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Array substrate manufacturing method, array substrate and liquid crystal display device

A technology of an array substrate and a manufacturing method, which is applied in the field of display, can solve problems affecting display effects, etc., and achieve the effect of improving transmittance and transmittance

Active Publication Date: 2020-05-19
HEFEI XINSHENG OPTOELECTRONICS TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, after adding a new film layer structure, the film layer also reflects light of other wavelengths to a certain extent, thereby affecting the display effect.

Method used

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  • Array substrate manufacturing method, array substrate and liquid crystal display device
  • Array substrate manufacturing method, array substrate and liquid crystal display device
  • Array substrate manufacturing method, array substrate and liquid crystal display device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] Such as figure 1As shown, a method for manufacturing an array substrate proposed in Embodiment 1 of the present invention includes manufacturing a gate layer, a gate insulating layer, an active layer, a source / drain layer, a passivation insulating layer, a first an indium tin oxide film layer and a second indium tin oxide film layer.

[0047] Specifically, the gate layer, the gate insulating layer, the active layer, the source / drain layer, the passivation insulating layer, the first indium tin oxide film layer and the second indium tin oxide film layer, the specific composition of these film layers, The thickness and the manufacturing process are conventional means, and will not be repeated here. Gate layer, gate insulation layer, active layer, source / drain layer, passivation insulation layer, first indium tin oxide film layer and second indium tin oxide film layer, the successive stacking of these film layers on the substrate The order can be specifically set accordi...

Embodiment 2

[0076] An array substrate proposed in Embodiment 2 of the present invention includes:

[0077] A glass substrate, a first indium tin oxide film layer, and a second indium tin oxide film layer, the first indium tin oxide film layer is closer to the glass substrate than the second indium tin oxide film layer; wherein, the first The part of the indium tin oxide film layer corresponding to the red pixel area and the green pixel area is the first opening area, and the part of the first indium tin oxide film layer corresponding to the blue pixel area is the second opening area, such as image 3 As shown, the transmittance of the second opening area in the 380nm-450nm light band is lower than the transmittance of the first opening area.

[0078] For example, the specific structure of the array substrate proposed in Embodiment 2 may be:

[0079] 1. A gate layer, a gate insulating layer, an active layer, a source / drain layer, a passivation insulating layer, and a second indium tin oxi...

Embodiment 3

[0086] A liquid crystal display device proposed in Embodiment 3 of the present invention, which includes: an array substrate;

[0087] The array substrate includes: a glass substrate, a first indium tin oxide film layer and a second indium tin oxide film layer, the first indium tin oxide film layer is closer to the glass substrate than the second indium tin oxide film layer ; Wherein, the part of the first indium tin oxide film layer corresponding to the red pixel area and the green pixel area is the first opening area, and the part of the first indium tin oxide film layer corresponding to the blue pixel area is the second opening area, the transmittance of the second opening area in the 380nm-450nm light band is lower than the transmittance of the first opening area.

[0088] Specifically, the array substrates used in the three embodiments of the present invention can directly use the array substrates in the second embodiment, which will not be repeated here.

[0089] In the...

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Abstract

The invention relates to an array substrate manufacturing method, an array substrate and a liquid crystal display device and relates to the technical field of display. The manufacturing method of thefirst indium tin oxide film layer comprises steps manufacturing ofan indium tin oxide film layer and a metal protection layer in a stacked mode, manufacturing a photoresist layer on one side, deviating from the indium tin oxide film layer, of the metal protection layer, exposing by adopting a semi-gray-scale photomask process to enable the photoresist layer to form a first photoresist region and asecond photoresist region, the first photoresist region corresponding to a red pixel region and a green pixel region, the second photoresist region corresponding to a blue pixel region, and the thickness of the first photoresist region being smaller than that of the second photoresist region, etching for the first time, carrying out ashing treatment, etching for the second time, peeling off the second photoresist region, carrying out annealing treatment of the indium tin oxide film layer and the metal protective layer, etching for the third time, and finally obtaining the first indium tin oxide film layer. The array substrate manufactured by the method can reduce damage of blue light to eyes.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a manufacturing method of an array substrate, an array substrate and a liquid crystal display device. Background technique [0002] The liquid crystal display device adopts three primary colors for imaging, and the blue light in the three primary colors is indispensable, but the blue light also has the characteristics of strong penetrating power, especially the high-frequency, high-energy blue-violet light below 450 nanometers, that is, The high-energy visible light mentioned by ophthalmologists has the ability to penetrate the cornea and lens, causing damage to the retina and macula, so the anti-blue light function of liquid crystal display devices has always been a concern of technicians. [0003] In the prior art, the blue light cut-off is achieved by adding a plated high-low refraction matching film structure to the array substrate or color filter plate to enhance the reflec...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1335G02F1/1333G02F1/1362
CPCG02F1/133514G02F1/133516G02F1/1333G02F1/1362G02F1/136222
Inventor 安晖吕艳明叶成枝操彬彬栗芳芳
Owner HEFEI XINSHENG OPTOELECTRONICS TECH CO LTD
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