Photoetching plate surface damage repairing solution and application thereof

Abstract

The invention relates to the field of photoetching plate cleaning, in particular to a photoetching plate surface damage repairing solution and application thereof. The photoetching plate surface damage repairing solution comprises potassium dichromate, water-soluble chromium salt, concentrated sulfuric acid and water. The repairing method of the photoetching plate surface damage repairing solutioncomprises the following steps: (1) heating and stirring the repairing solution at the same time, and standing; (2) putting a photoetching plate into the repairing solution for soaking and carrying out ultrasonic treatment; (3) washing the photoetching plate; (4) drying the photoetching plate; and (5) blow-drying the photoetching plate. The repairing solution is simple in preparation and use method and low in cost. The repairing solution can play a good role in repairing embedded particles, chromium injuries and the like on the surface of the photoetching plate, the surface of the cleaned photoetching plate is bright and smooth, and meanwhile, the thickness of a chromium coating of the photoetching plate is not remarkably reduced, so that the photoetching quality of subsequent operation isensured, the product quality is improved, and meanwhile, the loss caused by frequent replacement of a new photoetching plate is reduced.

Description

technical field [0001] The invention relates to the field of cleaning photolithographic plates, in particular to a photolithographic plate surface damage repair solution and application thereof. Background technique [0002] In the production process of semiconductor devices, due to the influence of the quality of the epitaxial surface of the base material itself, the process capability, and the purification ability of the working environment, it is easy to generate particles on the surface of the base material (falling points, dust, metal source collapse during the metal coating process) metal particles), stains (residual glue spots, oil stains), and then produce surface pollution and scratches on the photolithography plate during the photolithography process, which will affect the normal graphics production and directly lead to the decline of product quality, such as regional graphics abnormalities, bad rules etc. Therefore, it is necessary to regularly clean and repair t...

AI Technical Summary

Problems solved by technology

The method for cleaning the photomask of the invention can remove the residual photoresist on the surface of the photomask, but it is not ideal for the cleaning of hard objects on the surface of the photomask or particles embedded in the chrome plating, and it will cause Coating thickness on photomask becomes thinner

[0007] Chinese patent document CN102357481A discloses "a cleaning machine for a plate-throwing machine and a cleaning method for a photolithographic plate" including a control circuit of a plate-throwing washing machine, a driving device, a photolithographic plate clamping device, a water outlet valve, a water spray head, and other components. The surface of the photoresist plate is dried while being shaken during cleaning, but the structure is complex, and only a single photoresist plate can be cleaned, and it is not conducive to the use of redox and acidic cleaning agents, and the cleaning cost is also high

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