Non-palladium activation copper plating process and sensitizer and activator thereof
A sensitizer and activator technology, applied in liquid chemical plating, metal material coating process, coating, etc., can solve the problems of difficult control of operation process, high cost, improper time control, etc., to achieve uniformity Improve, speed, improve the effect of flatness
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Embodiment 1
[0031] The invention provides a sensitizer for a non-palladium activated copper plating process, which comprises the following components and concentration ratios: tin methanesulfonate 5g / L, tartaric acid 1g / L, ascorbic acid 1g / L, citric acid 5g / L, 2,4-aminopyridine 1g / L, aminosilane coupling agent 1ml / L, surfactant 1ml / L.
[0032] The present invention also provides an activator for a non-palladium activated copper plating process, which includes the following components and concentration ratios: silver nitrate 1g / L, ammonia water 1ml / L, EDTA 1g / L, triethanolamine 1ml / L, 2,4- Aminopyridine 0.5g / L, phosphate ester surfactant 0.1ml / L.
Embodiment 2
[0034] The invention provides a sensitizer for a non-palladium activated copper plating process, which comprises the following components and concentration ratios: tin methanesulfonate 100g / L, tartaric acid 50g / L, ascorbic acid 10g / L, citric acid 50g / L, 2,4-aminopyridine 20g / L, aminosilane coupling agent 10ml / L, surfactant 10ml / L.
[0035] The present invention also provides an activator for a non-palladium-activated copper plating process, comprising the following components and concentration ratios: silver nitrate 20g / L, ammonia water 50ml / L, EDTA 50g / L, triethanolamine 20ml / L, 2,4- Aminopyridine 5g / L, phosphate ester surfactant 10ml / L.
Embodiment 3
[0037] The invention provides a sensitizer for a non-palladium activated copper plating process, comprising the following components and concentration ratios: tin methanesulfonate 50g / L, tartaric acid 25g / L, ascorbic acid 5g / L, citric acid 25g / L, 2,4-aminopyridine 10g / L, aminosilane coupling agent 5ml / L, surfactant 5ml / L.
[0038] The present invention also provides an activator for a non-palladium activated copper plating process, comprising the following components and concentration ratios: silver nitrate 10g / L, ammonia water 25ml / L, EDTA 25g / L, triethanolamine 10ml / L, 2,4- Aminopyridine 2.5g / L, phosphate ester surfactant 5ml / L.
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