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A kind of preparation method of fluorinated ceria polishing powder under microwave condition

A technology of lower fluoride ceria and polishing powder, which is applied in the preparation/processing of rare earth metal compounds, chemical instruments and methods, rare earth metal oxyhalide, etc., and can solve the problems of reducing product purity, increasing equipment, and taking time. , to achieve the effect of reducing surface scratches, weakening agglomeration, and simplifying the process flow.

Active Publication Date: 2021-08-31
INNER MONGOLIA UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This approach often entails additional costs and steps, with the risk of time-consuming, additional equipment, and reduced product purity

Method used

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  • A kind of preparation method of fluorinated ceria polishing powder under microwave condition
  • A kind of preparation method of fluorinated ceria polishing powder under microwave condition
  • A kind of preparation method of fluorinated ceria polishing powder under microwave condition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] Embodiment 1 (no microwave control group)

[0038] A preparation method of ceria fluoride polishing powder under water bath conditions, comprising the following steps:

[0039] (1) Take Ce(NO 3 ) 3 ·6H 2 O, NH 4 HCO 3 and NH 4 F is dissolved in deionized water, configure 500mL of 0.0582mol / L cerium nitrate aqueous solution, 125mL of 1.047mol / L ammonium bicarbonate aqueous solution and 125mL of 0.126mol / L ammonium fluoride aqueous solution; The impact of polishing powder preparation does not study the impact of the above-mentioned component content on the polishing powder. The above-mentioned component dosage is a preferred solution in the research process of the present invention, and its selection range meets the following conditions:

[0040] A. NH 4The amount of F is that its fluorine element quality accounts for 5%~7% of the final product quality;

[0041] B. NH 4 HCO 3 and Ce(NO 3 ) 3 ·6H 2 The molar ratio of O is more than 4.5:1;

[0042] C. NH 4 F ...

Embodiment 2

[0054] A preparation method of fluorinated ceria polishing powder under microwave conditions, comprising the following steps:

[0055] (1) Take Ce(NO 3 ) 3 ·6H 2 O, NH 4 HCO 3 and NH 4 Dissolve F in deionized water, prepare 500 mL of 0.0582 mol / L cerium nitrate aqueous solution, 125 mL of 1.047 mol / L ammonium bicarbonate aqueous solution and 125 mL of 0.126 mol / L ammonium fluoride aqueous solution;

[0056] (2) Put the cerium nitrate solution configured in the above (1) into a microwave reactor for microwave heating, and heat the temperature to 65° C., and add the ammonium fluoride solution in the above (1) to it, and magnetically stir evenly;

[0057] (3) Take the ammonium bicarbonate solution configured in (1) above, add the mixed solution of cerium nitrate and ammonium fluoride obtained in (2) above, stir magnetically, and react at a constant temperature of 65° C. for 75 minutes in microwave mode;

[0058] The microwave heating temperature in steps (2) and (3) is the ...

Embodiment 1、2

[0065] Embodiment 1,2 comparative analysis is as follows:

[0066] (1) if figure 1 Shown is the SEM figure of precursor cerium carbonate under the water bath condition that embodiment 1 makes, as figure 2 Shown is the SEM picture of the precursor cerium carbonate under microwave conditions prepared in Example 2; the comparison of the two SEM pictures shows that the cerium carbonate particles prepared under microwave conditions are more round and have better particle dispersibility.

[0067] (2) if image 3 Shown is the SEM figure of fluorinated cerium dioxide under the water bath condition that embodiment 1 makes, as Figure 4 Shown is the SEM figure of the fluorinated cerium oxide under the microwave condition that embodiment 2 makes; By comparison, it can be seen that the cerium oxide particles prepared under the water bath condition have a large-scale agglomeration phenomenon, while the cerium oxide particles prepared under the microwave condition The dispersibility of ...

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Abstract

The invention discloses a preparation method of fluorinated ceria polishing powder under microwave condition, belonging to the technical field of nano rare earth material preparation, comprising the following steps: 3 ) 3 ·6H 2 O was dissolved in deionized water, preheated by microwave, and NH was added to it 4 F; will NH 4 HCO 3 Dissolve in deionized water, add preheated Ce(NO3) to it 3 ·6H 2 O and NH 4 F mixed solution, under microwave conditions, isothermal precipitation reaction generates Ce 2 (CO 3 ) 3 the precursor, and continue to age; the precursor reaction solution is filtered to obtain precipitate, dried at constant temperature, and ground into powder; the precursor powder is calcined to obtain ceria fluoride polishing powder; preparation by the method of the present invention The crystallinity of the fluorided ceria powder particles is high, the morphology is regular (like) spherical, the particle size distribution is uniform, and the dispersibility is good, which further improves the polishing efficiency and polishing accuracy of the fluorided ceria powder.

Description

technical field [0001] The invention belongs to the technical field of preparation of nano-rare earth materials, and in particular relates to a preparation method of fluorinated ceria polishing powder under microwave conditions. Background technique [0002] The polishing principle of the rare earth cerium oxide polishing powder is chemical mechanical polishing. The chemical reaction is also carried out while the surface is physically ground, which makes the cerium oxide polishing powder have high polishing efficiency and excellent polishing quality that are difficult to match with traditional polishing powder. In addition, cerium oxide polishing powder has moderate hardness, long service life, and little pollution to the polishing surface. Therefore, cerium oxide has become the best among many polishing materials in the polishing fields of optical instrument glass, disk glass substrate, optical instrument glass and picture tube. select. With the advancement of science and ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09K3/14
CPCC01P2002/72C01P2004/03C01P2004/32C01P2004/61C09G1/02C09K3/1454C01F17/10C01F17/259
Inventor 贾慧灵徐阳吴锦绣李梅谭心杜鹏飞
Owner INNER MONGOLIA UNIV OF SCI & TECH
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