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A double-sided plasma processing system for capacitor film materials

A capacitor film and plasma technology, applied in plasma, capacitor, capacitor manufacturing, etc., can solve the problems of inability to handle both sides of capacitor film materials, unfavorable large-scale industrial production application, complex process, etc., to achieve mass production, The effect of reducing the surface energy of the material and simplifying the system structure

Active Publication Date: 2021-07-02
INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In order to solve the problem that the equipment in the prior art is expensive, the process is complicated, and it is impossible to process both sides of the capacitor film material, which is not conducive to large-scale industrial production and application, the present invention provides a double-sided plasma processing system for the capacitor film material to reduce costs. Improve work efficiency

Method used

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  • A double-sided plasma processing system for capacitor film materials
  • A double-sided plasma processing system for capacitor film materials
  • A double-sided plasma processing system for capacitor film materials

Examples

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Embodiment 1

[0052] This embodiment discloses the structure of a system for treating both sides of a capacitor film material by surface dielectric barrier discharge.

[0053] see figure 1 , the housing 1 and the plasma processing device 2, wherein the plasma processing device 2 includes a first plasma processing unit 21 and a second plasma processing unit 22, which are sequentially arranged at intervals along the transmission direction of the capacitor film material 31 Inside the casing 1; the first plasma processing unit 21 includes a first barrier dielectric layer 213, a first plasma generation layer 211 disposed on its lower side and a first ground electrode 214 disposed on its upper side, the first The second plasma processing unit 22 includes a second blocking dielectric layer 223 , a second plasma generation layer 221 disposed on its upper side, and a second ground electrode 224 disposed on its lower side.

[0054] see image 3 , a plurality of second high-voltage electrodes 222 ar...

Embodiment 2

[0074] This embodiment discloses the method of processing capacitor thin film materials in embodiment 1.

[0075] see figure 1 , the power supply 11 provides high-voltage electricity to the first high-voltage electrode 212 and the second high-voltage electrode 222, and generates atmospheric pressure low-temperature plasma on their surfaces; the motor 32 drives the winding roller 34 to rotate, and cooperates with the fourth conductive roller shaft 354 for winding Capacitor film material 31, makes release material roller 33 cooperate the 3rd conduction roller shaft 353 to discharge capacitor film material 31, capacitor film material 31 advances along the fixed route of conduction roller shaft; figure 2 , the precursor and the working gas are introduced into the air inlet 16, and the precursor is respectively attached to the two faces of the capacitor film material 31, and when passing through the first plasma generation layer 211 and the second plasma generation layer 221, the ...

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Abstract

The invention discloses a double-sided plasma processing system for capacitor thin film materials, which includes a housing and a plasma processing device. The plasma processing device has two plasma processing units, and the plasma generating layers of the two plasma processing units in the opposite direction. The motor drives the capacitor film material to be processed through the plasma generation layers of the two plasma processing units in sequence. The present invention does not affect the electrical and mechanical properties of the material body while realizing the treatment of both sides of the capacitor film, and has the advantages of simple equipment, easy operation, energy saving and environmental protection, short processing time, large area and high efficiency, and is suitable for industrial large-scale production application.

Description

technical field [0001] The invention relates to the field of surface treatment of capacitor film materials, in particular to a double-sided plasma treatment system for capacitor film materials. Background technique [0002] Energy storage capacitors have played an important role in power systems, electronic devices, pulse power supplies, etc. Role. Capacitor film materials are widely used due to their good flexibility, high breakdown field strength, light weight, low processing temperature, and large-area film formation. However, due to its low dielectric constant and breakdown field strength, the energy storage density is limited. The breakdown field strength of the capacitor film can be improved by modification or doping of the capacitor film, thereby increasing the energy storage density of the capacitor, which is a current research hotspot. [0003] Chinese patent document CN101277576A discloses a system for treating the surface of thin film materials with double diel...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01G13/00H05H1/24
CPCH01G13/00H05H1/2406
Inventor 孔飞章程邵涛任成燕叶成园
Owner INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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