Preparation method of WO3/Ag/AgCl photocatalytic thin film material

A photocatalytic film and coating technology, applied in chemical instruments and methods, physical/chemical process catalysts, water/sludge/sewage treatment, etc., can solve problems such as unfavorable reuse, high cost, and time-consuming separation , to achieve the effects of easy recycling and reuse, good degradation performance, and easy catalytic phase separation

Pending Publication Date: 2020-01-31
NANJING UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] However, the above-mentioned catalysts are all in powder form, and it takes a lot of time and energy to separate th

Method used

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  • Preparation method of WO3/Ag/AgCl photocatalytic thin film material
  • Preparation method of WO3/Ag/AgCl photocatalytic thin film material
  • Preparation method of WO3/Ag/AgCl photocatalytic thin film material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Weigh 10.0g of tungstic acid and 5.0g of polyvinyl alcohol and add it to 20mL of hydrogen peroxide which is constantly stirred, and keep stirring for about 24h until the tungstic acid and polyvinyl alcohol are completely dissolved. The prepared solution was coated on the clean silicate glass surface, spin-coated at a speed of 800rmp for 8s with a homogenizer, then dried at 80°C for 1h, and then calcined at 550°C in a muffle furnace for 4h. Allow to cool naturally.

[0029] prepared WO 3 The optical physical picture of the film is shown in figure 1 As shown in a, it can be seen that a layer of nearly transparent film is attached to the glass surface; the prepared WO 3 SEM images of the film at different magnifications figure 2 (a and b), it can be seen that there is a layer of WO 3 The crystal particles are evenly attached to the surface of the glass.

Embodiment 2

[0031] Weigh 15.0g of tungstic acid and 5.0g of polyvinyl alcohol and add it to 20mL of 30% hydrogen peroxide with constant stirring, and keep stirring for about 24h until the tungstic acid and polyvinyl alcohol are completely dissolved. The prepared solution was coated on the clean silicate glass surface, spin-coated at 700rpm for 10s with a homogenizer, then dried at 80°C for 1h, and then calcined at 550°C in a muffle furnace for 6h. Allow to cool naturally. The prepared WO 3 The films were sequentially soaked in NaCl and AgNO at concentrations of 0.005M, 0.01M, and 0.02M, respectively. 3 solution for 30 minutes, repeat this step 3 times, and then irradiate it under a 300W xenon lamp for 10 minutes to obtain 1-WO 3 / Ag / AgCl film, 2-WO 3 / Ag / AgCl film, 3-WO 3 / Ag / AgCl film samples.

[0032] 1-WO 3 / Ag / AgCl film, 2-WO 3 / Ag / AgCl film, 3-WO 3 / Ag / AgCl thin film sample optical physical picture figure 1 (b,c,d), it can be seen that with NaCl and AgNO 3 As the concentrat...

Embodiment 3

[0034] Weigh 10.0g of tungstic acid and 5.0g of polyvinyl alcohol and add it into 30mL of 30% hydrogen peroxide which is constantly stirred, and keep stirring for about 24h until the tungstic acid and polyvinyl alcohol are completely dissolved. The prepared solution was coated on the clean silicate glass surface, spin-coated at 500rpm for 15s with a homogenizer, then dried at 80°C for 1h, and then calcined at 580°C for 5h in a muffle furnace. Allow to cool naturally. The prepared WO 3 The films were sequentially soaked in NaCl and AgNO at concentrations of 0.005M, 0.01M, and 0.02M, respectively. 3 solution for 30 minutes, repeat this step 3 times, and then irradiate it under a 300W xenon lamp for 10 minutes to obtain 1-WO 3 / Ag / AgCl film, 2-WO 3 / Ag / AgCl film, 3-WO 3 / Ag / AgCl film samples.

[0035] prepared WO 3 Film and 1-WO 3 / Ag / AgCl film, 2-WO 3 / Ag / AgCl film, 3-WO 3 The XRD pattern of / Ag / AgCl film is as follows image 3 , it can be clearly seen from the figure ...

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Abstract

The invention discloses a preparation method of a WO3/Ag/AgCl photocatalytic thin film material. According to the method, with tungstic acid as a precursor, hydrogen peroxide as a solvent and polyvinyl alcohol as an adhesive, the three components are mutually dissolved to form slurry; spin coating and high-temperature treatment technologies are adopted, a WO3 thin film is prepared on the surface of a glass substrate, the WO3 thin film material is repeatedly soaked in NaCl and AgNO3 solutions with the same concentration in sequence, drying is carried out to obtain a WO3/AgCl thin film, and finally the thin film is illuminated to obtain the WO3/Ag/AgCl photocatalytic thin film material. The WO3/Ag/AgCl thin film material prepared by the method disclosed by the invention can overcome the defect that a traditional powder material is difficult to separate and recover, is good in repeatability, simple in preparation process, low in cost and relatively stable in photocatalytic performance, and is expected to be applied to the fields of sterilization, gas sensors and the like.

Description

technical field [0001] The invention belongs to the field of synthesis of photocatalytic thin film composite materials, in particular to a WO 3 / Ag / AgCl photocatalytic thin film preparation method. Background technique [0002] Pollutants in water mainly come from the discharge of waste dyes in the paper and textile industries. Photocatalytic technology is a promising and effective method for degrading organic pollutants in water. such as TiO 2 , ZnO, SnO 2 、WO 3 、 Bi 2 o 3 Such semiconductors are widely used in the photocatalytic degradation of dyes in water. [0003] WO 3 The bandgap width is relatively low, which is 2.4-2.8eV, and it has a relatively high valence band (+3.1-3.2eV), which makes its oxidation potential higher and can absorb blue light in sunlight. Due to its excellent photoelectric performance, good chemical stability and thermal stability, it has been widely used in the fields of photocatalyst, gas sensor, photochromic and electrocatalysis. Howeve...

Claims

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Application Information

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IPC IPC(8): B01J27/132B01J35/06C02F1/30C02F101/30
CPCB01J27/132B01J35/004B01J35/065C02F1/30C02F2101/308
Inventor 姜炜方宏标郝嘎子胡玉冰吕翔耿雪其
Owner NANJING UNIV OF SCI & TECH
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