Sampling system for tungsten hexafluoride metal element analysis and using method thereof

A technology for metal element analysis and tungsten hexafluoride, which is applied in the direction of sampling, analyzing materials, sampling devices, etc., can solve the problems of long time consumption, calculation weight gain, large error, etc., achieve a stable and safe volatilization process, and avoid local space negative pressure , The effect of improving the efficiency of sample preparation

Pending Publication Date: 2020-05-05
昊华气体有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this way of sampling, the volatilized tungsten hexafluoride is absorbed by the lye and converted into tungstate, and the product is wasted; the outlet of the sampler is directly connected to the lye absorption bottle, the system has high moisture, and the volatilized tungsten hexafluoride and water vapor are sampled The reaction in the container generates tungstic acid, which affects the continuous volatilization of tungsten hexafluoride; the tungsten hexafluoride heated and volatilized by the sampler is absorbed by multi-stage lye, with high resistance and slow volatilization. When the volatilization speed is too slow, the vapor phase tungsten hexafluoride React with lye to form negative pressure in local space, there is a risk of lye regurgitation leading to sampling failure, and there is a risk of leakage by increasing the heating temperature; the sample volume of the weighing sampler controls the time of closing the cylinder valve, and the stability of the sample volume Higher than the volumetric method; the heat release in the absorption process will cause the lye in the absorption bottle to volatilize, and the helium gas purging will take away part of the volatilized lye. There is a large error in calculating the weight gain of the lye absorption solution for each weighing; it takes about 6 hours to complete a sample preparation, which takes a long time

Method used

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  • Sampling system for tungsten hexafluoride metal element analysis and using method thereof
  • Sampling system for tungsten hexafluoride metal element analysis and using method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Such as figure 1As shown, a sampling system for the analysis of tungsten hexafluoride metal elements, including tungsten hexafluoride container, high-purity gas source, sampling device, vacuum device, collection device, valves and pipelines, tungsten hexafluoride container 1 Through the pipeline, it is connected with high-purity gas source 5, sampling device 2, collection device 3, and vacuum device 4 in sequence. The sampling port of tungsten hexafluoride container 1 is equipped with No. I valve 12, and the outlet pipeline of high-purity gas source 5 is equipped with VII No. valve 18 and No. I pressure gauge 9, No. II valve 13 is installed on the sampling device 2, thermometer 10 and No. II pressure gauge 11 are installed on the collection device 3, No. IV valve 15 is installed on the bottom of the collection device 3, and V is installed on the top No. valve 16; No. VI valve 17 is installed in the vacuum device 4; No. III valve 14 is arranged on the pipeline going to t...

Embodiment 2

[0036] Collection device 3 is an adsorption tower filled with potassium fluoride adsorbent, and the others are the same as in embodiment 1

[0037] Steps:

[0038] (1) Evacuation of the collection device: turn on the vacuum device 4, turn on the collection device 3 to control the temperature, and confirm that the temperature T in the collection device 3 is 20-30°C. Open the No. VI valve 17 and the No. V valve 16 in sequence, and the evacuation collection device 3 to the No. II pressure gauge 11 is -90kPa, and then close the No. V valve 16 and the No. VI valve 17 in turn.

[0039] (2) Sampling device replacement and evacuation: open No. II valve 13, No. III valve 14, open No. VII valve 18 to fill the sampling device 2 and the pipeline with purge gas; close VII valve 18, open VI No. valve 17, Evacuate the sampling device 2 and the pipeline; repeat the blowing and pumping operations 10 times, the last time the system is evacuated until the No. I pressure gauge 9 is -90kPa, and t...

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Abstract

The invention discloses a sampling system for tungsten hexafluoride metal element analysis and a using method thereof. The sampling system comprises a tungsten hexafluoride container, a high-purity gas source, a sampling device, a vacuum device, a valve and a pipeline, and is characterized in that a collecting device is arranged between the sampling device and the vacuum device. The use method ofthe sampling system comprises the following steps: (1) evacuating the collecting device; (2) replacing and evacuating a sampling device; (3) sampling tungsten hexafluoride; and (4) recovering tungstenhexafluoride. Residues in the sampling device are samples for analyzing tungsten hexafluoride metal elements. Tungsten hexafluoride in the pipeline and the sampling device of the sampling system volatilizes to the collecting device through negative pressure, the system has no dead angle, the sampling pipeline and the sampling device are provided with heating devices, and volatilization and collection are complete and thorough.

Description

technical field [0001] The invention relates to a sampling system for analyzing tungsten hexafluoride metal elements and a use method thereof, which can be applied to sample preparation for analysis of tungsten hexafluoride metal elements. Background technique [0002] As one of the indispensable basic and supporting materials in the production of electronic industries such as VLSI, flat-panel display devices, compound semiconductor devices, solar cells, and optical fibers, electron gases are widely used in thin films, etching, doping, and vapor deposition. , Diffusion and other processes. With the rapid development of the industry, the electronics industry has higher and higher requirements for the purity of electronic gases. Tungsten hexafluoride is mainly used in the metal tungsten chemical vapor deposition process in the electronics industry, and WSi made of it 2 It can also be used as a wiring material for large-scale integrated circuits, and can also be used as a raw...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N1/22
CPCG01N1/22G01N1/2214G01N2001/2282
Inventor 吴旭飞张金彪汤月贞黄晓磊牛学坤李金勇袁胜芳
Owner 昊华气体有限公司
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