Low-irritation sunscreen lotion and preparation method thereof

A sunscreen and low-irritation technology, applied in the field of sunscreen, can solve the problems of skin aging, skin inflammation and poor improvement of erythema, achieve high sun protection index, safe and simple preparation method, and avoid irritation

Inactive Publication Date: 2021-02-19
GUANGDONG MARUBI BIOLOGICAL TECH CO LTD
View PDF11 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although it discloses glucosyl rutin and ethylhexyl triazone, it is not good for skin aging, facial flushing, skin inflammation and erythema problems that occur in the sun

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Low-irritation sunscreen lotion and preparation method thereof
  • Low-irritation sunscreen lotion and preparation method thereof
  • Low-irritation sunscreen lotion and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] The low-irritant sunscreen lotion of this embodiment, by mass percentage, comprises the following components:

[0038]

[0039] Wherein, the first sunscreen agent encapsulation compound is a mixture of methyl methacrylate cross-linked polymer, butylmethoxydibenzoylmethane and ethylhexyl triazinone, butylmethoxydibenzoylmethane and ethylhexyl The mass ratio of triazinone is 1:1, and the second sunscreen agent encapsulation compound is water, ethylhexyl methoxycinnamate, silica, phenoxyethanol, polyvinylpyrrolidone, chlorphenesin, ethylenediaminetetramine The mixture of disodium acetate and butylated hydroxytoluene, the mass of ethylhexyl oxycinnamate accounts for 20% of the encapsulated compound of the second sunscreen agent, and the first soothing anti-sensitizer is myrrh with a mass ratio of 1:1 Alcohol and ginger (ZINGIBER OFFICINALE) root extract, the second soothing anti-allergic agent is butanediol, 1,2-pentanediol, hydroxyphenylpropionamide benzoic acid and asc...

Embodiment 2

[0042] The low-irritant sunscreen lotion of this embodiment, by mass percentage, comprises the following components:

[0043]

[0044]

[0045] Wherein, the first sunscreen agent encapsulation compound is a mixture of methyl methacrylate cross-linked polymer, butylmethoxydibenzoylmethane and ethylhexyl triazinone, butylmethoxydibenzoylmethane and ethylhexyl The mass ratio of triazinone is 1:1, and the second sunscreen agent encapsulation compound is water, ethylhexyl methoxycinnamate, silica, phenoxyethanol, polyvinylpyrrolidone, chlorphenesin, ethylenediaminetetramine The mixture of disodium acetate and butylated hydroxytoluene, the mass of ethylhexyl oxycinnamate accounts for 20% of the second sunscreen-encapsulating compound, and the first soothing and anti-sensitizing agent is myrrh with a mass ratio of 1:1 Alcohol and ginger (ZINGIBER OFFICINALE) root extract, the second soothing anti-allergic agent is butanediol, 1,2-pentanediol, hydroxyphenylpropionamide benzoic a...

Embodiment 3

[0048] The difference between this example and Example 1 is that the mass ratio of butylmethoxydibenzoylmethane and ethylhexyltriazinone in the first sunscreen agent is 1:5, and the others are the same as those in Example 1. .

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a low-irritation sunscreen lotion and a preparation method thereof. The low-irritation sunscreen lotion disclosed by the invention comprises the following components: 0.5-5% ofan emulsifier, 0.1-5% of a thickener, 10-15% of a first sunscreen agent coating compound, 20-30% of a second sunscreen agent coating compound, 0.02-0.2% of a first soothing anti-allergy agent, 0.1-1%of a second soothing anti-allergy agent, 0.01-0.3% of magnolol, 5-10% of 1,3-butanediol, 0.2-2% of glucosylrutin, 3-6% of polydimethylsiloxane, 0.1-0.5% of xanthan gum, 0.1-1% of a preservative, and30-60% of water, wherein the sum of the mass percentages of the components is 100%. The low-irritation sunscreen lotion prepared by the invention is high in sunscreen index, good in stability and mild; irritation brought to the skin due to the fact that a sunscreen agent is in direct contact with the skin is avoided; and the skin feels fresh and cool and is free of greasy feeling.

Description

technical field [0001] The invention relates to the technical field of sunscreen lotions, to a sunscreen lotion and a preparation method thereof, in particular to a low-irritant sunscreen lotion and a preparation method thereof. Background technique [0002] Sunscreen lotion is a skin care product that uses the principle of sunscreen to protect the skin from ultraviolet rays, thereby avoiding the production and accumulation of melanin. It is applied to the skin to prevent sunlight from contacting the skin. Compared with sunscreen, sunscreen is more refreshing because it contains more water, so it is favored by more consumers. [0003] In order to play a role in sunscreen, sunscreen will add sunscreen. Some sunscreens are irritating due to direct contact with the skin. Therefore, for some people with sensitive skin, after using sunscreen products, it will cause skin redness, allergies and other discomfort. [0004] CN108670890B discloses an organic sunscreen composition and...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9794A61K8/67A61K8/34A61K8/44A61K8/81A61K8/25A61K8/37A61K8/35A61K8/49A61Q17/04
CPCA61K8/9794A61K8/676A61K8/345A61K8/342A61K8/44A61K8/347A61K8/8176A61K8/34A61K8/25A61K8/37A61K8/35A61K8/4966A61K8/8152A61Q17/04A61K2800/592
Inventor 孙怀庆裴运林胡越聂艳峰郭朝万胡露
Owner GUANGDONG MARUBI BIOLOGICAL TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products