Non-palladium activation copper plating process and sensitizer and activator thereof

A sensitizer and activator technology, applied in liquid chemical plating, metal material coating process, coating, etc., can solve the problems of difficult control of operation process, high cost, improper time control, etc., to achieve uniformity Improve, speed, improve the effect of flatness

Active Publication Date: 2020-10-13
赤壁市聚茂新材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the cost of palladium ions as a raw material remains high, and the operation process using palladium as an activator is difficult to control. Especially for PC 5G mobile phone antennas, the timing of activation and washing is not properly controlled, and it is easy to miss plating and overflow plating

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] The invention provides a sensitizer for a non-palladium activated copper plating process, which comprises the following components and concentration ratios: tin methanesulfonate 5g / L, tartaric acid 1g / L, ascorbic acid 1g / L, citric acid 5g / L, 2,4-aminopyridine 1g / L, aminosilane coupling agent 1ml / L, surfactant 1ml / L.

[0032] The present invention also provides an activator for a non-palladium activated copper plating process, which includes the following components and concentration ratios: silver nitrate 1g / L, ammonia water 1ml / L, EDTA 1g / L, triethanolamine 1ml / L, 2,4- Aminopyridine 0.5g / L, phosphate ester surfactant 0.1ml / L.

Embodiment 2

[0034] The invention provides a sensitizer for a non-palladium activated copper plating process, which comprises the following components and concentration ratios: tin methanesulfonate 100g / L, tartaric acid 50g / L, ascorbic acid 10g / L, citric acid 50g / L, 2,4-aminopyridine 20g / L, aminosilane coupling agent 10ml / L, surfactant 10ml / L.

[0035] The present invention also provides an activator for a non-palladium-activated copper plating process, comprising the following components and concentration ratios: silver nitrate 20g / L, ammonia water 50ml / L, EDTA 50g / L, triethanolamine 20ml / L, 2,4- Aminopyridine 5g / L, phosphate ester surfactant 10ml / L.

Embodiment 3

[0037] The invention provides a sensitizer for a non-palladium activated copper plating process, comprising the following components and concentration ratios: tin methanesulfonate 50g / L, tartaric acid 25g / L, ascorbic acid 5g / L, citric acid 25g / L, 2,4-aminopyridine 10g / L, aminosilane coupling agent 5ml / L, surfactant 5ml / L.

[0038] The present invention also provides an activator for a non-palladium activated copper plating process, comprising the following components and concentration ratios: silver nitrate 10g / L, ammonia water 25ml / L, EDTA 25g / L, triethanolamine 10ml / L, 2,4- Aminopyridine 2.5g / L, phosphate ester surfactant 5ml / L.

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PUM

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Abstract

The invention provides a non-palladium activation copper plating process. The process comprises the following steps of S1, removing oil; S2, coarsening, coarsening a workpiece by adopting a coarseningsolution, and then carrying out ultrasonic washing; S3, sensitizing, putting the washed workpiece into a sensitizer to be sensitized, wherein the sensitizer is prepared from the following componentsof, in concentration ratio, 5-100g/L of tin methanesulfonate, 1-50g/L of tartaric acid, 1-10g/L of ascorbic acid, 5-50g/L of citric acid, 1-20g/L of 2, 4-aminopyridine, 1-10ml/L of an amino silane coupling agent and 1-10ml/L of a surfactant; S4, activating, putting the sensitized workpiece into an activating agent to be activated, wherein the activating agent is prepared from the following components of, in concentration ratio, 1-20g/L of silver nitrate, 1-50ml/L of ammonia water, 1-50g/L of EDTA, 1-20ml/L of triethanolamine, 0.5-5g/L of 2, 4-aminopyridine and 0.1-10ml/L of phosphate surfactant; S5, pre-coppering; and S6, thickening-copper. The invention provides the non-palladium activated copper plating process, the sensitizer and the activating agent thereof which is low in production cost, good in plating bonding force, green and environment-friendly.

Description

technical field [0001] The invention belongs to the technical field of electroless copper plating, and in particular relates to a non-palladium activated copper plating process and a sensitizer and an activator thereof. Background technique [0002] With the rise and rapid development of 5G technology, the 5G mobile phone antenna process is completed by the activation of copper plating nickel plating metallization process after radium engraving lines on the PC mobile phone case. The usual process steps of activated copper plating and nickel plating metallization are: PC material, PPS material or ceramic material is degreased → roughening → ultrasonic → sensitization → activation → trigger copper / nickel → thick copper / nickel process to complete copper plating or nickel plated. This activated copper-plated nickel-plated metallization process can be applied to the production of 5G base station vibrators and ceramic dielectric filters made of PPS materials. [0003] At present...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C18/18C23C18/22C23C18/28C23C18/30C23C18/38
CPCC23C18/1893C23C18/22C23C18/285C23C18/30C23C18/38
Inventor 朱祖光王世雄
Owner 赤壁市聚茂新材料科技有限公司
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