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Device and method for removing hydrogen fluoride in fluorine gas

A technology of hydrogen fluoride and fluorine gas, which is applied in chemical instruments and methods, separation methods, gas treatment, etc., can solve the problems of fluorine gas liquefaction, etc., and achieve the effects of improving adsorption efficiency, reducing pulverization rate, and strengthening structural strength

Inactive Publication Date: 2020-05-01
PERIC SPECIAL GASES CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0010] The purpose of the present invention is to provide a device and method for removing hydrogen fluoride in fluorine gas. The present invention uses porous structure and cylindrical inner skeleton adsorption balls, which improves the adsorption efficiency and can meet the requirements for the preparation of 99.9% high-purity fluorine gas and high-purity fluorine gas. The requirements of the mixed gas on the HF index; prolong the life of the alkali metal adsorption ball; at the same time, it also solves the problem of liquefaction of fluorine gas in the prior art due to the low temperature

Method used

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  • Device and method for removing hydrogen fluoride in fluorine gas

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Embodiment 1

[0053] A method for removing hydrogen fluoride in fluorine gas, comprising the steps of:

[0054] Step 1, preparing NaF adsorption beads, the NaF adsorption beads use porous spheres as the skeleton, specifically including:

[0055] In step 1-1, NaF and HF are formed into a homogeneous molten mixture at 140° C. according to the molar ratio of 1:1.

[0056] In step 1-2, nickel is added to the mixture in step 1-1 to form porous pellets with a volume of about 0.2 cubic centimeters.

[0057] Step 1-3, lower the temperature to 60°C, wait until a semi-solidified state is formed, and take out the porous pellets with NaF attached.

[0058] Steps 1-4, drying the attached NaF porous beads at 100° C. to form sodium fluoride adsorption beads with a volume of about 0.5 cubic centimeters and porous beads as the skeleton.

[0059] Step 2, the fluorine gas with the HF content of 1200ppm produced by electrolysis is 1.5m 3 / h flow through F 2 The intake pipe 2 enters the adsorption tower equ...

Embodiment 2

[0062] A method for removing hydrogen fluoride in fluorine gas, comprising:

[0063] Step 1, prepare KF adsorption beads, NaF adsorption beads use a cylinder as the skeleton, specifically including:

[0064] Step 1-1, KF and HF are formed into a homogeneous mixture in a molten state at 60° C. according to a molar ratio of 1:6;

[0065] Step 1-2, adding Hastelloy alloy to the mixture in step 1-1 to make a cylinder with a volume of about 0.2 cubic centimeters;

[0066] Step 1-3, lower the temperature to 30°C, wait for a semi-solidified state, and take out the cylinder with KF attached;

[0067] In steps 1-4, the attached NaF cylinder is dried at 200° C. to form sodium fluoride adsorption beads with a volume of about 1.2 cubic centimeters.

[0068] Step 2, the fluorine gas with the HF content of 1400ppm produced by electrolysis in 4m 3 / h flow through F 2 The intake pipe 2 enters the adsorption tower equipped with KF adsorption beads from the lower part of the alkali metal ad...

Embodiment 3

[0071] A method for removing hydrogen fluoride in fluorine gas, comprising:

[0072] Step 1, preparing NaF adsorption beads, the NaF adsorption beads use porous beads as the skeleton, specifically including:

[0073] Step 1-1, forming a homogeneous mixture of NaF and HF in a molten state at 90° C. according to a molar ratio of 1:2.3;

[0074] Step 1-2, adding stainless steel to the mixture in step 1-1 to form porous pellets with a volume of about 1 cubic centimeter;

[0075] Step 1-3, lower the temperature to 50°C, wait until a semi-solidified state is formed, and take out the porous pellets with NaF attached;

[0076] In steps 1-4, the attached NaF porous balls are dried at 100° C. to form sodium fluoride adsorption balls with a volume of about 1.5 cubic centimeters and porous balls as the skeleton.

[0077] Step 2, the fluorine gas with the HF content of 1500ppm produced by electrolysis in 2.5m 3 / h flow through F 2 The intake pipe 2 enters the adsorption tower equipped ...

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Abstract

The invention discloses a device and a method for removing hydrogen fluoride in fluorine gas, belonging to the technical field of fluorine chemical industry. The device comprises an alkali metal adsorption tower, an F2 gas inlet pipeline, an F2 gas outlet pipeline, a nitrogen back-blowing gas inlet pipeline, a nitrogen gas outlet pipeline, a filter and a blow-off pipeline. The method comprises thefollowing steps: step 1, preparing alkali metal adsorption balls; step 2, allowing HF-containing fluorine gas generated by electrolysis to enter an alkali metal adsorption tower and then to enter a filter, and allowing filtered gas to enter a subsequent pipeline so as to obtain purified F2 gas; and step 3, discharging liquid HF in the alkali metal adsorption tower through the blow-off pipeline. According to the invention, by using of cylindrical inner-framework adsorption ball with porous structure, the adsorption efficiency is improved, and the requirements of preparation of high-purity fluorine gas with a purity of 99.9% and high-purity fluorine gas mixed gas on HF indexes can be met; the service life of the alkali metal adsorption balls is prolonged; meanwhile, the problem of fluorineliquefaction caused by over-low temperature in the prior art is also solved.

Description

technical field [0001] The invention belongs to the technical field of fluorine chemical industry, and in particular relates to a device and method for removing hydrogen fluoride in fluorine gas. Background technique [0002] High-purity fluorine gas (F 2 ) is a very active gas with strong oxidizing properties. Due to its reactivity, it is used as an etching gas or cleaning gas in the semiconductor industry to manufacture TFTs (thin film transistors) for photovoltaic cells and liquid crystal displays. At the same time, as a gas for excimer lasers, fluorine lasers are also widely used in the semiconductor industry. While using F 2 As a cleaning agent for chemical vapor deposition (CVD) reaction chamber, with NF 3 Compared to F 2 It is more reactive and does not cause the greenhouse effect. The fluorine gas used for this purpose has seen a substantial increase in demand along with the booming domestic semiconductor industry. In order to meet the needs of the electronics ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D53/04
CPCB01D53/04B01D2253/112B01D2256/26B01D2257/2047
Inventor 王斌张帅齐航李丹丹岳立平袁瑞玲杨少飞安园园
Owner PERIC SPECIAL GASES CO LTD
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