Hydrophobic high-nickel ternary positive electrode material and preparation method thereof
A positive electrode material, high-nickel technology, applied in the direction of positive electrodes, electrical components, battery electrodes, etc., can solve the problems of reducing the industrialization degree of high-nickel ternary positive electrode materials for lithium-ion batteries, battery performance degradation, and slurry cannot be coated , to achieve the effect of improving homogenization and coating processing performance, stabilizing the surface structure, and achieving hydrophobicity
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Embodiment 1
[0019] S1: Add 1g of perfluorodecyltrimethoxysilane to a continuously stirring 20mL reaction vessel of a mixture of deionized water and ethanol, stir at 50°C for 10min, then add acetic acid, and continue stirring for 30min to obtain a fluorosilane solution ;
[0020] S2: Add 100g of NCM811 positive electrode material to a solid stirrer, stir at room temperature at high speed, then spray the fluorosilane solution prepared in S1 on the surface of the high-nickel ternary positive electrode material, continue to stir at high speed for 20min, and then put it in a vacuum drying oven to dry;
[0021] S3: The product in S2 is sintered and heat-treated at 500° C. for 3 hours in an inert gas atmosphere furnace, crushed and sieved to obtain a hydrophobic high-nickel ternary positive electrode material.
Embodiment 2
[0023] S1: Add 2g of perfluorodecyltrimethoxysilane into a continuously stirred 50mL reaction vessel of a mixture of deionized water and ethanol, stir at 50°C for 10min, then add acetic acid, and continue stirring for 30min to obtain a fluorosilane solution ;
[0024] S2: Add 100g of NCM811 positive electrode material to a solid stirrer, stir at room temperature at high speed, then spray the fluorosilane solution prepared in S1 on the surface of the high-nickel ternary positive electrode material, continue to stir at high speed for 20min, and then put it in a vacuum drying oven to dry;
[0025] S3: The product in S2 is sintered and heat-treated at 500° C. for 3 hours in an inert gas atmosphere furnace, crushed and sieved to obtain a hydrophobic high-nickel ternary positive electrode material.
Embodiment 3
[0027] S1: Add 0.5g of perfluorodecyltrimethoxysilane to a continuously stirred 20mL reaction vessel of a mixture of deionized water and ethanol, stir at 50°C for 10min, then add acetic acid, and continue stirring for 30min to obtain fluorosilane solution;
[0028] S2: Add 100g of NCM811 positive electrode material to a solid stirrer, stir at room temperature at high speed, then spray the fluorosilane solution prepared in S1 on the surface of the high-nickel ternary positive electrode material, continue to stir at high speed for 20min, and then put it in a vacuum drying oven to dry;
[0029] S3: The product in S2 is sintered and heat-treated at 500° C. for 3 hours in an inert gas atmosphere furnace, crushed and sieved to obtain a hydrophobic high-nickel ternary positive electrode material.
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