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A method for precise fabrication of nanopores

A manufacturing method and nanopore technology, which are applied in the fields of nanostructure manufacturing, nanotechnology, nanotechnology, etc., can solve the problems of inability to precisely locate, difficult to accurately control the electron beam nanopore, and uncertainty of use parameters, and achieve application Wide range, precise manufacturing, simple and efficient manufacturing methods

Active Publication Date: 2020-01-17
GUANGDONG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, due to the different types of ion beams and the uncertainty of the parameters used, it is difficult to precisely control the electron beams and ion beams to form nanopores with the required apertures, and it is impossible to precisely position them.

Method used

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  • A method for precise fabrication of nanopores
  • A method for precise fabrication of nanopores
  • A method for precise fabrication of nanopores

Examples

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Embodiment 1

[0042] A method for the precise fabrication of nanopores, such as Figure 1~5 shown, including the following steps:

[0043] (1) Provide a glass capillary;

[0044] (2) Shrink one end of the glass capillary;

[0045] (3) Connect the nanopore manufacturing device;

[0046] (4) Apply voltage at both ends of the chip, and stop applying voltage immediately when the nanopore reaches the expected pore size;

[0047] (5) Clean the chip and dry it;

[0048] The nanopore structure of this embodiment and its manufacturing method will be described in detail below in conjunction with specific drawings.

[0049] First perform step (1), providing a glass capillary 1, such as figure 2 shown. The cross-sectional shape of the glass capillary 1 is circular; the cross-sectional diameter of the glass capillary 1 is 500 nm.

[0050] Then perform step (2), shrink one end of the glass capillary 1, such as image 3shown. The contraction method is: electron beam contraction, the electron bea...

Embodiment 2

[0055] This embodiment is the second embodiment of the nanopore precise manufacturing method of the present invention. The difference from Embodiment 1 is that the voltage of the electron beam is 0.5 kV, the current of the electron beam is 0.5 µA, the continuous scanning time is 500 s, and the scanning area 20 µm×20 µm, the vertical distance from the objective lens to the highest point of the sample is 2 mm, the scanning speed is 0.01 s, and the diameter of one end of the glass capillary 1 after contraction is 500 nm; the applied voltage is: 0.1 V;

[0056] Other steps and operations are the same as in Example 1.

Embodiment 3

[0058] This embodiment is the second embodiment of the nanopore precise manufacturing method of the present invention. The difference from Embodiment 1 is that the voltage of the electron beam is 20 kV, the current of the electron beam is 50 µA, the continuous scanning time is 5 s, and the scanning area is 10 µm×10 µm, the vertical distance from the objective lens to the highest point of the sample is 15 mm, the scanning speed is 30 s, and the diameter of one end of the glass capillary 1 after contraction is 50 nm; the applied voltage is: 30 V;

[0059] Other steps and operations are the same as in Example 1.

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Abstract

The invention discloses a precise manufacturing method of nanopores. The precise manufacturing method is characterized by including the steps of S1, shrinking one end of a glass capillary tube to a certain aperture; S2, placing the shrunk end of the glass capillary tube to one side of a chip's membrane and close to the membrane, wherein the other side of the membrane is contact with an electrolytesolution, and the electrolyte solution is added into the glass capillary tube; S3, applying voltage to two sides of the membrane through the electrolyte solution in the glass capillary tube and the electrolyte solution on the other side of the membrane, and stopping voltage applying when the nanopores reach the expected pore size. With the method, the nanopores can be prepared in a silicon nitride membrane, a silicon oxide membrane and other nanometer or micro level single membranes or multilayer composite membranes, precise positioning of the nanopores and precise manufacturing of the nanopores with required aperture can be realized, and the manufacturing method is simple and efficient and wide in application range and has wide application and practical value in DNA sequencing and earlydetection of cancer.

Description

technical field [0001] The invention relates to the technical field of nano-processing, and more particularly, to a method for precisely manufacturing nanopores. Background technique [0002] According to the constituent materials of nanopores, nanopore technology can be roughly divided into two categories. One is a "biological nanopore" related to biological materials, and the other is a "solid-state nanopore" related to semiconductor materials. The most common DNA sequencing method used jointly by biological nanopores and solid-state nanopores is to detect changes in the current passing through the nanopore during DNA transport and identify four types of nucleotides from the changes in the current. Because the structural differences of each nucleotide molecule are small, in order to extract the current changes produced by the four types of nucleotides, the diameter of the nanopore must be on the same order of magnitude as that of DNA. In addition, in order to spatially d...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B82B3/00B82Y40/00C12Q1/6869
Inventor 袁志山雷鑫王成勇
Owner GUANGDONG UNIV OF TECH
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