Repairing base solution for cool mask and production process of repairing base solution

A cooling type and facial mask technology, which is applied in cosmetic preparations, medical preparations containing active ingredients, cosmetics, etc., can solve the problems of not promoting the absorption of active ingredients, skin irritation, etc., to improve human immunity, The effect of increasing skin firmness and simple preparation method

Inactive Publication Date: 2021-02-09
广州诚予化妆品有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, the cooling facial mask on the market has added chemical synthetic menthol in order to reduce the cost. Chemical menthol has a low melting point and keeps the characteristics of long-lasting smell, but the existing cooling facial mask base liquid is irritating to the skin; and the existing Although a large number of fun...

Method used

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  • Repairing base solution for cool mask and production process of repairing base solution
  • Repairing base solution for cool mask and production process of repairing base solution

Examples

Experimental program
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Effect test

Embodiment 1

[0019] Embodiment 1, the present invention provides a technical solution: a repairing base liquid for a cool facial mask, comprising the following components: 75% of deionized water; 8% of butanediol; 3% of glycerol polyether-26; 3% of diglycerin %; disodium EDTA 0.06%; hydroxyethyl cellulose 0.19%; transparent xanthan gum 0.3%; sodium hyaluronate 1.2%; hydrolyzed hyaluronic acid 1.2%; ; Dipotassium Glycyrrhizinate 0.15%; Aloe Vera Extract 2%; Glacier Water 1.2%; Glabridin 0.14%; Peppermint Essential Oil 0.04%; Tween 20 0.3%; Hexapeptide-8 0.32%; silk amino acids 0.14%; soluble collagen 0.24%; menthol lactate 0.03%; styrene / acrylic acid (ester) copolymer 0.23%; 1,2-hexanediol 0.6%.

[0020] Among them, butanediol and diglycerin are used as dissolving agents; glyceryl polyether-26, sodium hyaluronate, hydrolyzed hyaluronic acid, amino acid humectants and 1,2-hexanediol are used as humectants; glacier water, Tween 20 and styrene / acrylic (ester) copolymers as penetrants; Glabrid...

Embodiment 2

[0025]Embodiment 2, the present invention provides a kind of technical scheme: a kind of refreshing base liquid for face mask, comprising following components (expressed in terms of mass percentage): deionized water 72%; butylene glycol 7%; glycerol polyether-264 %; diglycerin 2%; disodium EDTA 0.08%; hydroxyethyl cellulose 0.15%; transparent xanthan gum 0.2%; sodium hyaluronate 1.3%; hydrolyzed hyaluronic acid 1.2%; Acetophenone 0.4%; Dipotassium Glycyrrhizinate 0.2%; Aloe Vera Extract 2%; Glacier Water 1.6%; Glabridin 0.18%; Peppermint Essential Oil 0.04%; Tween 20 0.5%; 1.3%; Acetyl Hexapeptide-8 0.25%; Silk Amino Acids 1.2%; Soluble Collagen 1.2%; Menthol Lactate 0.04%; Styrene / Acrylic (ester) Copolymer 0.32%; Alcohol 0.8%.

[0026] Wherein, the preparation method of the restoration base fluid is basically the same as that in Example 1, the only difference being that the ratio of each component is different.

Embodiment 3

[0027] Embodiment 3, the present invention provides a kind of technical scheme: a kind of cool and refreshing face mask is used repairing base fluid, comprises following component (expressed according to mass percentage): deionized water 74%; Butylene glycol 7%; Glyceryl polyether-262 %; diglycerin 2%; disodium EDTA 0.06%; hydroxyethyl cellulose 0.1%; transparent xanthan gum 0.3%; sodium hyaluronate 0.7%; hydrolyzed hyaluronic acid 0.9%; Acetophenone 0.4%; Dipotassium Glycyrrhizinate 0.2%; Aloe Vera Extract 3%; Glacier Water 0.6%; Glabridin 0.23%; Peppermint Essential Oil 0.04%; Tween 20 0.5%; 0.8%; Acetyl Hexapeptide-8 1.41%; Silk Amino Acids 1.2%; Soluble Collagen 1.3%; Menthol Lactate 0.1%; Styrene / Acrylic (Ester) Copolymer 0.3%; Alcohol 0.8%.

[0028] Wherein, the preparation method of the restoration base fluid is basically the same as that in Example 1, the only difference being that the ratio of each component is different.

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PUM

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Abstract

The invention discloses a repairing base solution for a cool mask. The repairing base solution comprises the following components: 70%-90% of deionized water, 6%-10% of butanediol, 1%-5% of glyceryl polyether-26, 1%-5% of diglycerol, 0.05%-0.1% of disodium EDTA (Ethylene Diamine Tetraacetic Acid), 0.1%-0.2% of hydroxyethyl cellulose, 0.1%-0.5% of transparent xanthan gum, 0.1%-2% of sodium hyaluronate, 0.1%-2% of hydrolyzed hyaluronic acid, 1%-3% of an amino acid humectant, 0.3% to 0.5% of p-hydroxyacetophenone, 0.1%-0.2% of dipotassium glycyrrhizinate, 1%-4% of an aloe extracting solution, 0.1%-2% of glacier water, 0.01% to 0.3% of glabridin, 0.01%-0.1% of mint essential oil, 0.1%-1% of Tween 20, 0.01%-0.1% of essence, and 0.1%-2% of a witch hazel extract. Through the combined action of glacier water, the Tween 20 and a styrene/acrylic acid (acrylate) copolymer, the permeation effect of the repair base solution is improved, and the efficiency of absorbing the repair base solution by skin is promoted, so that the moisturizing effect is improved. Moreover, the repair base solution can promote metabolism of the skin, activate cells and fundamentally improve the skin quality of the skin, so that the effects of whitening and moistening the skin are achieved.

Description

technical field [0001] The invention relates to the technical field of facial mask base fluid, in particular to a repairing base fluid for a refreshing facial mask and a production process thereof. Background technique [0002] There are mainly four types of facial masks: mud cream type, tear-off type, gel type, and mask type. Mud-cream masks include seaweed masks, mineral mud masks, etc. The most common tear-off masks are nose strips for blackheads. The gel-type masks are most famous for sleeping masks. face mask sheet. Along with the development of beauty technology, a kind of facial mask made of silk has appeared, strictly speaking, it should be classified into the wet tissue facial mask. [0003] The principle of the mask is to use the short time covered on the face to temporarily isolate the outside air and pollution, increase the temperature of the skin, expand the pores of the skin, promote the secretion and metabolism of sweat glands, increase the oxygen content of...

Claims

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Application Information

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IPC IPC(8): A61K8/9794A61K8/34A61K8/37A61K8/49A61K8/63A61K8/64A61K8/65A61K8/73A61K8/86A61K8/92A61K8/96A61K8/9789A61Q19/00A61Q19/02
CPCA61K8/345A61K8/37A61K8/498A61K8/4993A61K8/63A61K8/64A61K8/65A61K8/73A61K8/731A61K8/735A61K8/86A61K8/922A61K8/965A61K2800/782A61Q19/00A61Q19/02A61K8/9789A61K8/9794
Inventor 桑忠国裴全峰
Owner 广州诚予化妆品有限公司
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