Negative-type photosensitive resin composition, cured film, and organic EL display and manufacturing method therefor

A photosensitive resin and composition technology, which is applied in chemical instruments and methods, semiconductor/solid-state device manufacturing, organic chemistry, etc., can solve the problems of reduced visibility and contrast, and achieves suppression of changes in the size and width of pattern openings and light-shielding properties. Excellent, high-sensitivity results

Pending Publication Date: 2020-06-09
TORAY IND INC
View PDF12 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In addition, since the organic EL display has a self-luminous element, when external light such as outdoor sunlight enters, the visibility and contrast decrease due to the reflection of the external light.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Negative-type photosensitive resin composition, cured film, and organic EL display and manufacturing method therefor
  • Negative-type photosensitive resin composition, cured film, and organic EL display and manufacturing method therefor
  • Negative-type photosensitive resin composition, cured film, and organic EL display and manufacturing method therefor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0606] The present invention will be described more concretely below with reference to Examples and Comparative Examples, but the present invention is not limited to these ranges. In addition, among the compounds used, the compound which used the abbreviation will show the name below.

[0607] 6FDA: 2,2-(3,4-dicarboxyphenyl)hexafluoropropane dianhydride; 4,4’-hexafluoropropane-2,2-diyl-bis(1,2-phthalic anhydride)

[0608] A-BPEF: "NK ESTER" (registered trademark) A-BPEF (manufactured by Shin-Nakamura Chemical Co., Ltd.; 9,9-bis[4-(2-acryloyloxyethoxy)phenyl]fluorene)

[0609] A-DCP: "NK ESTER" (registered trademark) A-DCP (manufactured by Shin-Nakamura Chemical Co., Ltd.; dimethylol-tricyclodecane diacrylate)

[0610] A-DPH-6E: "NK ESTER" (registered trademark) A-DPH-6E (manufactured by Shin-Nakamura Chemical Co., Ltd.; ethoxylated dipentaerythritol hexaacrylate having six oxyethylene groups in the molecule)

[0611] APC: Argentum-Palladium-Cupper (silver-palladium-copper al...

Synthetic example (A

[0667]18.31 g (0.05 mol) of BAHF, 17.42 g (0.3 mol) of propylene oxide, and 100 mL of acetone were weighed and dissolved in a three-necked flask. A solution in which 20.41 g (0.11 mol) of 3-nitrobenzoyl chloride was dissolved in 10 mL of acetone was added dropwise thereto. After completion of the dropwise addition, the reaction was carried out at -15°C for 4 hours, and then returned to room temperature. The precipitated white solid was collected by filtration, and vacuum-dried at 50°C. 30 g of the obtained solid was put into a 300 mL stainless steel autoclave, dispersed in 250 mL of 2-methoxyethanol, and 2 g of 5% palladium-carbon was added. Hydrogen gas was introduced therein with a balloon, and it was made to react at room temperature for 2 hours. After 2 hours, it was confirmed that the balloon was no longer deflated. After completion|finish of reaction, it filtered and removed the palladium compound which is a catalyst, it distilled off and concentrated under reduced pr...

Synthetic example 1

[0669] The synthesis of synthetic example 1 polyimide (PI-1)

[0670] Under dry nitrogen flow, weigh BAHF 31.13g (0.085mol; relative to the structural units derived from all amines and their derivatives is 77.3mol%), SiDA 1.24g (0.0050mol; relative to the structural units derived from all The structural units of amines and their derivatives are 4.5 mol%), MAP 2.18g (0.020 mol; relative to the structural units derived from all amines and their derivatives is 18.2 mol%)), NMP 150.00g to make it dissolve. A solution in which ODPA 31.02 g (0.10 mol; 100 mol % relative to structural units derived from all carboxylic acids and derivatives thereof) was dissolved in NMP50.00 g was added thereto, stirred at 20° C. for 1 hour, and then heated at 50° C. Stirring was continued for 4 hours. Then, 15 g of xylene was added, and it stirred at 150 degreeC for 5 hours, azeotroping water and xylene. After completion of the reaction, the reaction solution was poured into 3 L of water, and the ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
absorbanceaaaaaaaaaa
particle sizeaaaaaaaaaa
double bond equivalentaaaaaaaaaa
Login to view more

Abstract

The purpose of the present invention is to obtain: a cured film that has high sensitivity, enables formation of a pattern of a low-tapered shape after development, is capable of suppressing a change in the dimensional width of pattern openings before and after thermal curing, and exhibits excellent light-shielding properties; and a negative-type photosensitive resin composition used to form said cured film. This negative-type photosensitive resin composition comprises an alkali-soluble resin (A), a photopolymerization initiator (C1), and a black colorant (Da), wherein: the alkali-soluble resin(A) has a fluorine atom-containing structural unit in a specific proportion and comprises a first resin (A1) that contains at least one selected from the group consisting of polyimides (A1-1), polyimide precursors (A1-2), polybenzoxazoles (A1-3), and polybenzoxazole precursors (A1-4); and the photopolymerization initiator (C1) comprises an oxime ester-based photopolymerization initiator (C1-1) having a specific structure.

Description

technical field [0001] The present invention relates to a negative photosensitive resin composition, a cured film, an organic EL display, and a method for producing the same. Background technique [0002] In recent years, in display devices having thin displays such as smartphones, tablet PCs, and televisions, a large number of products using organic electroluminescent (hereinafter, "EL") displays have been developed. [0003] Generally, an organic EL display has a transparent electrode such as indium tin oxide (hereinafter, "ITO") on the light-extracting side of the light-emitting element, and a metal electrode such as an alloy of magnesium and silver on the non-light-extracting side of the light-emitting element. In addition, in order to divide the pixels of the light-emitting element, an insulating layer such as a pixel dividing layer is formed between the layers of the transparent electrode and the metal electrode. After the pixel division layer is formed, in the area c...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004C07C251/66C07C323/37C09B67/46G02F1/1335G02F1/1339G03F7/027G03F7/031G03F7/037G03F7/075G03F7/20G09F9/00G09F9/30H01L27/32H01L51/50H05B33/02H05B33/10H05B33/22C09B5/24C09B5/62C09B7/00C09B19/02C09B47/04C09B56/02C09B57/00C09B57/04C09B57/12
CPCC07C251/66C07C323/37H05B33/02H05B33/10H05B33/22G03F7/031G03F7/037G09F9/00G09F9/30G03F7/105G03F7/0046G03F7/0388G03F7/0275G03F7/0757C08G73/1017C08G73/1039C08G73/106C08G73/1042C08G73/1053C08G73/1071C08G73/22C08L79/08C09B67/009H10K59/124H10K59/122C08K5/0041C08K5/33C08L33/08C08L71/02G03F7/0382G03F7/0387G03F7/004G03F7/028G03F7/075G03F7/20G03F7/26G03F7/11H01L21/0271C09B19/02C09B47/04C09B5/24C09B5/62C09B56/02C09B57/00C09B57/04C09B57/12C09B7/00H10K59/00H10K50/00C09B67/0041G02F1/133512G02F1/13394H10K50/865H10K71/00H10K59/1201H10K59/1213
Inventor 谷垣勇刚三好一登
Owner TORAY IND INC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap