Photosensitive resin composition, photocurable pattern and image display device
A technology for photosensitive resins and compositions, applied in the field of photosensitive resin compositions and photocured patterns formed therefrom, capable of solving the problems of reduced yield of mass-produced craft products, damage to resist patterns, poor adhesion, etc. Achieve the effects of excellent film retention rate, excellent sensitivity, and excellent substrate adhesion
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manufacture example 1
[0090]
[0091] In a flask equipped with a stirrer, a thermometer reflux condenser, a dropping funnel, and a nitrogen gas introduction tube, 182 g of propylene glycol monomethyl ether acetate was introduced, and after the atmosphere in the flask was changed from air to nitrogen, the temperature was raised to 100° C., and then After 2 hours, 35.4 g (0.30 moles) of vinyl toluene, 36.0 g (0.50 moles) of acrylic acid, 59.6 g (0.2 moles) of 2-hydroxyl-o-phenylphenol propyl acrylate and propylene glycol monomethyl ether acetic acid A solution in which 3.6 g of azobisisobutyronitrile was added to a mixture of 136 g of ester was dropped into the flask from the dropping funnel, and stirring was continued at 100° C. for 5 hours. Next, the atmosphere in the flask was changed from nitrogen to air, and 22.5 g [0.15 mol (50 mol % with respect to the acrylic acid used in this reaction)] of glycidyl methacrylate, tridimethylaminomethane 0.9 g of phenol and 0.145 g of hydroquinone were reac...
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