The application relates to the technical field of purification or refining of
silicon compounds, in particular to a high-purity
quartz sand
alkali metal targeted deep removal method, wherein
quartz sand is mixed with
silicon carbide abrasive and dry ground, and then is immersed into a solution containing
ammonium fluoroborate, nano
titanium dioxide and
graphene quantum dots for
etching; then a composite solution containing HEDP, EDTMPA,
crown ether and beta-
cyclodextrin is used to complex and leach alkali metals in a
microwave field; then, through a photoelectric
desorption reactor, the complex is decomposed under the cooperation of
ultraviolet light and an
electric field; then, a
supergravity rotating
bed is used for three-stage countercurrent washing; finally, a
radio frequency plasma treatment is used to repair the
crystal lattice and remove hydroxyl groups in a
hydrogen atmosphere at high temperature; through multi-step cooperation, the alkali metals are deeply removed. Through
surface modification, composite complexing, photoelectric
desorption and other technologies, the total
alkali metal content of the
quartz sand is reduced,
energy consumption is reduced, waste liquid is reduced, the purity and performance of the material are improved, and the application is suitable for high-end fields such as semiconductors.