Electron microscopic imaging system and imaging method

An electron microscope and imaging system technology, applied in the direction of circuits, discharge tubes, electrical components, etc., can solve the problems of reducing imaging quality and sample damage, and achieve the effect of improving acquisition efficiency, improving efficiency, and improving quality

Active Publication Date: 2020-01-10
NANJING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] The purpose of the present invention is to overcome the disadvantages in the prior art that when a single electron beam is used as an electron beam probe, the frequent movement of the electron probe will reduce the quality of imaging and cause damage to the sample, and provides an electron microscopic imaging method. The system and imaging method can simultaneously obtain diffraction pattern data corresponding to multiple different probe irradiation positions within a single irradiation, which improves the efficiency of data acquisition and the quality of imaging, and can avoid damage to samples

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  • Electron microscopic imaging system and imaging method
  • Electron microscopic imaging system and imaging method

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Embodiment 1

[0035] to combine figure 1 As shown, an electron microscopic imaging system of the present invention includes several charged particle sources 100, and the charged particle sources 100 are used to emit charged particles. It is worth noting that several charged particle sources 100 are at the same height, and several charged particle sources 100 can be controlled independently, so that any number of charged particle sources 100 can be controlled to emit charged particles; especially, this The several charged particle sources 100 of the invention can be arranged arbitrarily, for example, the charged particle sources 100 can be arranged in an array, specifically, several charged particle sources 100 can be arranged in a regular shape such as a circle or a rectangle. By arranging several charged particle sources 100, arrayed charged particle beams can be obtained under single irradiation.

[0036] In addition, an electron microscopic imaging system of the present invention also i...

Embodiment 2

[0040] to combine figure 2 As shown, the content of this embodiment is basically the same as that of Embodiment 1, the difference being that: the converging unit 200 of this embodiment is not provided with an aperture 120, and the converging unit 200 is only provided with an electromagnetic lens; the diffraction of this embodiment The unit 300 includes three electromagnetic lenses, the three electromagnetic lenses are respectively electromagnetic lens a, electromagnetic lens b, and electromagnetic lens c from top to bottom, and an aperture 120 is arranged between the electromagnetic lens b and the electromagnetic lens c, and the aperture 120 Located on the focal plane or the conjugate plane of the focal plane; the aperture 120 can limit the collection angle of the diffraction pattern, and the aperture 120 of this embodiment is located on the conjugate plane of the focal plane; and the focal plane is defined by the converging unit 200 form.

[0041] Through the above settings...

Embodiment 3

[0043] An electron microscopic imaging method of the present invention adopts the above-mentioned electron microscopic imaging system, several charged particle sources 100 emit charged particles to form several charged particle beams, and several charged particle beams pass through the converging unit 200 forms overlapping charged particle beam probes, penetrates the sample 110 and forms a set of diffraction patterns of the sample 110 through the diffraction unit 300, and the detector 400 receives the set of diffraction patterns and performs stacked imaging to reconstruct the image of the sample 110. It is worth noting that the position arrangement of the sample 110 irradiated by the charged particle beam probe corresponds to the position arrangement of the charged particle source 100; and a diffraction image carrying the image of the sample 110 in a single irradiation can be divided into A set of diffraction images of the position where the electron particle beam probe is illu...

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Abstract

The invention discloses an electron microscopic imaging system and an imaging method, and belongs to the field of electron imaging. The electron microscopic imaging system comprises a plurality of charged particle sources, wherein the charged particle sources are used for emitting charged particles; a convergence unit located under the charged particle sources; a diffraction unit located under theconvergence unit, a sample being arranged between the diffraction unit and the convergence unit; and a detector located under the diffraction unit. According to the method, the plurality of charged particle sources emit charged particles to form a plurality of charged particle beams; the plurality of charged particle beams pass through the convergence unit to form a charged particle beam probe; the charged particle beam probe penetrates through the sample and forms a diffraction pattern of the sample through the diffraction unit; and the detector receives the diffraction pattern and performsstacked imaging to reconstruct a sample image. The system aims to overcome the defects that when a single electron beam is used as an electron beam probe, the imaging quality is reduced and the data acquisition efficiency is reduced due to frequent movement; and the data acquisition efficiency and the imaging quality can be improved.

Description

technical field [0001] The invention relates to the field of electronic imaging, and more specifically, to an electron microscopic imaging system and an imaging method. Background technique [0002] Scanning electron microscopy imaging is developed on the basis of electron microscopy imaging. The electron beam emitted by the electron gun and accelerated by high-speed voltage is focused on a very small range on the sample to be tested through an electromagnetic lens, and it is controlled to scan on the sample. , and then use a variety of electronic signal receivers to collect the electrons after the interaction with the sample, and obtain fine sample information from it, which has a wide range of applications in physics, chemistry, material science, biology and other disciplines. [0003] In an electron microscope, the electron gun is one of the most important components, which is equivalent to the light source in an optical microscope. The electron gun largely affects the qu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/28H01J37/141
CPCH01J37/141H01J37/28
Inventor 王鹏张炜阳
Owner NANJING UNIV
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