Electromagnetic wave shielding film and preparation method thereof
A technology of shielding film and electromagnetic wave, applied in the field of electronics, can solve the problems of affecting the stability and shielding effect of electromagnetic shielding film, poor bonding between film layers, and high overall thickness of electromagnetic shielding film
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0055] The embodiment of the present invention provides a method for preparing an electromagnetic wave shielding film, comprising the following steps:
[0056] S10. Obtain a carrier layer and an insulating slurry, and deposit the insulating slurry on the carrier layer to obtain an insulating layer;
[0057] S20. Obtain a metal material, and deposit the metal material on the surface of the insulation layer away from the carrier layer by means of sputtering and electroplating to obtain a metal shielding layer;
[0058] S30. Obtain a conductive adhesive material, and deposit the conductive adhesive material on the surface of the metal shielding layer away from the insulating layer to obtain a conductive adhesive layer.
[0059] In the preparation method of the electromagnetic shielding film provided by the embodiment of the present invention, firstly, the insulating slurry is deposited on the carrier layer to prepare the insulating layer. Compared with directly obtaining the form...
Embodiment 1
[0097] An electromagnetic shielding film, comprising the steps of:
[0098] ① Obtain a carrier layer, a mixture of PFA resin and matte polyimide, and deposit the mixture of PFA resin and matte polyimide on the carrier layer to obtain an insulating layer with a thickness of 3 microns;
[0099]②Obtain silicon and gold-silver alloy, put silicon and gold-silver alloy in a vacuum degree not greater than 1*10 -3 Pa, the sputtering speed is 0.5-5m / min, the sputtering current is 3-7A, and the inert gas flow rate is 30-60ppm under the condition of vacuum sputtering 1 micron, and then electroplating to 5 microns to obtain a metal shielding layer with a thickness of 5 microns;
[0100] ③ Obtain a conductive adhesive material, and deposit the conductive adhesive material on the surface of the metal shielding layer away from the insulating layer to obtain a conductive adhesive layer with a thickness of 5 microns; wherein, the resin of the conductive adhesive contains 30-45 % rubber, 10-2...
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 


