Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Low-RDA friction type silicon dioxide and preparation method thereof

A silica and silane coupling agent technology, applied in chemical instruments and methods, cosmetic preparations, inorganic chemistry, etc., can solve the problem of not being suitable for people with weak teeth, increasing the production cost of toothpaste, affecting consumer experience, etc. problems, to achieve the effect of reducing friction capacity, less energy consumption in production, and controllable conditions

Active Publication Date: 2021-01-26
GUANGZHOU FEIXUE MATERIAL TECH +1
View PDF14 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The silica prepared by the above two methods of preparing frictional silica has good friction properties, but the dentin friction value of the prepared silica is relatively high, so it is not suitable for people with weaker teeth when used in toothpaste
[0005] In summary, there are generally technical problems in the prior art such as high dentin friction value, adjustment of formula will lead to changes in toothpaste viscosity, shape, taste, affect consumer experience and increase toothpaste production cost

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Low-RDA friction type silicon dioxide and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Embodiment 1, a kind of low RDA frictional silica and its preparation method

[0029] The preparation method of described low RDA friction type silica, comprises the following steps:

[0030] S1, configuration molar concentration is the sulfuric acid solution of 0.70mol / L;

[0031] S2, adding deionized water to the water glass for dilution and dissolving, aging for 5h, and taking the aged water glass and adding water to dilute it to form a water glass solution with a mass concentration of 0.71mol / L;

[0032] S3, adding volume to the reaction tank is 12m 3 For the sulfuric acid solution prepared in step S1, the stirring device was turned on, the stirring frequency was 35 Hz, and the temperature was raised to 40° C.;

[0033] S4, drip the water glass solution that step S2 makes in the sulfuric acid solution after heating up in step S3, the dripping speed of water glass solution is 22m 3 / h, and the amount added to the water glass solution is 0.8m 3 When adding the sil...

Embodiment 2

[0035] Embodiment 2, a kind of low RDA frictional silica and its preparation method

[0036] The preparation method of described low RDA friction type silica, comprises the following steps:

[0037] S1, configuration molar concentration is the sulfuric acid solution of 0.74mol / L;

[0038] S2, adding deionized water to the water glass for dilution and dissolving, aging for 6.5h, and taking the aged water glass and adding water to dilute it to form a water glass solution with a mass concentration of 0.75mol / L;

[0039] S3, adding volume to the reaction tank is 12m 3 For the sulfuric acid solution prepared in step S1, the stirring device was turned on, the stirring frequency was 38 Hz, and the temperature was raised to 43° C.;

[0040] S4, drip the water glass solution that step S2 makes in the sulfuric acid solution after heating up in step S3, the dripping speed of water glass solution is 24m 3 / h, and the amount added to the water glass solution is 0.8m 3When adding the si...

Embodiment 3

[0042] Embodiment 3, a kind of low RDA frictional silica and its preparation method

[0043] The preparation method of described low RDA friction type silica, comprises the following steps:

[0044] S1, configuration molar concentration is the sulfuric acid solution of 0.80mol / L;

[0045] S2, adding deionized water to the water glass for dilution and dissolving, aging for 8h, and taking the aged water glass and adding water to dilute it to form a water glass solution with a mass concentration of 0.77mol / L;

[0046] S3, adding volume to the reaction tank is 12m 3 For the sulfuric acid solution prepared in step S1, the stirring device was turned on, the stirring frequency was 40 Hz, and the temperature was raised to 45° C.;

[0047] S4, drip the water glass solution that step S2 makes in the sulfuric acid solution after heating up in step S3, the dripping speed of water glass solution is 25m 3 / h, and the amount added to the water glass solution is 0.8m 3 When adding the sil...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
water absorptionaaaaaaaaaa
oil absorption valueaaaaaaaaaa
water absorptionaaaaaaaaaa
Login to View More

Abstract

The invention belongs to the technical field of silicon dioxide, and particularly relates to low-RDA friction type silicon dioxide and a preparation method thereof. According to the method, a sodium silicate solution with the modulus of 3 and the concentration of 0.71-0.77 mol / L is adopted for reaction, neutralization reaction is carried out by dropwise adding alkali into acid, and a silane coupling agent KH570 is added in the process, so that the low-RDA friction type silicon dioxide is prepared. The copper consumption value of the prepared friction type silicon dioxide in 15% dispersion liquid of sorbitol with the concentration of 70% can be as low as 1.2 mg in 10000 times of brushing and grinding, the RDA value is 120-130, the water absorption capacity is 12-16 mL / 20 g, the oil absorption value is 86-101 mL / 100 g, the apparent density is 0.47-0.51 g / mL, and the friction capacity of the silicon dioxide is reduced. A toothpaste prepared from the silicon dioxide provided by the invention is suitable for the elderly, children and other people with weak dentin.

Description

technical field [0001] The invention belongs to the technical field of silicon dioxide, and in particular relates to a low-RDA frictional silicon dioxide and a preparation method thereof. Background technique [0002] Silica has very stable physical and chemical properties, acid and alkali resistance, high temperature resistance, no pollution to the environment, good cleaning performance, good compatibility with raw materials in toothpaste, and high fluorine compatibility, thus replacing Other raw materials such as calcium carbonate are used as abrasives and thickeners in toothpaste. [0003] Toothpaste currently on the market needs to be mixed with thickening silica in a certain proportion to thicken and shape; it is also equipped with friction silica as a friction agent to enhance cleaning ability. In order to ensure the stability of the physical properties of the toothpaste, the amount of silica added is generally relatively fixed. However, the friction performance of t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/154C01B33/157A61K8/25A61Q11/00
CPCA61K8/25A61Q11/00C01B33/154C01B33/157C01P2004/61C01P2006/10C01P2006/19C01P2006/90
Inventor 张文证胡非侯灿明马逸敏林超聪
Owner GUANGZHOU FEIXUE MATERIAL TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products