Antibacterial silk thread suture line with dual-photoresponse function and preparation method thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- NANCHANG UNIV
- Publication Date
- 2020-08-21
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to the field of silk sutures, in particular to an antibacterial silk suture with dual light response functions and a preparation method thereof. Background technique
[0002] Surgical-site infection (SSI) remains a widespread problem in modern surgery. According to the Centers for Disease Control and Prevention (CDC), the overall incidence of SSI in the United States is estimated at 2.8%, which equates to 756,000 patients per year. Due to inconsistency between studies, the reported incidence of SSI in European countries ranges from 1.5% to 20%; however, the actual incidence of SSI should be underestimated, suggesting that SSI is also a significant problem in Europe. In my country, SSI is the third leading cause of nosocomial infection, second only to urinary system infection and pneumonia. Data show that SSI accounts for 14-16% of nosocomial infections among inpatients, 38% of nosocomial infections are related to SSI, and 2 / 3 of...