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Antistatic photocuring monomer and preparation method thereof, and antistatic photocuring coating

A technology of light-curing coatings and light-curing monomers, applied in conductive coatings, coatings, etc., can solve problems such as general anti-static effect and anti-static index influence

Active Publication Date: 2022-04-22
安徽辅朗光学材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the antistatic effect of traditional intrinsic antistatic resin is average, and the antistatic index is significantly affected by moisture

Method used

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  • Antistatic photocuring monomer and preparation method thereof, and antistatic photocuring coating
  • Antistatic photocuring monomer and preparation method thereof, and antistatic photocuring coating
  • Antistatic photocuring monomer and preparation method thereof, and antistatic photocuring coating

Examples

Experimental program
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Effect test

preparation example Construction

[0113] The preparation method of the antistatic photocurable monomer of one embodiment, comprises the steps:

[0114] S10, dissolving the acylating reagent in an organic solvent, mixing to obtain an acylating reagent solution, and cooling the acylating reagent solution to below 5°C.

[0115] The acylating reagent used in this preparation method is a compound containing two or more acid chloride groups, such as sulfone dichloride, phosphorus oxychloride, phosphorus trichloride, phosphorus pentachloride, phosgene, polybasic acid chloride, Polybasic acid chloride, cyanuric chloride, etc.

[0116] The organic solvent can be toluene, xylene, ethyl acetate, butyl acetate, acetonitrile, tetrahydrofuran and other solvents that do not contain groups such as hydroxyl, carboxyl, amino, etc., to prevent the solvent from participating in the acylation reaction.

[0117] Preferably, step S10 is: add 1 part (number of moles) of an acylating agent to the reaction kettle, then add a certain a...

Embodiment 1

[0140] Add 10g of phosphorus oxychloride to the reaction kettle, then add 200g of butyl acetate, stir evenly, and place the container in an ice-water bath to cool down to below 5°C.

[0141] Add 22g of pentaerythritol triacrylate dropwise in the reactor to prevent the reaction from being too violent; then add 20g of triethylamine dropwise to absorb the generated hydrogen chloride, which is beneficial to the alcoholysis reaction; remove the ice-water bath and stir React for 1 hour.

[0142] Add 20 g of ATO antistatic dispersion liquid dropwise into the reaction kettle, stir and react for 3 hours, then add 10 g of butanol and stir for 1 hour to react the excess phosphorus oxychloride.

[0143] Filter the reaction residue with a 0.22 μm microporous membrane, add 200 g of deionized water, mix and extract to obtain a reaction product. The product was placed in a rotary evaporator at 70° C. to evaporate the solvent in the product to obtain a 100% solid antistatic photocurable monomer...

Embodiment 2

[0145] Add 8 g of sulfone dichloride to the reaction kettle, then add 200 g of butyl acetate, stir evenly, and place the container in an ice-water bath to cool down to below 5°C.

[0146] Add 22g of pentaerythritol triacrylate dropwise in the reactor to prevent the reaction from being too violent; then add 20g of triethylamine dropwise to absorb the generated hydrogen chloride, which is beneficial to the alcoholysis reaction; remove the ice-water bath and stir React for 1 hour.

[0147] 20 g of the aminated graphene dispersion was added dropwise into the reactor, and after stirring for 4 hours, 10 g of butanol was added and stirred for 1 hour to react the excess sulfone dichloride.

[0148] Filter the reaction residue with a 5 μm microporous membrane, add 200 g of deionized water, mix and extract to obtain a reaction product. The product was placed in a rotary evaporator at 75°C to rotate the solvent in the product to obtain a 100% solid antistatic photocurable monomer.

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Abstract

The invention relates to an antistatic photocurable monomer, a preparation method thereof, and an antistatic photocurable coating. Antistatic photocuring monomer has structure shown in general formula (I): NPs represents antistatic unit; X 1 is selected from: O, S, substituted or unsubstituted N or substituted or unsubstituted C; X 2 is selected from: single bond, O, S, substituted or unsubstituted N or substituted or unsubstituted C; R 10 Represents a unit containing an unsaturated bond structure in a photocurable monomer; M is selected from at least one of the following groups: in the above-mentioned antistatic photocurable monomer, the antistatic unit and the photocurable monomer are combined by acylation reaction Valence connection can ensure excellent and stable anti-static performance, which is beneficial to application.

Description

technical field [0001] The invention relates to the technical field of ultraviolet functional coatings, in particular to an antistatic photocuring monomer, a preparation method thereof, and an antistatic photocuring coating. Background technique [0002] Transparent anti-static coatings have been widely used on various protective materials for display screens, protective films and anti-static work areas (EPA). coating. Among them, common antistatic materials include antistatic agents, antistatic inorganic materials and structural conductive polymer materials. In some application fields, the service life of anti-static coatings is required to be longer. For example, on the electrostatic protection materials in EPA work areas, long-term anti-static products are generally required, and the service life is required to be more than 5 years. [0003] Transparent antistatic coatings are mainly UV-curable, mainly including doped and intrinsic types, and traditional antistatic coat...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09D4/02C09D5/24C08J7/06C08J7/044C08L33/12
CPCC09D4/00C09D5/24C08J7/06C08J7/044C08J2333/12
Inventor 张景春司家林胡帅
Owner 安徽辅朗光学材料有限公司