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A kind of visible light cutting film, its preparation method and application

A technology of visible light and absorbing film, which is applied in the field of optical film, can solve the problems of poor cut-off effect of visible light and achieve good visual effect

Active Publication Date: 2021-08-10
ZHANGJIAGANG KANGDE XIN OPTRONICS MATERIAL
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The main purpose of the present invention is to provide a visible light cut-off film, its preparation method and application, to solve the problem that the visible light cut-off film in the prior art has poor cut-off effect on visible light

Method used

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  • A kind of visible light cutting film, its preparation method and application
  • A kind of visible light cutting film, its preparation method and application
  • A kind of visible light cutting film, its preparation method and application

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preparation example Construction

[0051] In another typical embodiment of the present application, a method for preparing any of the above-mentioned visible light cut-off films is provided, the preparation method comprising: Step S1, setting a high refractive index material layer 21 on the substrate layer 10; Step S2 , setting the matching material layer 22 on the high refractive index material layer 21; and optionally repeating step S3 one or more times, setting the high refractive index material layer 21 on the matching material layer 22, and setting Matching material layer 22 .

[0052] Since the high refractive index material layer 21 of the present application has a refractive index of 3 to 5.5, it has good absorptivity to ultraviolet light and visible light; and it is matched with the matching material layer 22 to form a structural water Layer 23, the refractive index of the structured water layer 23 is similar to that of water and is about 1.3, so it can form a thin film interference with the high refra...

Embodiment 1

[0063] The film structure of the visible light cut-off film in this embodiment is Air|1.376L1.795H|Sub|5.003H0.236L|Air, wherein: Sub is the substrate layer, Air is air; H is the α-hydrogenated amorphous silicon layer, and the refraction The refractive index is 4.306; L is a silicon dioxide layer with a refractive index of 1.470, which can be referred to figure 1 .

[0064] The above-mentioned visible light cut-off film was prepared by vacuum magnetron sputtering method:

[0065] (1) Forming a hydrogenated amorphous silicon layer on the substrate

[0066] The substrate is strictly cleaned before use: soak in standard washing solution (saturated potassium permanganate solution of sulfuric acid) for 24 hours; then, ultrasonically clean with toluene, acetone and ethanol for 15 minutes respectively, and rinse repeatedly with deionized water; finally , and store the cleaned substrate in analytically pure ethanol in the dark until use.

[0067] Using the TXZ500-2 radio frequency ...

Embodiment 2

[0073] The above-mentioned visible light cut-off film was prepared by PECVD method:

[0074] (1) Forming a hydrogenated amorphous silicon layer on the substrate

[0075] Using 4% silane diluted with high-concentration hydrogen as the reaction gas source of the plasma chemical vapor deposition (PECVD) process, when the vacuum reaches 1.0×10 -4 At Pa, the film was deposited on a K9 glass substrate with a thickness of 1.1 mm, the frequency of the radio frequency power supply was 13.56 MHz, and the gas flow rate was 20 sccm during the reaction. Amorphous silicon thin film at lower gas pressure (10Pa) and power density (30mW / cm 2 ) deposition, the RF electrode temperature was kept constant at 150°C, and the substrate temperature was controlled at 200°C. The RM2000 laser Raman spectrometer used in the measurement was used to observe the hydrogenated amorphous silicon layer, and the SE850 spectroscopic ellipsometer was used to measure its thickness.

[0076] (2) Forming a silicon ...

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Abstract

The invention provides a visible light cutoff film, its preparation method and application. The visible light cutoff film includes: a base material layer; an absorption film system, including one or more absorption units, the absorption units are arranged on one or two opposite surfaces of the base material layer, each absorption unit includes a high refractive index material layer and a The matching material layer is in contact with the high refractive index material layer and has a refractive index of 3 to 5.5. The high refractive index material layer and the matching material layer form a structural water layer at the contact interface. Since the high refractive index material layer in this application has a refractive index of 3 to 5.5, it has good absorption of ultraviolet light and visible light; and it is matched with the matching material layer to form a structural water layer at the contact interface between the two. The refractive index of the structural water layer is similar to that of water, which is about 1.3. Therefore, it can form a thin film interference with the high refractive index material layer for visible light, thereby forming an ideal cut-off effect for ultraviolet and visible light, and achieving ideal transmittance of infrared light.

Description

Technical field [0001] The present invention relates to optical films, in particular, to a visible light cutoff film, its preparation method and application. Background technique [0002] The development of science and technology places higher and higher requirements on materials. The emergence of a new material will have a huge impact on society. Considering that it is generally not easy to obtain new materials and they are expensive, it is very meaningful to study thin film materials attached to the surface of the substrate. Thin film materials can be regarded as surface materials, which are generally very thin. Therefore, the preparation and characterization methods of thin film materials are closely related to the study of material surfaces. Thin film materials not only have superior mechanical and thermal properties, but also have specific functions such as optoelectronics, piezoelectricity, and magnetism. They are also low cost, so they are widely used in production a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/22G02B5/28
Inventor 于甄张国臻夏振
Owner ZHANGJIAGANG KANGDE XIN OPTRONICS MATERIAL
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