Transition metal oxide ferroelectric film with Bi4Ti3O12 band gap regulated and controlled by LaMnO3 and preparation method of transition metal oxide ferroelectric film
A transition metal and ferroelectric thin film technology, applied in metal material coating technology, ion implantation plating, coating, etc., can solve the problem of hindering the research of transparent conductive oxides and low band gap photovoltaic oxides, excellent transition metal oxides Problems such as the disappearance of physical properties, to achieve the effect of promoting, strong ferroelectricity, and wide bandgap
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0028] The specific preparation steps of the ferroelectric thin film are as follows:
[0029] (1) According to the molecular formula Bi 4 Ti 3 o 12 -LaMnO 3 The stoichiometric ratio in 2 o 3 Powder, MnO 2 Powder, La 2 o 3 Powder and Ti 2 o 3 powder; then ground and mixed and calcined at 900°C for 2 hours to obtain Bi 4 Ti 3 o 12 -LaMnO 3 Ceramic powder; the above ceramic powder is pressed and formed, initially fired at 750°C for 3 hours, crushed and pressed twice to form a blank; finally, the above blank is sintered at 1100°C for 2 hours to form LaMnO 3 Insert Bi 4 Ti 3 o 12 Transition metal oxide ferroelectric ceramic target;
[0030] (2) With the STO on the (001) surface as the substrate, soak the substrate in acetone, ethanol, and deionized water for 10 minutes, rinse with deionized water after taking it out, and finally wash it with dry N 2 Blow dry and set aside;
[0031] (3) Bi obtained in step (1) 4 Ti 3 o 12 -LaMnO 3 The ceramic target is placed ...
PUM
| Property | Measurement | Unit |
|---|---|---|
| Coercive field | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 


