Method for preparing aluminum oxide coating by modulating high-current pulsed arc
A technology of alumina coating and strong current pulse, applied in coating, metal material coating process, vacuum evaporation coating, etc., can solve the problem of poor surface conductivity of target material, aggregation of aluminum arc spot movement, affecting coating quality, etc. The problem is to reduce the generation of large particles, improve the ionization rate, and increase the utilization rate.
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[0066] EXAMPLE 1. Aluminum oxide coating prepared on the tool using pulse arc technology
[0067] Note: This embodiment is deposited on the basal layer as a base layer, and then the aluminum oxide coating is deposited, and then TiN is deposited as a decorative functional layer.
[0068] The coating apparatus used in the present invention is an apparatus for a conventional industrial application: a device for a diameter D = 1 m, a height h = 1m, and is prepared by a coating, and a conventional octahedral structure is used for equipment description. The four-ranks, each column arc has three cathode arc sources.
[0069] See image 3 As shown: The first column is equipped with 3 TI targets, the second column is equipped with 3 Alti (40 / 60) targets, and the third column is equipped with 3 pure metal Al target, and the fourth column is equipped with 3 Alti (50 / 50).
[0070] See Table 1, the main process parameters of the present embodiment are as follows:
[0071] 1. Extract vacuum, h...
Example Embodiment
[0079] Embodiment 2. Composite coating prepared on the tool using pulse arc technology
[0080] Note: This embodiment is used as a base layer as a base layer, and then a composite coating containing an alumina coating is re-deposited, and then the TION is subsequently deposited as a decorative functional layer.
[0081] See image 3 As shown: The first column is equipped with 3 TI targets, the second column is equipped with 3 Alti (50 / 50) targets, and the third column is equipped with 3 pure metal Al target, and the fourth column is equipped with 3 AlCr (30 / 70); In this embodiment, second, 3, and the fourth column source is applied to a pulse arc power source.
[0082] See Table 2, the main process parameters of the present embodiment are as follows:
[0083] 1. Extract vacuum, heating to 450 ° C, and set to 2 turn / min
[0084] 2. Turn the baffle to Ti target forward, extracted into argon 300, hydrogen 300, adjusting the throttle to control the air pressure of 3 Pa, the bias is...
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