Polybenzoxazine cross-linked hydrolysis-resistant polyborosiloxane and preparation method thereof
A technology of polybenzoxazine and polyborosiloxane, which is applied in the field of new polyborosiloxane and its preparation, can solve problems such as poor hydrolysis resistance, achieve excellent hydrolysis resistance, simple and easy synthetic route, The effect of high Tg
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Embodiment 1
[0069] Example 1. Synthesis of silicon-containing benzoxazine monomers based on phenol and γ-aminopropylmethyldimethoxysilane
[0070] Dissolve 0.25g of paraformaldehyde and 0.75g of γ-aminopropylmethyldimethoxysilane in 20mL of dioxane, stir the reaction at room temperature for 0.5h, add 0.44g of phenol, raise the temperature to 90°C, and react for 24h . Post-treatment: the solvent was removed by rotary evaporation, and the crude product was vacuum-dried at 60° C. to obtain a yellow liquid with a yield of 80%.
Embodiment 2
[0071] Example 2. Synthesis of silicon-containing benzoxazine monomers based on phenol and γ-aminopropylmethyldiethoxysilane
[0072] Dissolve 0.25g of paraformaldehyde and 0.51g of γ-aminopropylmethyldiethoxysilane in 20mL of dioxane, stir and mix at room temperature for 0.5h, add 0.44g of phenol, raise the temperature to 80°C, and react for 10h . Post-processing: the solvent was removed by rotary evaporation, and the crude product was vacuum-dried at 60° C. to obtain a yellow liquid with a yield of 62%.
Embodiment 3
[0073] Example 3, Synthesis of silicon-containing benzoxazine monomers based on bisphenol A and γ-aminopropylmethyldiethoxysilane
[0074] Dissolve 0.25g of paraformaldehyde and 0.51g of γ-aminopropylmethyldiethoxysilane in 20mL of dioxane, stir and mix at room temperature for 0.5h, add 0.64g of bisphenol A, and raise the temperature to 80°C. Reaction 10h. Post-processing: the solvent was removed by rotary evaporation, and the crude product was vacuum-dried at 60° C. to obtain a yellow liquid with a yield of 60%.
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