Preparation method of silicon dioxide for low-specific-surface-area high-density thickening type toothpaste
A low specific surface area, silicon dioxide technology, applied in the direction of chemical instruments and methods, cosmetic preparations, dressing preparations, etc., can solve the problems of low apparent density, high specific surface area, poor friction performance, etc., to achieve surface The effect of high apparent density and small specific surface area
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0026] Embodiment 1, a kind of silicon dioxide for low specific surface area high density thickening type toothpaste
[0027] The preparation method of silicon dioxide for described low specific surface area high density thickening type toothpaste comprises the following steps:
[0028] S1, dissolving the water glass with a modulus of 3.3 in deionized water, adding deionized water after aging for 5 hours to form a water glass solution with a molar concentration of 1.25mol / L;
[0029] S2, configuration molar concentration is the sulfuric acid solution of 6mol / L;
[0030] S3, the sodium sulfate solution that is 10% by mass percent is added in the reaction tank, and the add-on of sodium sulfate solution is 11m 3 , turn on the stirring device, the stirring speed is 30Hz, the temperature is raised to 70°C, and then the water glass solution configured in step S1 and the sulfuric acid solution configured in step S2 are added dropwise at the same time, and the addition amount of the ...
Embodiment 2
[0033] Embodiment 2, a kind of silicon dioxide for low specific surface area high density thickening type toothpaste
[0034] The preparation method of silicon dioxide for described low specific surface area high density thickening type toothpaste comprises the following steps:
[0035] S1, dissolving water glass with a modulus of 3.4 in deionized water, adding deionized water after aging for 5.2 hours to form a water glass solution with a molar concentration of 1.3 mol / L;
[0036] S2, configuration molar concentration is the sulfuric acid solution of 6.2mol / L;
[0037] S3, the sodium sulfate solution that is 10.6% by mass percent is added in the reaction tank, and the addition of sodium sulfate solution is 11.5m 3 , turn on the stirring device, the stirring speed is 32Hz, and the temperature is raised to 72°C, then simultaneously dropwise add the water glass solution configured in step S1 and the sulfuric acid solution configured in step S2, the addition amount of the water gl...
Embodiment 3
[0040] Embodiment 3, a kind of silicon dioxide for low specific surface area high density thickening type toothpaste
[0041] The preparation method of silicon dioxide for described low specific surface area high density thickening type toothpaste comprises the following steps:
[0042] S1, dissolving the water glass with a modulus of 3.5 in deionized water, adding deionized water after aging for 5.4 hours to form a water glass solution with a molar concentration of 1.35mol / L;
[0043] S2, configuration molar concentration is the sulfuric acid solution of 6.4mol / L;
[0044] S3, the sodium sulfate solution that is 11.3% by mass percent is added in the reaction tank, and the addition of sodium sulfate solution is 12m 3 , turn on the stirring device, the stirring speed is 34Hz, and the temperature is raised to 75° C., then simultaneously dropwise add the water glass solution configured in step S1 and the sulfuric acid solution configured in step S2, and the addition amount of th...
PUM
Property | Measurement | Unit |
---|---|---|
modulus | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com