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Method for forming pleats on surface of elastomer film
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A technology for elastomers and elastomer materials, which is applied in the field of elastomer surface processing and can solve problems such as complex regulation and control.
Active Publication Date: 2019-06-11
BEIJING UNIV OF POSTS & TELECOMM
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However, generally only micron-scale wrinkles can be obtained, and the regulation of the morphology of the wrinkles depends on the selection of the soft-hard composite film and the change of external induction conditions, and the regulation is more complicated.
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Embodiment 1
[0043] This embodiment provides a method for forming nano-folds on the surface of an elastomer film, comprising the steps of:
[0044] S10, the slides were ultrasonically cleaned in acetone, alcohol, and deionized water in sequence, then rinsed with deionized water and dried with nitrogen; then, the slides were bombarded with oxygenplasma for 5 to 10 minutes to obtain a Water-based hard substrate.
[0045] Specifically, the size of the slide is 2.0 cm (length) x 1.0 cm (width) x 0.1 cm (height);
[0046] S11, forming a nanowire network with a dense structure on the surface of the hard substrate by drip-coating the copper nanowire solution multiple times, in the nanowire network, the nanowires are criss-crossed and overlapped up and down, and there are void.
[0047] Specifically, copper nanowires with a diameter of 50-200 nanometers and a length of 1-10 microns are dissolved in alcohol to form a copper nanowire solution with good monodispersity (mass fraction is 0.01wt.%); ...
Embodiment 2
[0054] This embodiment provides a method for forming nano-folds on the surface of an elastomer film, comprising the steps of:
[0055] S20, the slides were ultrasonically cleaned in acetone, alcohol, and deionized water in sequence, then rinsed with deionized water and dried with nitrogen; then, the slides were bombarded with oxygenplasma for 5 to 10 minutes to obtain a Water-based hard substrate.
[0056] Specifically, the size of the slide is 2.0 cm (length) x 1.0 cm (width) x 0.1 cm (height);
[0057] S21, forming a nanowire network with a dense structure on the surface of the hard substrate by drip-coating the copper nanowire solution multiple times, in the nanowire network, the nanowires are criss-crossed and overlapped up and down, and there are void.
[0058] Specifically, copper nanowires with a diameter of 50-200 nanometers and a length of 1-10 microns are dissolved in alcohol to form a copper nanowire solution with good monodispersity (mass fraction is 0.01wt.%); ...
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Abstract
The invention provides a method for forming pleats on the surface of an elastomer film. The method comprises the following steps: (1) forming a nanowirenetwork on the surface of a hard substrate as atemplate; (2) covering the nanowire network containing surface of the template with a flowing elastomer material until the elastomer material is filled into all voids of the nanowire network and attached to the hard substrate; (3) curing the elastomer material; and (4) removing the hard substrate so as to obtain the elastomer film with a nanometer pleat containing surface. According to the invention, the nanowire network constructed by nanowires or nanofibers is transferred into the elastomer film; a nano-scale pleat structure is prepared on the surface of the elastomer film in a large area;and the morphology of nanometer pleats is simple and convenient to be adjusted and controlled. By utilization of the method provided by the invention for preparation of a pleat structure, no micro-nano processing technologies like photolithography, nanoimprinting and electron beam lithography are needed; and the method provided by the invention is simple and rapid in preparation process and has low cost and good repeatability.
Description
technical field [0001] The invention relates to the field of elastomer surface processing, in particular to a method for forming wrinkles on the surface of an elastomer film. Background technique [0002] Patterning on the surface of a material can change the surface morphology of the material, which in turn has an important impact on the physical and chemical properties of the material. In recent years, the use of surface wrinkling to obtain micro-nano patterns has attracted great attention. Compared with traditional surface micro-nano pattern processing technologies such as lithography, nanoimprinting, electron beam etching, and soft etching, micro-nano patterning on the surface of materials (especially soft materials such as flexible elastomers) through wrinkles does not require high precision. Masks and expensive and complex processing equipment are simple, fast, and low-cost, and have shown their unique application advantages in micro-nano manufacturing, flexible devic...
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