Molybdenum-tungsten sputtering target material and preparation method thereof

A sputtering target material, molybdenum and tungsten technology, applied in the field of powder metallurgy, can solve the problems of large density difference, affecting target structure uniformity, delamination or segregation, etc., achieve small density difference, excellent coating effect, and promote the acquisition of Effect

Active Publication Date: 2020-11-06
XIAMEN HONGLU TUNGSTEN MOLYBDENUM IND CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the preparation of molybdenum-tungsten sputtering targets usually uses molybdenum powder and tungsten powder as raw materials, and the density of molybdenum and tungsten is quite different, which is very prone to layering or segregation of the structure, which affects the uniformity of the structure of the target.

Method used

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  • Molybdenum-tungsten sputtering target material and preparation method thereof
  • Molybdenum-tungsten sputtering target material and preparation method thereof
  • Molybdenum-tungsten sputtering target material and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] 1) Weigh molybdenum powder with a particle size of 6.5μm and a purity of ≥3N and tungsten trioxide powder with a particle size of 8μm and a purity of ≥4N according to the mass fraction of 20% of tungsten trioxide;

[0037] 2) The mixture is prepared by high-energy ball milling process under Ar atmosphere, the ball mill rotating speed is 110rpm, the mixing time is 18h, tungsten balls are used as grinding balls, and the ball-to-material ratio is 6:1;

[0038] 3) The mixed powder obtained in step 2) is placed in a molybdenum boat, the thickness of the powder is 10 mm, and the first-stage reduction is carried out at 480 °C for 1 h in a hydrogen furnace, and then the second-stage reduction is carried out at 920 °C for 1.5 h to obtain Molybdenum-tungsten mixed powder;

[0039] 4) forming the molybdenum-tungsten mixed powder obtained in step 3) by cold isostatic pressing (CIP) to obtain a molybdenum-tungsten green body, the forming pressure is 180MPa, and the pressure holding ...

Embodiment 2

[0044] 1) Weigh molybdenum powder with a particle size of 4.6 μm and a purity of ≥3N and tungsten trioxide powder with a particle size of 8.0 μm and a purity of ≥4N according to the mass fraction of 15% of tungsten trioxide;

[0045] 2) The mixture is prepared by high-energy ball milling process in a vacuum atmosphere, the ball mill rotating speed is 120rpm, and the mixing time is 20h; molybdenum balls are used as grinding balls, and the ball-to-material ratio is 10:1;

[0046] 3) The mixed powder obtained in step 2) is placed in a molybdenum boat, the thickness of the powder is 15mm, first-stage reduction is carried out at 460°C for 1.5h in a hydrogen furnace, and then second-stage reduction is carried out at 910°C for 1.2h, Obtain molybdenum-tungsten mixed powder;

[0047] 4) forming the molybdenum-tungsten mixed powder obtained in step 3) by cold isostatic pressing (CIP) to obtain a molybdenum-tungsten green body, the forming pressure is 150MPa, and the pressure holding tim...

Embodiment 3

[0052] 1) Weigh molybdenum powder with a particle size of 5μm and a purity of ≥3N and tungsten trioxide powder with a particle size of 8μm and a purity of ≥4N according to the mass fraction of 20% of tungsten trioxide;

[0053] 2) The mixture is prepared by high-energy ball milling process under Ar atmosphere, the ball mill rotating speed is 110rpm, the mixing time is 18h, tungsten balls are used as grinding balls, and the ball-to-material ratio is 6:1;

[0054] 3) The mixed powder obtained in step 2) is placed in a molybdenum boat, the thickness of the powder is 10 mm, and the first-stage reduction is carried out at 480 °C for 1 h in a hydrogen furnace, and then the second-stage reduction is carried out at 920 °C for 1.5 h to obtain Molybdenum-tungsten mixed powder;

[0055] 4) forming the molybdenum-tungsten mixed powder obtained in step 3) by cold isostatic pressing (CIP) to obtain a molybdenum-tungsten green body, the forming pressure is 180MPa, and the pressure holding time...

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Abstract

The invention discloses a molybdenum-tungsten sputtering target material and a preparation method thereof. The relative density of the molybdenum-tungsten sputtering target material is 99.0-99.5%, andthe oxygen content is 350-600 ppm. The molybdenum-tungsten sputtering target material is prepared from the following raw materials in percentage by weight: 15-20wt% of tungsten trioxide powder with the purity of at least 4N, and the balance of molybdenum powder with the purity of at least 3N, wherein the particle size of the tungsten trioxide powder is 7-10 mum, and the particle size of the molybdenum powder is 4.5-6.5 mum. The molybdenum-tungsten sputtering target material is suitable for preparing a flat panel display, and has the advantages of uniform structure, no holes and low oxygen content.

Description

technical field [0001] The invention belongs to the technical field of powder metallurgy, in particular to a molybdenum-tungsten sputtering target and a preparation method thereof. Background technique [0002] Vacuum sputtering coating is a commonly used thin film preparation process, and the target is an important raw material for sputtering coating. During sputtering, argon ions are accelerated to impact the surface of the target material under the action of an electric field, so as to exchange energy with the atoms on the surface of the target material, and the atoms of the target material with sufficient energy escape from the surface of the target material and deposit on the surface of the substrate. A thin film is formed on the surface of the substrate. [0003] Molybdenum-tungsten sputtering target is a kind of target that is often used in the vacuum sputtering process. The molybdenum-tungsten thin film obtained by sputtering is mainly used as a transparent conducti...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34B22F9/04B22F9/22B22F3/04B22F3/10B22F3/14
CPCC23C14/3407C23C14/3414B22F9/04B22F9/22B22F3/04B22F3/14B22F3/1007B22F2009/043
Inventor 陈金李保强刘文迪黄志民
Owner XIAMEN HONGLU TUNGSTEN MOLYBDENUM IND CO LTD
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