speed of the fluid flowing through the measuring rooms more truly, and the flow characteristic of a flow meter is improved, and the flow measurement accuracy, repeatability and reproducibility and stability are improved.
Owner:陈沛

Schottky diode and manufacturing method thereof

The invention discloses a Schottky diode and a manufacturing method thereof. The Schottky diode comprises a substrate, a buffer layer, an extension structure, a Schottky contact metal and an Ohmic contact metal, wherein the substrate the buffer layer and the extension structure are sequentially arranged in an overlapped structure; the extension structure comprises a super bonding layer, a GaN channel layer and a barrier layer which are sequentially stacked, and the super bonding layer is composed of a plurality of p-type GaN layer and a plurality of n-type GaN layer which are alternately stacked each other; the Schottky contact metal and the Ohmic contact metal are symmetrically arranged on the opposite two side surfaces of the extension structure, one ends of the Schottky contact metal and the Ohmic contact metal extend to the upper surface of the extension structure, and the other ends of the Schottky contact metal and the Ohmic contact metal extend to the buffer layer. The Schottky diode has relatively high pressure resistance, ensures current transmission capacity and stability and avoids a traditional field plate structure or protecting ring structure, thereby simplifying the manufacturing process and reducing the cost.
Owner:FIFTH ELECTRONICS RES INST OF MINIST OF IND & INFORMATION TECH

Terminal protection structure of super junction device and manufacturing method of terminal protection structure

The invention discloses a terminal protection structure of a super junction device, which adopts a combined structure of a polycrystalline silicon field plate and a metal field plate. One polycrystalline silicon field plate covers a footstep structure of a terminal medium membrane and the polycrystalline silicon field plate is further covered by two medium layers with different thicknesses, so that an electric field on the surface of the device can be alleviated. In the invention, a P-type ring with a higher concentration is kept under the field plate so that a current processing capability of the device is improved when the device is used in an inductive circuit. According to the invention, the structure configuration of a P-type column and an N-type column in the terminal protection structure can assure that the device is turned off when the device is applied to the inductive circuit and the position of generating avalanche-like breakdown in the terminal protection structure is ensured to be close to the front side of a silicon sheet when a current overshoot happens, so that the capability of resisting the overshoot current is improved. The invention further discloses the terminal protection structure of the super junction device and a manufacturing method of the terminal protection structure. According to the terminal protection structure of the super junction device, provided by the invention, the voltage endurance, the current processing capability and the reliability of the device can be improved and the process cost is not increased.
Owner:SHANGHAI HUAHONG GRACE SEMICON MFG CORP

Highly thermally conductive resin cured product, highly thermally conductive semi-cured resin film, method of manufacturing same, and highly thermally conductive resin composition

The invention provides a high-thermal conductivity resin cured product, a resin film and a resin composition with cured production with excellent thermal conductivity and voltage resistance. The high-thermal conductivity resin cured product comprises resin material of (A) component and filler of (B) component. The filler of the (B) component, with respect to its total mass, comprises: i) by mass, 15%-25% of small-grain size filler with the average grain size D50 ranging from 0.1 [mu]m to less than 1.0 [mu]m; ii) by mass, 15%-25% of middle-grain size filler with the average grain size D50 ranging from 3 [mu]m-20[mu]m; and iii) by mass, 50%-70% of large-grain size filler with the average grain size D50 ranging from 30 [mu]m-60[mu]m. Moreover, the greatest grain size of the filler is in the range of 30% to 70% with respect to the film thickness of the cured product, the average grain size of the large-grain size filler is in the range of 18% to 35% with respect to the film thickness of the cured product, and the content of the filler is in the range of 70vo1% to 90vol% of the integral composition.
Owner:NIPPON STEEL CHEMICAL CO LTD
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