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Thermal control coating with designable solar absorptivity and preparation method

A technology of solar absorptivity and thermal control coating, applied in coating, metal material coating process, ion implantation plating, etc. Absorption rate, etc.

Inactive Publication Date: 2020-11-27
CHINA ELECTRONIC TECH GRP CORP NO 38 RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, the thermal control coatings used in domestic spacecraft mainly include: organic white paint, black paint, OSR, chemical oxide film, aluminum alloy anodic oxidation layer, etc., but they can only meet the requirements of low solar absorption rate and high solar Absorptivity, unable to realize solar absorptivity of thermal control coating can be designed within a certain range

Method used

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  • Thermal control coating with designable solar absorptivity and preparation method
  • Thermal control coating with designable solar absorptivity and preparation method
  • Thermal control coating with designable solar absorptivity and preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] Put the aluminum alloy test piece (5 pieces) and the polyimide test piece (5 pieces) into the magnetron sputtering deposition equipment for film coating. Wherein, the thickness of the first layer of pure aluminum layer is 100nm, the thickness of the second layer of aluminum nitride layer is 0nm, and the thickness of the third layer of aluminum oxide layer is 10nm.

[0033] Aluminum coating process parameters: vacuum degree 6×10 -1 Pa~8×10 -1 Pa; argon intake volume 120sccm, voltage 550V; current 3A; sputtering time 500s. In this example no aluminum nitride layer was plated. Aluminum oxide plating process parameters: vacuum degree 6×10 -1 Pa~8×10 -1 Pa; argon intake rate 120sccm; power 1200W, sputtering time 10s.

[0034] Thermal radiation performance index test

[0035] Embodiment 1 test piece solar absorptivity test result is as follows table:

[0036] Numbering Polyimide Sample Solar Absorption Rate Aluminum alloy sample solar absorption rate ...

Embodiment 2

[0039] Put the aluminum alloy test piece (5 pieces) and the polyimide test piece (5 pieces) into the magnetron sputtering deposition equipment for film coating. Wherein, the thickness of the first layer of pure aluminum layer is 100nm, the thickness of the second layer of aluminum nitride layer is 10nm, and the thickness of the third layer of aluminum oxide layer is 10nm.

[0040] Aluminum coating process parameters: vacuum degree 6×10 -1 Pa~8×10 -1 Pa; argon intake volume 120sccm, voltage 550V; current 3A; sputtering time 500s. Aluminum nitride coating process parameters: vacuum degree 6×10 -1 Pa~8×10 -1Pa; argon gas intake volume 120sccm; nitrogen gas intake volume 45sccm; voltage 550V; current 3A; sputtering time 250s. Aluminum oxide plating process parameters: vacuum degree 6×10 -1 Pa~8×10 -1 Pa; argon intake volume 120sccm; power 1200W, sputtering time 400s.

[0041] Thermal radiation performance index test

[0042] Embodiment 2 Test piece solar absorption rate te...

Embodiment 3

[0046] Put the aluminum alloy test piece (5 pieces) and the polyimide test piece (5 pieces) into the magnetron sputtering deposition equipment for film coating. Wherein, the thickness of the first layer of pure aluminum layer is 100nm, the thickness of the second layer of aluminum nitride layer is 80nm, and the thickness of the third layer of aluminum oxide layer is 10nm.

[0047] Aluminum coating process parameters: vacuum degree 6×10 -1 Pa~8×10 -1 Pa; argon intake volume 120sccm, voltage 550V; current 3A; sputtering time 500s. Aluminum nitride coating process parameters: vacuum degree 6×10 -1 Pa~8×10 -1 Pa; argon intake volume 120 sccm; nitrogen intake volume 45 sccm; voltage 550V; current 3A; sputtering time 500s. Aluminum oxide plating process parameters: vacuum degree 6×10 -1 Pa~8×10 -1 Pa; argon intake volume 120sccm; power 1200W, sputtering time 400s.

[0048] Thermal radiation performance index test

[0049] Embodiment 3 Test piece solar absorptivity test resul...

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Abstract

The invention discloses a thermal control coating with designable solar absorptivity and a preparation method. A first clay layer, a second clay layer and a third clad layer are successively arrangedon the surface of a substrate from inside to outside. The first clad layer is a pure aluminum layer, the second clad layer is an aluminum nitride layer, and the third clad layer is an aluminum oxide layer. The thermal control coating is prepared on the surface of the aluminum alloy substrate by the preparation method. By designing thickness of a plated film, the solar absorptivity of the thermal control coating can be adjusted within a range of 0.10-0.92.

Description

technical field [0001] The invention relates to the technical field of surface engineering, in particular to a thermal control coating with a programmable solar absorption rate and a preparation method. Background technique [0002] Thermal control coating is a kind of functional coating used to adjust the optical and thermal properties of solid surface to achieve the purpose of thermal control. It is a very important material used in the thermal control system of spacecraft. The thermal control coating maintains the balance of energy absorption and radiation on the outer surface by adjusting the thermal radiation properties of the surface of the object, so as to achieve the purpose of controlling the temperature of the object. Its two most important parameters are solar absorptivity and solar absorptivity. [0003] With the development of future spacecraft towards miniaturization, high integration, and diversified functions, higher requirements are put forward for the ther...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/08C23C14/16C23C14/34
CPCC23C14/0641C23C14/081C23C14/16C23C14/34
Inventor 丁良兵董中林李磊佟文清杨鑫鑫曹立荣
Owner CHINA ELECTRONIC TECH GRP CORP NO 38 RES INST
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