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Metal target used for electrochromic glass and preparation method and application method thereof

A technology of electrochromic glass and metal targets, applied in metal material coating process, ion implantation plating, coating, etc., can solve problems such as inapplicability to large-scale production, affecting production efficiency, slow discoloration speed, etc., to achieve Fast film forming speed, high production efficiency and simple production

Active Publication Date: 2019-05-31
上海博译金属有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] In the prior art, the ITO film is usually used as the first transparent conductive layer and the second transparent conductive layer, the metal lithium ion film is used as the ion conductor layer, the tungsten oxide is used as the ion storage layer, and the nickel oxide ion film is used as the electrochromic layer. Because both the tungsten oxide target and the nickel oxide target are metal oxides, they are ceramic targets. In the process of making targets, these two metal oxides are hard and brittle, and are not easy to process, and metal oxide ceramic targets During the coating process of the material, the film forming speed is slow and the discoloration speed is slow, which affects the production efficiency and cannot be applied to large-scale production.

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  • Metal target used for electrochromic glass and preparation method and application method thereof
  • Metal target used for electrochromic glass and preparation method and application method thereof

Examples

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Effect test

Embodiment 1

[0038] Example 1: A metal target for electrochromic glass, including a first metal target and a second metal target, the first metal target is tungsten powder, and the particle size of the tungsten powder is less than or equal to 40 μm. The two-metal target includes nickel powder, chromium powder and lithium oxide powder with a mass ratio of 1:0.2:0.2. The particle size of nickel powder and chromium powder is 38μm, and the particle size of lithium oxide powder is 400nm;

[0039] The preparation method of the above-mentioned first metal target for electrochromic glass is as follows: the tungsten powder is made into a target by hot pressing, the hot pressing temperature is 1000°C, the hot pressing pressure is 20 MPa, and the holding time is 40 minutes;

[0040] The application method of the above-mentioned first metal target for electrochromic glass is as follows: use DC reactive magnetron sputtering to coat the first oxide film on the first transparent ITO conductive layer, the ...

Embodiment 2

[0043] Example 2: A metal target for electrochromic glass, including a first metal target and a second metal target, the first metal target is tungsten powder, the particle size of the tungsten powder is 40 μm, the second metal The target material includes nickel powder, chromium powder and lithium oxide powder with a mass ratio of 1:0.2:0.23. The particle size of nickel powder and chromium powder is 40 μm, and the particle size of lithium oxide powder is 400 nm;

[0044] The preparation method of the above-mentioned first metal target for electrochromic glass is as follows: the tungsten powder is made into a target by hot isostatic pressing, the hot isostatic pressing temperature is 1250° C., and the hot isostatic pressing pressure is 140 MPa. Pressure holding time 2.5h;

[0045] The application method of the above-mentioned first metal target for electrochromic glass is as follows: use DC reactive magnetron sputtering to coat the first oxide film on the first transparent ITO...

Embodiment 3

[0048] Example 3: A metal target for electrochromic glass, including a first metal target and a second metal target, the first metal target is tungsten powder, the particle size of the tungsten powder is 40 μm, the second metal The target material includes nickel powder, chromium powder and lithium oxide powder with a mass ratio of 1:0.2:0.26. The particle size of nickel powder and chromium powder is nickel powder with a particle size of 40 μm, and the particle size of lithium oxide powder is 400 nm;

[0049] The preparation method of the above-mentioned first metal target for electrochromic glass is as follows: the tungsten powder is made into a target by hot isostatic pressing, the hot pressing temperature is 800°C, the hot pressing pressure is 19 MPa, and the holding time is 35 minutes ;

[0050] The application method of the above-mentioned first metal target for electrochromic glass is as follows: use DC reactive magnetron sputtering to coat the first oxide film on the fi...

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Abstract

The invention discloses a metal target used for electrochromic glass and a preparation method and application method thereof. The metal target used for the electrochromic glass comprises a first metaltarget and a second metal target. The first metal target is one of metal tungsten, molybdenum, niobium or titanium. The second metal target includes nickel, chrome and lithium oxide, wherein the massratio of the nickel to the chrome to lithium oxide is 1:(0.05-0.3):(0.2-0.26). The preparation method of the metal target includes the preparation method of the first metal target and the preparationmethod of the second metal target; the preparation method of the first metal target includes the step that the target is made of one of the metal tungsten, the molybdenum, the niobium or the titaniumin a hot-pressing or canning hot isostatic pressing manner; and the preparation method of the second metal target includes the steps that the nickel, the chrome and the lithium oxide are mixed, sufficiently stirred for 22 h to 26 h and manufactured into the target in a hot-pressing or canning hot isostatic pressing manner. The metal target used for the electrochromic glass has the beneficial effects of being short in film forming time, high in production efficiency, low in target manufacture difficulty and suitable for mass production.

Description

technical field [0001] The invention relates to the technical field of electrochromic thin films, more specifically, it relates to a metal target used for electrochromic glass and its preparation method and application method. Background technique [0002] As a new functional material, electrochromic glass is widely used in information, electronics, energy, construction and national defense. The electrochromic film layer is usually composed of five parts, which are the first transparent conductive layer, the ion storage layer, the ion conductor layer, the electrochromic layer and the second transparent conductive layer. [0003] In the prior art, the ITO film is usually used as the first transparent conductive layer and the second transparent conductive layer, the metal lithium ion film is used as the ion conductor layer, the tungsten oxide is used as the ion storage layer, and the nickel oxide ion film is used as the electrochromic layer. Because both the tungsten oxide ta...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/08B22F3/14B22F3/15C03C17/34G02F1/1524
Inventor 杨懿杨荣春
Owner 上海博译金属有限公司
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