Copper-containing antibacterial thin-layer composite film as well as preparation method and application thereof
A composite membrane and thin-layer technology, applied in the field of separation membranes, can solve the problems of poor durability of antibacterial performance on the surface of the membrane, long post-treatment time, and increased preparation steps, etc., achieve good industrial production prospects, increase durable antibacterial ability, and simple preparation method Effect
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Embodiment 1
[0057] Add 1 g of ethylenediamine and 100 mL of deionized water to 0.812 g of copper hydroxide and stir to obtain an ethylenediamine solution of copper hydroxide, and add 100 mL of Isopar E to 0.1 g of trimesoyl chloride and stir to obtain a trimesoyl chloride solution. Contact the upper surface of the polysulfone support layer with an ethylenediamine solution containing copper hydroxide, and discharge the liquid after contacting it for 60 seconds at 25°C; then, contact the upper surface of the support layer with a trimesoyl chloride solution, and discharge it after contacting it for 30 seconds at 25°C solution; then, the film was put into an oven and heated at 70°C for 2 min to obtain the composite film CuR1. X-ray photoelectron spectroscopy test shows that the mass content of copper on the surface of the composite film is 8.2wt%. Wherein, the average thickness of the polyamide separation layer is 185 nm.
[0058] Soak the obtained composite membrane CuR1 in water for 24 hou...
Embodiment 2
[0060] Add 0.5 g of ethylenediamine and 100 mL of deionized water to 0.487 g of copper hydroxide and stir to obtain an ethylenediamine solution of copper hydroxide, and add 100 mL of Isopar E to 0.1 g of trimesoyl chloride and stir to obtain a trimesoyl chloride solution. Contact the upper surface of the polysulfone support layer with an ethylenediamine solution containing copper hydroxide, and discharge the liquid after contacting it for 30 seconds at 25°C; then, contact the upper surface of the support layer with a trimesoyl chloride solution, and discharge it after contacting it for 30 seconds at 25°C solution; then, the film was put into an oven and heated at 80°C for 3 min to obtain the composite film CuR2. X-ray photoelectron spectroscopy test shows that the mass content of copper on the surface of the composite film is 5.1wt%. Wherein, the average thickness of the polyamide separation layer is 153 nm.
[0061] Soak the obtained composite membrane CuR2 in water for 24 h...
Embodiment 3
[0063] Add 0.1 g of ethylenediamine and 100 mL of deionized water to 0.065 g of copper hydroxide and stir to obtain an ethylenediamine solution of copper hydroxide, and add 100 mL of Isopar G to 0.05 g of trimesoyl chloride and stir to obtain a trimesoyl chloride solution. Contact the upper surface of the polysulfone support layer with an ethylenediamine solution containing copper hydroxide, and discharge the liquid after contacting it for 60 seconds at 25°C; then, contact the upper surface of the support layer with a trimesoyl chloride solution, and discharge it after contacting it for 60 seconds at 25°C solution; then, the film was put into an oven and heated at 90°C for 5 min to obtain a composite film CuR3. X-ray photoelectron spectroscopy test shows that the mass content of copper on the surface of the composite film is 1.8wt%. Wherein, the average thickness of the polyamide separation layer is 139 nm.
[0064] Soak the obtained composite membrane CuR3 in water for 24 ho...
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