Method for forming pleats on surface of elastomer film
What is Al technical title?
Al technical title is built by PatSnap Al team. It summarizes the technical point description of the patent document.
A technology for elastomers and elastomer materials, which is applied in the field of elastomer surface processing and can solve problems such as complex regulation and control.
Active Publication Date: 2019-06-11
BEIJING UNIV OF POSTS & TELECOMM
View PDF9 Cites 6 Cited by
Summary
Abstract
Description
Claims
Application Information
AI Technical Summary
This helps you quickly interpret patents by identifying the three key elements:
Problems solved by technology
Method used
Benefits of technology
Problems solved by technology
However, generally only micron-scale wrinkles can be obtained, and the regulation of the morphology of the wrinkles depends on the
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more
Image
Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
Click on the blue label to locate the original text in one second.
Reading with bidirectional positioning of images and text.
Smart Image
Examples
Experimental program
Comparison scheme
Effect test
Embodiment 1
[0043] This embodiment provides a method for forming nano-folds on the surface of an elastomer film, comprising the steps of:
[0044] S10, the slides were ultrasonically cleaned in acetone, alcohol, and deionized water in sequence, then rinsed with deionized water and dried with nitrogen; then, the slides were bombarded with oxygen plasma for 5 to 10 minutes to obtain a Water-based hard substrate.
[0045] Specifically, the size of the slide is 2.0 cm (length) x 1.0 cm (width) x 0.1 cm (height);
[0046] S11, forming a nanowire network with a dense structure on the surface of the hard substrate by drip-coating the copper nanowire solution multiple times, in the nanowire network, the nanowires are criss-crossed and overlapped up and down, and there are void.
[0047] Specifically, copper nanowires with a diameter of 50-200 nanometers and a length of 1-10 microns are dissolved in alcohol to form a copper nanowire solution with good monodispersity (mass fraction is 0.01wt.%); ...
Embodiment 2
[0054] This embodiment provides a method for forming nano-folds on the surface of an elastomer film, comprising the steps of:
[0055] S20, the slides were ultrasonically cleaned in acetone, alcohol, and deionized water in sequence, then rinsed with deionized water and dried with nitrogen; then, the slides were bombarded with oxygen plasma for 5 to 10 minutes to obtain a Water-based hard substrate.
[0056] Specifically, the size of the slide is 2.0 cm (length) x 1.0 cm (width) x 0.1 cm (height);
[0057] S21, forming a nanowire network with a dense structure on the surface of the hard substrate by drip-coating the copper nanowire solution multiple times, in the nanowire network, the nanowires are criss-crossed and overlapped up and down, and there are void.
[0058] Specifically, copper nanowires with a diameter of 50-200 nanometers and a length of 1-10 microns are dissolved in alcohol to form a copper nanowire solution with good monodispersity (mass fraction is 0.01wt.%); ...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more
PUM
Property
Measurement
Unit
Thickness
aaaaa
aaaaa
Quality score
aaaaa
aaaaa
Login to view more
Abstract
The invention provides a method for forming pleats on the surface of an elastomer film. The method comprises the following steps: (1) forming a nanowire network on the surface of a hard substrate as atemplate; (2) covering the nanowire network containing surface of the template with a flowing elastomer material until the elastomer material is filled into all voids of the nanowire network and attached to the hard substrate; (3) curing the elastomer material; and (4) removing the hard substrate so as to obtain the elastomer film with a nanometer pleat containing surface. According to the invention, the nanowire network constructed by nanowires or nanofibers is transferred into the elastomer film; a nano-scale pleat structure is prepared on the surface of the elastomer film in a large area;and the morphology of nanometer pleats is simple and convenient to be adjusted and controlled. By utilization of the method provided by the invention for preparation of a pleat structure, no micro-nano processing technologies like photolithography, nanoimprinting and electron beam lithography are needed; and the method provided by the invention is simple and rapid in preparation process and has low cost and good repeatability.
Description
technical field [0001] The invention relates to the field of elastomer surface processing, in particular to a method for forming wrinkles on the surface of an elastomer film. Background technique [0002] Patterning on the surface of a material can change the surface morphology of the material, which in turn has an important impact on the physical and chemical properties of the material. In recent years, the use of surface wrinkling to obtain micro-nano patterns has attracted great attention. Compared with traditional surface micro-nano pattern processing technologies such as lithography, nanoimprinting, electron beam etching, and soft etching, micro-nano patterning on the surface of materials (especially soft materials such as flexible elastomers) through wrinkles does not require high precision. Masks and expensive and complex processing equipment are simple, fast, and low-cost, and have shown their unique application advantages in micro-nano manufacturing, flexible devic...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more
Application Information
Patent Timeline
Application Date:The date an application was filed.
Publication Date:The date a patent or application was officially published.
First Publication Date:The earliest publication date of a patent with the same application number.
Issue Date:Publication date of the patent grant document.
PCT Entry Date:The Entry date of PCT National Phase.
Estimated Expiry Date:The statutory expiry date of a patent right according to the Patent Law, and it is the longest term of protection that the patent right can achieve without the termination of the patent right due to other reasons(Term extension factor has been taken into account ).
Invalid Date:Actual expiry date is based on effective date or publication date of legal transaction data of invalid patent.
Login to view more