Weak-alkali electroplating liquid and application thereof

A technology of electroplating solution and electronic components, which is applied in the field of weak alkali electroplating solution, can solve the problems of not being able to meet the needs of obtaining thicker coatings, and cannot use acidic electroplating solutions, and achieve excellent deep plating ability, excellent stability, and current density range wide effect

Active Publication Date: 2021-01-05
SUZHOU SHINHAO MATERIALS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Existing electroplating solutions include acidic electroplating solutions and alkaline electroplating solutions, wherein acidic electroplating solutions will corrode magnetic materials in passive components, so acidic electroplating solutions cannot be used; alkaline electroplating solutions mainly refer to pyrophosphate copper plating solutions , using the traditional pyrophosphate copper plating solution can obtain a coating with good adhesion, but the current density can only reach 1-2A / dm when it works 2 , therefore, it can only be used in electroplating processes that do not require much current density, such as thin copper layers, and cannot meet the needs of obtaining thicker coatings.

Method used

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  • Weak-alkali electroplating liquid and application thereof
  • Weak-alkali electroplating liquid and application thereof
  • Weak-alkali electroplating liquid and application thereof

Examples

Experimental program
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Embodiment 1

[0036] A kind of weak base electroplating liquid, comprises basic electroplating liquid and additive, and described basic electroplating liquid comprises following components: copper pyrophosphate, potassium pyrophosphate, ammoniacal liquor and pyrophosphoric acid, wherein, described copper pyrophosphate is in described basic electroplating liquid The concentration in is 50g / L, and the concentration of described potassium pyrophosphate in described basic electroplating solution is 200g / L, and the concentration of described ammoniacal liquor in described basic electroplating solution is 8mL / L, and described pyrophosphate adjusts The pH value of the basic electroplating solution is 9; the additive includes the following components: a brightener and an auxiliary complexing agent, and the brightener is selected from polyquaternium-2 and 2-mercaptobenzimidazole, wherein the poly The concentration of quaternary ammonium salt-2 in the electroplating solution is 5mL / L, the concentration ...

Embodiment 2

[0038] A kind of weak base electroplating liquid, comprises basic electroplating liquid and additive, and described basic electroplating liquid comprises following components: copper pyrophosphate, potassium pyrophosphate, ammoniacal liquor and pyrophosphoric acid, wherein, described copper pyrophosphate is in described basic electroplating liquid The concentration in the potassium pyrophosphate is 75g / L, the concentration of the potassium pyrophosphate in the basic electroplating solution is 350g / L, the concentration of the ammonia in the basic electroplating solution is 1mL / L, and the pyrophosphoric acid regulates the The pH value of the basic electroplating solution is 7; the additive includes the following components: a brightener and an auxiliary complexing agent, and the brightener is selected from polyquaternium-2 and 2-mercaptobenzimidazole, wherein the poly The concentration of quaternary ammonium salt-2 in the electroplating solution is 10mL / L, the concentration of th...

Embodiment 3

[0040] A kind of weak base electroplating liquid, comprises basic electroplating liquid and additive, and described basic electroplating liquid comprises following components: copper pyrophosphate, potassium pyrophosphate, ammoniacal liquor and pyrophosphoric acid, wherein, described copper pyrophosphate is in described basic electroplating liquid The concentration in is 80g / L, and the concentration of described potassium pyrophosphate in described basic electroplating solution is 310g / L, and the concentration of described ammoniacal liquor in described basic electroplating solution is 3mL / L, and described pyrophosphate regulates The pH value of the basic electroplating solution is 8; the additive includes the following components: a brightener and an auxiliary complexing agent, and the brightener is selected from polyquaternium-2 and 2-mercaptobenzimidazole, wherein the poly The concentration of quaternary ammonium salt-2 in the electroplating solution is 3mL / L, the concentrat...

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Abstract

The invention discloses weak-alkali electroplating liquid and application thereof. The weak-alkali electroplating liquid comprises basic electroplating liquid and an additive, wherein concentration ofcopper pyrophosphate in the basic electroplating liquid is 50-100 g / L, concentration of potassium pyrophosphate in the basic electroplating liquid is 200-380 g / L, concentration of ammonia water in the basic electroplating liquid is 0.5-8 mL / L, and the pH value of the basic electroplating liquid is adjusted to 7-9 through pyrophosphoric acid; and the additive comprises the following components: abrightener with concentration of 1-20 mL / L in the electroplating liquid and an auxiliary complexing agent with concentration of 1-10 mL / L in the electroplating liquid. The weak-alkali electroplating liquid has the characteristics of current density being 1-10 A / dm < 2 >, electroplating height being 5-150 [mu] m, excellent coating uniformity and the like, does not contain any harmful compound, is green and environment-friendly, is particularly suitable for electronic elements with complex shapes, and can be used for electroplating copper on the electronic elements with diameters being 5-500 [mu] m.

Description

technical field [0001] The present application relates to the technical field of electroplating, in particular to a weak alkali electroplating solution and its application. Background technique [0002] Passive components, also known as passive components, refer to electronic components that do not affect the basic characteristics of the signal, but only allow the signal to pass through without modification. The most common ones are resistors, capacitors, inductors, ceramic oscillators, crystal oscillators, transformers, etc. As global mobile phones enter the era of 4G, 5G multimedia and smart phones, consumer electronics upgrades and new technology applications, as the most basic electronic components, the total demand for passive components has steadily increased. [0003] In particular, with the demand for miniaturization and light weight of downstream terminal products, chip passive components have become a new trend in demand. For example, chip inductors in passive com...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D3/38C25D7/06
CPCC25D3/38C25D7/0607
Inventor 张芸董培培张星星王靖赵威
Owner SUZHOU SHINHAO MATERIALS
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