Preparation method of CuFeO2 semiconductor
A semiconductor, cuso4-technology, applied in the direction of electrode, electrolytic inorganic material coating, electrolytic process, etc., can solve the problems that affect the stability of semiconductors, light corrosion, reduce water decomposition efficiency, etc., achieve excellent light stability and reduce light corrosion , The effect of Faraday efficiency improvement
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Embodiment 1
[0024] a CuFeO 2 A method for preparing a semiconductor, comprising the steps of:
[0025] (1) Add CuSO to lactic acid solution 4 solution, after mixing uniformly to obtain CuSO 4 - Lactic acid mixed solution, the resulting CuSO 4 -The concentration of lactic acid in the lactic acid mixed solution is 0.25mol / L, CuSO 4 The concentration is 0.4mol / L;
[0026] (2) CuSO prepared in step (1) 4 -Add FeCl to lactic acid mixed solution 3 , the added FeCl 3 The concentration is 0.05mol / L, and magnetic stirring is used to make FeCl 3 dissolved and mixed with CuSO 4 - Lactic acid mixed solution is mixed evenly to prepare CuFeO 2 Electrodeposition solution;
[0027] (3) CuFeO prepared in step (2) 2 Add alkaline solution to the electrodeposition solution, the alkaline solution used is NaOH solution, adjust CuFeO 2 The pH value of the electrodeposition solution is 7.0;
[0028] (4) ITO conductive glass is put into acetone, ethanol and ultrapure water successively to clean;
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Embodiment 2
[0031] a CuFeO 2 A method for preparing a semiconductor, comprising the steps of:
[0032] (1) Add CuSO to lactic acid solution 4 solution, after mixing uniformly to obtain CuSO 4 - Lactic acid mixed solution, the resulting CuSO 4 -The concentration of lactic acid in the lactic acid mixed solution is 0.35mol / L, CuSO 4 The concentration is 0.6mol / L;
[0033] (2) CuSO prepared in step (1) 4 -Add FeCl to lactic acid mixed solution 3 , the added FeCl 3 The concentration is 0.5mol / L, and magnetic stirring is used to make FeCl 3 dissolved and mixed with CuSO 4 - Lactic acid mixed solution is mixed evenly to prepare CuFeO 2 Electrodeposition solution;
[0034] (3) CuFeO prepared in step (2) 2 Add alkaline solution to the electrodeposition solution, the alkaline solution used is NaOH solution, adjust CuFeO 2 The pH value of the electrodeposition solution is 9.5;
[0035] (4) ITO conductive glass is put into acetone, ethanol and ultrapure water successively to clean;
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