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Preparation method for alpha-Fe2O3 photoanode applied to photoelectrolysis

A photoanode and photoelectrolysis technology, applied in the direction of electrodes, electrolysis process, electrolysis components, etc., can solve the problems of inconvenient operation, dangerous use, complex structure and other problems of precursors, and achieve simple and cheap structure, convenient operation and high measurement accuracy Effect

Inactive Publication Date: 2014-04-16
DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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  • Abstract
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  • Application Information

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Problems solved by technology

[0004] In order to overcome α-Fe 2 o 3 In the process of semiconductor thin film preparation, the structure is complex, the cost is high, the use of dangerous precursors and inconvenient operation, etc., the purpose of the present invention is to solve the problems of photoelectrolysis of α-Fe 2 o 3 Semiconductor photoanode provides a preparation method with simple preparation, convenient operation and easy control of film thickness

Method used

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  • Preparation method for alpha-Fe2O3 photoanode applied to photoelectrolysis
  • Preparation method for alpha-Fe2O3 photoanode applied to photoelectrolysis
  • Preparation method for alpha-Fe2O3 photoanode applied to photoelectrolysis

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Embodiment 1

[0037] Using 0.01M FeCl 2 ·5H 2 O was used as the electrolyte solution, and 1M HCl was used to adjust the pH of the solution to 4.1. At 75 °C, α-Fe was prepared using a three-electrode system. 2 o 3 photoelectrode. Among them, FTO (conductive glass) is used as the working electrode, the Pt sheet electrode is used as the counter electrode, and the Ag / AgCl electrode (4M KCl solution) is used as the reference electrode. The optimized deposition electrode was tested under the condition of 1.2V. The deposition time is 2, 4, 8, 16min. The color of the thin film samples obtained with different deposition times varies from yellow to red. After the deposition process, the working electrode was taken out and rinsed with deionized water and then calcined in a tube furnace. In the tube furnace, the heating rate was maintained at 2°C / min from room temperature to 520°C, and then calcined at 520°C for 30min. Figure 4 α-Fe obtained after deposition and calcination 2 o 3 Digital photo...

Embodiment 2

[0039] The difference from Example 1 is that in 0.05M FeCl 2 ·5H 2 NH of O and 3M 4 Cl is used as the electrolyte, the pH value is 7.5, and the voltage is 0.3V. Among them, FTO (conductive glass) is used as the working electrode, the Pt sheet electrode is used as the counter electrode, and the Ag / AgCl electrode (4M KCl solution) is used as the reference electrode. After the deposition process is completed, calcining is carried out in the same manner as in the previous example.

Embodiment 3

[0041] The difference from Example 1 is that the working electrode is a 2cm×5cm conductive glass, the counter electrode is a graphite plate, and Ag / AgCl (saturated KCl) is a reference electrode. Under the conditions of an applied voltage of 1.2V, pH=4.1, and 70°C under, with 0.1M FeCl 2 4H 2 O, pH=5.1 is the electrolyte solution, and the deposition time is 1min, 5min, 10min, 15min, 20min, 25min, 30min samples. After the deposition, the samples were sent into a tube furnace for high-temperature calcination at 600 °C. image 3 Anodic oxidation electrodeposition curves for different electrodeposition times. Figure 5 α-Fe 2 o 3 Photoelectric performance diagram of the photoelectrode. Image 6 Metallographic micrographs of the samples after calcination. Figure 7 is the XRD pattern of the prepared sample.

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Abstract

The invention relates to a preparation method for alpha-Fe2O3 photoanode applied to photoelectrolysis. According to the preparation method, a conductive base plate is taken as a working electrode, a Pt metal plate, a graphite plate or the like is taken as a counter electrode, and a Ag / AgCl or saturated calomel electrode is taken as a reference electrode. A three-electrode system formed by enabling an electrodeposition apparatus to communicate with an electrochemical workstation is immersed in a solution of a precursor containing Fe<2+>, a voltage is applied for performing anodization electrodeposition on the surface of electro-conductive glass and further for preparing a FeOOH film, and the film sample is subjected to calcining for obtaining the alpha-Fe2O3 photoanode. The preparation method has the advantages of being cheap in apparatus, simple in apparatus structure, convenient to operate, precisely controllable in film thickness, good in stability and environment-friendly. By employing the method for preparing photoanode during photoelectrolysis, the rapid friendly preparation of the alpha-Fe2O3 photoanode can be realized.

Description

technical field [0001] The present invention relates to a photoelectrolytic cell, specifically a kind of α-Fe used in a photolytic cell 2 o 3 Preparation method of photoanode. Background technique [0002] The photoelectrolysis process is a process in which semiconductors are used to absorb and convert solar energy and store energy as chemical energy. The most popular way to convert and store solar energy is to generate hydrogen through photoelectric water splitting, which is also considered an ideal way to produce clean energy, and the only raw material consumed in the process is water. As a secondary energy source, hydrogen energy has many advantages such as cleanness, high efficiency, safety, storability, and transportability. It has been generally regarded as the most ideal pollution-free green energy in the new century. Compared with other photocatalysts applied in photoelectrolytic cells, α-Fe 2 o 3 Semiconductors have a narrow bandgap so that photoelectric conver...

Claims

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Application Information

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IPC IPC(8): C25D9/04C25B11/04
Inventor 俞红梅付丽李永坤张长昆邵志刚衣宝廉
Owner DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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