Photosensitive resin composition, photocurable pattern and image display device

A technology for photosensitive resins and compositions, applied in the field of photosensitive resin compositions and photocured patterns formed therefrom, capable of solving the problems of reduced yield of mass-produced craft products, damage to resist patterns, poor adhesion, etc. Achieve the effects of excellent film retention rate, excellent sensitivity, and excellent substrate adhesion
CN110471255BActive Publication Date: 2022-05-06DONGWOO FINE CHEM CO LTD
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Patent Information

Authority / Receiving Office
CN Β· China
Patent Type
Patents(China)
Current Assignee / Owner
DONGWOO FINE CHEM CO LTD
Publication Date
2022-05-06

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Abstract

The present invention provides a photosensitive resin composition, a photocurable pattern, and an image display device. More specifically, the photosensitive resin composition includes an alkali-soluble resin, a polymerizable compound, a photopolymerization initiator, and a solvent, and the photopolymerization initiator includes A compound with a specific structure, thereby showing excellent reactivity during low temperature curing, and the pattern produced from the above-mentioned photosensitive resin composition has excellent chemical resistance, heat resistance and other good durability, and has excellent substrate density. The resultant force and film retention rate are also excellent in sensitivity.
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Description

technical field

[0001] The invention relates to a photosensitive resin composition and a photocurable pattern formed therefrom. More specifically, it relates to a photosensitive resin composition containing a photopolymerization initiator, a photocured pattern formed from the photosensitive resin composition, and an image display device. Background technique

[0002] In the display field, the photosensitive resin composition is used to form various photocurable patterns such as photoresists, insulating films, protective films, black matrices, and column spacers. Specifically, the photosensitive resin composition can be selectively exposed and developed through a photolithography process to form a desired photocuring pattern. In order to improve the yield in the process and improve the physical properties of the application object in this process, it is necessary to have A highly sensitive photosensitive resin composition.

[0003] The pattern formation of the photosensitiv...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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