Method for preparing thin films in different components and doping ratios through multi-target co-sputtering
A co-sputtering and thin-film technology, which is applied in the field of thin-film preparation that can flexibly adjust the composition and doping ratio, can solve the problems of not being prepared, not being able to obtain a thin film, and being unable to flexibly adjust the VO phase transition temperature, etc., to achieve repeatability Strong, low production cost, good process stability
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[0030] Example 1:
[0031] In this example, a VW film with a specific W doping ratio was deposited on an amorphous K9 glass substrate with a dual target co-sputtering with a fixed power ratio of 500W:0W. The VW atomic ratio in the doped vanadium tungsten target was 98:2. Then, VO with specific W doping ratio is prepared by vacuum pre-annealing and oxidation annealing process 2 Film, and finally test the prepared doped VO 2 Film transmission performance. The specific implementation steps are as follows:
[0032] 1. Substrate cleaning. Put the amorphous K9 glass substrate into acetone solution (MOS grade, purity greater than 99.8%) for 5 minutes, and then put it in anhydrous ethanol solution (MOS grade, purity greater than 99.7%) for 5 minutes to remove oil on the substrate surface After the ultrasonic cleaning is over, take it out vertically and blow dry with nitrogen.
[0033] 2. Place the cleaned substrate in the magnetron sputtering coating line into the cavity and evacuate to 9...
Example Embodiment
[0038] Example 2:
[0039] In this example, a VW film with a specific W doping ratio was deposited on an amorphous K9 glass substrate by dual-target co-sputtering with a fixed power ratio of 500W:250W. The VW atomic ratio in the doped vanadium tungsten target was 98:2. Then, VO with a certain W doping ratio is prepared by vacuum pre-annealing and oxidation annealing process 2 Film, and finally test the prepared doped VO 2 Film transmission performance. The specific implementation steps are as follows:
[0040] 1. Substrate cleaning. Put the amorphous K9 glass substrate into acetone solution (MOS grade, purity greater than 99.8%) for 5 minutes, and then put it in anhydrous ethanol solution (MOS grade, purity greater than 99.7%) for 5 minutes to remove oil on the substrate surface After the ultrasonic cleaning is over, take it out vertically and blow dry with nitrogen.
[0041] 2. Place the cleaned substrate in the magnetron sputtering coating line into the cavity and evacuate to 9....
Example Embodiment
[0046] Example 3:
[0047] In this example, a VW film with a specific W doping ratio was deposited on an amorphous K9 glass substrate by dual-target co-sputtering with a fixed power ratio of 500W:500W. The VW atomic ratio in the doped vanadium tungsten target was 98:2. Then, VO with a certain W doping ratio is prepared by vacuum pre-annealing and oxidation annealing process 2 Film, and finally test the prepared doped VO 2 Film transmission performance. The specific implementation steps are as follows:
[0048] 1. Substrate cleaning. Put the amorphous K9 glass substrate into acetone solution (MOS grade, purity greater than 99.8%) for 5 minutes, and then put it in anhydrous ethanol solution (MOS grade, purity greater than 99.7%) for 5 minutes to remove oil on the substrate surface After the ultrasonic cleaning is over, take it out vertically and blow dry with nitrogen.
[0049] 2. Place the cleaned substrate in the magnetron sputtering coating line into the cavity and evacuate to 9....
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