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Fullerene-like carbon-based composite film and preparation method thereof

A fullerene-like, composite film technology, applied in gaseous chemical plating, metal material coating technology, photovoltaic power generation, etc. Low controllability and other issues, to achieve the effect of high hardness, simple equipment, and low preparation cost

Active Publication Date: 2020-06-16
LANZHOU INST OF PHYSICS CHINESE ACADEMY OF SPACE TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The temperature for preparing fullerene-like carbon-based films by magnetron sputtering is relatively high, the preparation temperature is >300°C, and the temperature sensitivity to the substrate material is relatively harsh, while radio frequency or DC plasma-enhanced chemical vapor deposition technology cannot independently control the plasma The density and energy of the fullerene-like carbon-based film are relatively narrow and the structure control is low.

Method used

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  • Fullerene-like carbon-based composite film and preparation method thereof
  • Fullerene-like carbon-based composite film and preparation method thereof
  • Fullerene-like carbon-based composite film and preparation method thereof

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Embodiment 1

[0026] The specific steps for preparing fullerene-like carbon-based composite films on single crystal Si are as follows:

[0027] (1) With single crystal Si(100) as the substrate, firstly clean it ultrasonically in acetone solution for 5 minutes, then clean it in alcohol solution for 5 minutes, then dry it with a hair dryer and put it on the working table of the coating room (such as figure 1 shown); evacuate the coating chamber so that the vacuum degree is lower than 3×10 -3 Pa, then pass 10Pa of argon gas into the coating chamber, and apply a pulse bias voltage of -800V to the substrate, with a duty ratio of 0.4 and a frequency of 20kHz, and etch and clean the substrate surface for 20 minutes;

[0028] (2) Methane and argon are passed into the coating chamber at a flow ratio of 1:2, so that the air pressure of the coating chamber is 10Pa; the upper plate in the coating chamber is connected with a radio frequency power supply (such as figure 1 shown), the RF power gradually ...

Embodiment 2

[0034] The specific steps for preparing fullerene-like carbon-based composite films on single crystal Si are as follows:

[0035] (1) With single crystal Si(100) as the substrate, firstly clean it ultrasonically in acetone solution for 5 minutes, then clean it in alcohol solution for 5 minutes, then dry it with a hair dryer and put it on the working table of the coating room (such as figure 1 shown); evacuate the coating chamber so that the vacuum degree is lower than 3×10 -3 Pa, then pass 15Pa of argon gas into the coating chamber, and apply a pulse bias voltage of -1200V to the substrate, with a duty cycle of 0.7 and a frequency of 40kHz, and etch and clean the substrate surface for 30 minutes;

[0036] (2) Methane and argon are passed into the coating chamber at a flow ratio of 1:1, so that the air pressure of the coating chamber is 15Pa; the upper plate in the coating chamber is connected with a radio frequency power supply (such as figure 1 shown), the RF power gradually...

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Abstract

The invention relates to a fullerene-like carbon-based composite film and a preparation method thereof, and belongs to the technical field of surface engineering. According to the composite film, a carbon film is adopted as a transition layer, the sp<2> bond content in the carbon film is gradually reduced, and the sp<3> bond content in the carbon film is gradually increased, so that the hardness of the transition layer is gradually transited from being close to a base body to being close to a fullerene-like carbon base layer, and the composite film has high hardness, good binding force and good wear resistance; and the fullerene-like carbon-based composite film is prepared by adopting a direct current-radio frequency plasma enhanced chemical vapor deposition technology, the control over the microstructure of the fullerene-like carbon-based composite film is realized by independently controlling the density and the energy of plasma, and the defects that the energy and the density of theplasma of the fullerene-like carbon-based film prepared through the direct current-radio frequency plasma enhanced chemical vapor deposition technology cannot be independently controlled are overcome.

Description

technical field [0001] The invention relates to a fullerene-like carbon-based composite film and a preparation method thereof, belonging to the technical field of surface engineering. Background technique [0002] Fullerene-like carbon-based film is a new type of carbon-based film, which has high hardness, good toughness and good wear resistance, and has a good application prospect in aerospace active parts. At present, the research on fullerene-like carbon-based films has gradually become a hot spot at home and abroad, and now magnetron sputtering and DC or radio frequency PECVD (plasma enhanced chemical vapor deposition) are mainly used to prepare fullerene-like carbon-based films. The temperature for preparing fullerene-like carbon-based films by magnetron sputtering is relatively high, the preparation temperature is >300°C, and the temperature sensitivity to the substrate material is relatively harsh, while radio frequency or DC plasma-enhanced chemical vapor depositi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/26C23C16/517
CPCC23C16/26C23C16/517Y02E10/549
Inventor 冯兴国周晖张凯锋郑军郑玉刚万志华刘兴光
Owner LANZHOU INST OF PHYSICS CHINESE ACADEMY OF SPACE TECH
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