Weak-alkali electroplating liquid and application thereof
A technology of electroplating solution and electronic components, which is applied in the field of weak alkali electroplating solution, can solve the problems of not being able to meet the needs of obtaining thicker coatings, and cannot use acidic electroplating solutions, and achieve excellent deep plating ability, excellent stability, and current density range wide effect
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Embodiment 1
[0036] A kind of weak base electroplating liquid, comprises basic electroplating liquid and additive, and described basic electroplating liquid comprises following components: copper pyrophosphate, potassium pyrophosphate, ammoniacal liquor and pyrophosphoric acid, wherein, described copper pyrophosphate is in described basic electroplating liquid The concentration in is 50g / L, and the concentration of described potassium pyrophosphate in described basic electroplating solution is 200g / L, and the concentration of described ammoniacal liquor in described basic electroplating solution is 8mL / L, and described pyrophosphate adjusts The pH value of the basic electroplating solution is 9; the additive includes the following components: a brightener and an auxiliary complexing agent, and the brightener is selected from polyquaternium-2 and 2-mercaptobenzimidazole, wherein the poly The concentration of quaternary ammonium salt-2 in the electroplating solution is 5mL / L, the concentration ...
Embodiment 2
[0038] A kind of weak base electroplating liquid, comprises basic electroplating liquid and additive, and described basic electroplating liquid comprises following components: copper pyrophosphate, potassium pyrophosphate, ammoniacal liquor and pyrophosphoric acid, wherein, described copper pyrophosphate is in described basic electroplating liquid The concentration in the potassium pyrophosphate is 75g / L, the concentration of the potassium pyrophosphate in the basic electroplating solution is 350g / L, the concentration of the ammonia in the basic electroplating solution is 1mL / L, and the pyrophosphoric acid regulates the The pH value of the basic electroplating solution is 7; the additive includes the following components: a brightener and an auxiliary complexing agent, and the brightener is selected from polyquaternium-2 and 2-mercaptobenzimidazole, wherein the poly The concentration of quaternary ammonium salt-2 in the electroplating solution is 10mL / L, the concentration of th...
Embodiment 3
[0040] A kind of weak base electroplating liquid, comprises basic electroplating liquid and additive, and described basic electroplating liquid comprises following components: copper pyrophosphate, potassium pyrophosphate, ammoniacal liquor and pyrophosphoric acid, wherein, described copper pyrophosphate is in described basic electroplating liquid The concentration in is 80g / L, and the concentration of described potassium pyrophosphate in described basic electroplating solution is 310g / L, and the concentration of described ammoniacal liquor in described basic electroplating solution is 3mL / L, and described pyrophosphate regulates The pH value of the basic electroplating solution is 8; the additive includes the following components: a brightener and an auxiliary complexing agent, and the brightener is selected from polyquaternium-2 and 2-mercaptobenzimidazole, wherein the poly The concentration of quaternary ammonium salt-2 in the electroplating solution is 3mL / L, the concentrat...
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