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Method for preparing complex circuit pattern on quartz glass

A technology of quartz glass and complex circuits, applied in printed circuits, printed circuit manufacturing, circuit substrate materials, etc., can solve problems such as material limitations, troublesome preparation work, and easy occurrence of bubbles, and achieve low-cost preparation, fast process, and uniform deposition Effect

Inactive Publication Date: 2020-01-17
GUANGDONG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it is difficult to directly fabricate circuit patterns on glass due to its brittleness, high hardness, susceptibility to heat, and absence of chemical reactions.
[0003] At present, there are two main types of preparation of fine circuit patterns: one is to use laser-induced wet back etching to prepare circuits on glass. It is too easy to have bubbles, the etching result is unstable, and it is easy to affect the quality of the circuit, and the width of the prepared circuit is about 40 μm; the second is to use the laser direct structuring (LDS) method on the flexible substrate, but the used The base material needs to be pre-processed, and a certain induction factor is added inside the material to achieve the effect. The sample preparation process is cumbersome and has great limitations on existing materials.

Method used

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  • Method for preparing complex circuit pattern on quartz glass
  • Method for preparing complex circuit pattern on quartz glass
  • Method for preparing complex circuit pattern on quartz glass

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] Such as figure 1 Shown is an embodiment of the method for preparing complex circuit patterns on quartz glass of the present invention, comprising the following steps:

[0032] S10. preparing a light-absorbing layer on the surface of the quartz glass to obtain the quartz glass to be processed;

[0033] S20. The femtosecond laser processing control system sets the processing parameters of the femtosecond laser according to the circuit pattern to be processed, loads the quartz glass to be processed in step S10 on the XYZ motion platform, and the femtosecond laser processing control system controls the movement and control of the XYZ motion platform The femtosecond laser works to realize femtosecond laser processing, and induces regular micro-nano structures on the surface of the quartz glass to be processed;

[0034] S30. Take off the quartz glass processed by the femtosecond laser, clean and remove the light-absorbing layer, and dry it to obtain the quartz glass to be pl...

Embodiment 2

[0048] This embodiment is an application embodiment of embodiment one in processing the well-shaped circuit pattern, and this embodiment is similar to embodiment one, including the following steps:

[0049] S10. preparing a light-absorbing layer on the surface of the quartz glass to obtain the quartz glass to be processed;

[0050] S20. The femtosecond laser processing control system sets the processing parameters of the femtosecond laser according to the circuit pattern to be processed, loads the quartz glass to be processed in step S10 on the XYZ motion platform, and the femtosecond laser processing control system controls the movement and control of the XYZ motion platform The femtosecond laser works to realize femtosecond laser processing, and induces a regular micro-nano structure on the surface of the quartz glass to be processed. The micro-nano structure of this embodiment is a well-shaped;

[0051] S30. Take off the quartz glass processed by the femtosecond laser, clea...

Embodiment 3

[0059] This embodiment is an application embodiment of Embodiment 1 in processing integrated circuit patterns. This embodiment is similar to Embodiment 1 and includes the following steps:

[0060] S10. preparing a light-absorbing layer on the surface of the quartz glass to obtain the quartz glass to be processed;

[0061] S20. The femtosecond laser processing control system sets the processing parameters of the femtosecond laser according to the circuit pattern to be processed, loads the quartz glass to be processed in step S10 on the XYZ motion platform, and the femtosecond laser processing control system controls the movement and control of the XYZ motion platform The femtosecond laser works to realize femtosecond laser processing, and induces a regular micro-nano structure on the surface of the quartz glass to be processed. This embodiment is used for processing integrated circuit circuit patterns;

[0062] S30. Take off the quartz glass processed by the femtosecond laser, ...

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Abstract

The invention relates to the technical field of microelectronic processing, in particular to a method for preparing a complex circuit pattern on the quartz glass, which comprises the following steps:preparing a light absorption layer on the surface of the quartz glass, processing a micro-nano structure on the surface of the quartz glass by adopting a femtosecond laser according to the imported circuit pattern, and depositing metal particles on the micro-nano structure through a chemical plating method to form a circuit pattern. According to the method, a rough and regular micro-nano structureis induced on the surface of the quartz glass coated with the ink layer, so that the binding force between chemical plating metal particles and the micro-nano structure is effectively increased; metal particles are deposited on quartz glass through a chemical plating method, the metal particles are deposited evenly and effectively, various complex circuit patterns with the line width ranging from7 micrometers to 9 micrometers are obtained, and the requirement for low-loss energization of different systems on the quartz glass in different fields can be met. The whole machining process is simple, convenient and efficient, batch manufacturing can be achieved in the chemical plating process, and the efficient and affordable requirements in industrial production can be well met.

Description

technical field [0001] The invention relates to the technical field of microelectronic processing, more specifically, to a method for preparing complex circuit patterns on quartz glass. Background technique [0002] With the recent development of electronic technology, the industrial demand for the process of producing conductive circuit patterns on glass surfaces is rapidly increasing in the fields of optical devices, displays, biochips and mobile communication devices. The circuit pattern of the glass material can be used in the edge circuits of the touch screens of smartphones and various Internet of Things (IoT) devices, or in the automotive field, such as technology front glass heating and transparent antennas. However, it is difficult to directly fabricate circuit patterns on glass due to its brittleness, high hardness, susceptibility to heat, and absence of chemical reactions. [0003] At present, there are two main types of preparation of fine circuit patterns: one ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05K3/18H05K1/03C03C17/10
CPCH05K3/181H05K1/0306C03C17/10C03C2217/253C03C2218/115
Inventor 谢小柱周文倩龙江游李俭国李苗妮
Owner GUANGDONG UNIV OF TECH