Methacrylic resin and preparation method and application thereof

A technology of methacrylic acid and resin, which is applied in the field of photoresist, can solve the problems of high molecular weight cost, difficult control, and unsatisfactory effect, and achieve the effect of increasing the degree of confusion and reducing molecular weight

Inactive Publication Date: 2020-09-29
NINGBO NATA OPTO ELECTRONICS MATERIAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to overcome the above-mentioned deficiencies of the prior art, to provide a kind of methacrylic resin and its preparation method, to solve the problem of high cost, unsatisfactory effect or difficulty in reducing the molecular weight of methacrylic resin in the existing methacrylic resin preparation method. control technical issues

Method used

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  • Methacrylic resin and preparation method and application thereof
  • Methacrylic resin and preparation method and application thereof

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preparation example Construction

[0016] The embodiment of the present invention provides a method for preparing methacrylic resin. Described methacrylic resin preparation method comprises the steps:

[0017] Step S01: dissolving the monomer and the main initiator of the methacrylic resin to prepare a mixed solution of the monomer and the initiator;

[0018] Step S02: In a protective atmosphere, heat up treatment so that the mixed solution undergoes a polymerization reaction.

[0019] Wherein, in the step S01, the monomer of the methacrylic resin and the main initiator are dissolved to construct a reactant mixed solution system to effectively generate the target product under the action of the main initiator, and the described The ratio and concentration of the main initiator and the monomer are used to optimize the reaction system. In one embodiment, control the monomer and the main initiator according to the content of the main initiator to carry out mixed solvent in the ratio of 1%-10% of the total mass o...

Embodiment 1

[0037] The present embodiment one provides a kind of preparation method of methacrylic resin, comprises the following steps:

[0038] (1) 5 parts of methyl methacrylate, 3 parts of butyl acrylate and 2 parts of 2-methyl-2-adamantyl methacrylate are placed in a four-necked flask with ethyl acetate, Stir until the monomers are dissolved, wherein the amount of ethyl acetate used to dissolve the monomers is 3 times the total mass of the monomers;

[0039] (2) After the monomer is dissolved, add tert-butyl peroxybenzoate, stir until dissolved, and the usage amount of tert-butyl peroxybenzoate is 1.3% of the total mass of the monomer;

[0040] (3) Place the four-neck flask with the reaction solution in an oil bath equipped with a magnetic stirrer, install the condenser tube, and the nitrogen port, turn on the condensed water, feed nitrogen, turn on the stirring and raise the temperature to 77°C for free radical polymerization;

[0041] (4) backflow reaction to 5h;

[0042] (5) In...

Embodiment 2

[0047] The present embodiment provides a kind of preparation method of methacrylic resin, comprises the following steps:

[0048] (1) 5 parts of methyl methacrylate, 3 parts of butyl acrylate and 2 parts of 2-methyl-2-adamantyl methacrylate are placed in a four-necked flask with ethyl acetate, Stir until the monomers are dissolved, wherein the amount of ethyl acetate used to dissolve the monomers is 3 times the total mass of the monomers;

[0049] (2) After the monomer is dissolved, add tert-butyl peroxybenzoate, stir until dissolved, and the usage amount of tert-butyl peroxybenzoate is 1.3% of the total mass of the monomer;

[0050] (3) Place the four-neck flask with the reaction solution in an oil bath equipped with a magnetic stirrer, install the condenser tube, and the nitrogen port, turn on the condensed water, feed nitrogen, turn on the stirring and raise the temperature to 77°C for free radical polymerization;

[0051] (4) backflow reaction to 5h;

[0052] (5) The in...

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Abstract

The invention provides a preparation method of methacrylic resin. The preparation method of the methacrylic resin comprises the following steps: dissolving a monomer and a main initiator of the methacrylic resin to prepare a mixed solution of the monomer and the initiator; and in a protective atmosphere, carrying out heating treatment to enable the mixed solution to be subjected to polymerizationreaction. According to the preparation method of the methacrylic resin, the main initiator and the auxiliary initiator have a synergistic effect, and the preparation method can rapidly initiate monomer polymerization to generate a polymer with a specific chain length so that the molecular weight of the prepared resin meets the use requirements of ArF photoresist.

Description

technical field [0001] The invention belongs to the technical field of photoresists, and in particular relates to a methacrylic resin and its preparation method and application. Background technique [0002] As a photosensitive material, photoresist is a key processing material for integrated circuit fine processing technology. Among them, methacrylic acid resin, as a part of the photoresist composition, determines the performance of the photoresist, and is currently a hot spot in the research of photoresist materials. In order to meet the performance requirements of the photoresist, it is necessary to control the molecular weight of the methacrylic resin. The most commonly used method is to add an initiator to perform free radical polymerization to control the molecular weight of the methacrylic resin. Commonly used initiators are azo initiators and peroxides. And the usage is to use azo initiators such as azobiscyanovaleric acid, azobisisovaleronitrile, azobisisobutyroni...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F220/14C08F220/18C08F4/34C08F4/04G03F7/039
CPCC08F220/14C08F4/34C08F4/04G03F7/0397C08F220/1804C08F220/1811C08F2500/02
Inventor 陈鹏马潇樊丹周浩杰顾大公毛智彪许从应
Owner NINGBO NATA OPTO ELECTRONICS MATERIAL CO LTD
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