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Method and device for quantitatively analyzing trace urea

A quantitative analysis of urea technology, applied in the direction of material resistance, etc., can solve the problems of limited accuracy of the detection principle, the inability to rule out the influence of citrulline, and the inability to measure trace urea, etc., to achieve a high degree of integration, high accuracy, and reproducibility good sex effect

Pending Publication Date: 2021-03-26
CHINA ELECTRONICS SYST ENG NO 2 CONSTR
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, diacetyl monoxime does not only react with urea to develop color, but also reacts with its metabolite citrulline. This measurement method cannot exclude the influence of citrulline; and the detection principle of this method has limited accuracy, and the detection limit is 0.1ppm , unable to detect lower trace urea, mostly used in swimming pools and other places, not suitable for urea detection of raw water prepared from pure water
[0008] It can be seen from the above that the prior art has the problems of limited accuracy of detection principle, inability to measure trace urea, and low level of equipment sampling automation and integration; in view of the above problems, the present invention aims to provide a method for quantitative analysis of trace urea method and device

Method used

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  • Method and device for quantitatively analyzing trace urea
  • Method and device for quantitatively analyzing trace urea
  • Method and device for quantitatively analyzing trace urea

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0050] Example 1: The advanced oxidation method experiment in the early stage is as follows: 2000mL ultrapure water (TOC<1ppb) was taken from the pure water station of a semiconductor factory for the experiment. At 23°C, the dosage of NaClO and NaBr was adjusted to reasonably adjust the pH value of the process; Among them, the situation with the best advanced oxidation effect is: configure 200ppb urea solution, heat in a water bath at 23°C, add 10ppm NaClO solution and 22ppm NaBr solution, adjust the pH to 8.5-9.0, and find that the urea concentration in the solution is 40ppb after 30 minutes.

[0051] Under the above experimental conditions, the experiment was carried out by changing the temperature to obtain Table 1, and it was found that the temperature had a great influence on the reaction.

[0052] serial number temperature / ℃ Effluent urea concentration / ppb 1 15 132 2 18 99 3 20 67 4 23 40 5 25 42 6 27 40 7 30 38 ...

Embodiment 2

[0053] Embodiment 2: form the present invention by embodiment 1, assemble corresponding device according to the method described in the present invention: the standard solution of 20ppb, 50ppb, 100ppb, 250ppb, 500ppb, 750ppb, 1000ppb urea is supplied to water inlet end respectively, then continuously monitors For the urea concentration of the standard solution, the number of measurements for each standard solution is 10 times, and the results are averaged. The measurement time for a single data is 2 minutes (the micro sampler changes gears once every 1 minute), and the raw water urea concentration and conductivity (C1 , C2, C2-C1) relationship diagram ( image 3 );exist image 3 In the example, the flow rate of the syringe pump P1 is 5mL / min; the UV decomposer A uses a UV lamp with a wavelength of 185nm, and the power is 4W; the organic adsorber B is filled with 30mL resin, 1BV / h, macroporous strong base resin and macroporous weak base The resin ratio is 3:1; the volume of th...

Embodiment approach

[0056] As an embodiment of the present invention, a return spring 322 is provided in the slide hole 321; one end of the return spring 322 is affixed to the side wall of the slide hole 321, and the other end of the return spring 322 is affixed to the limit rod 33; when the connecting plate 32 is moving, the connecting plate 32 squeezes the return spring 322, and the return spring 322 pulls the limit rod 33 at the same time, and pulls the push plate 31 downward. At this time, the push plate 31 moves downward, and the roller 121 is able to Effectively squeeze the push plate 31 again, the push plate 31 will return to the original state after squeezing the pump tube 21, and the depressed part of the pump tube 21 will no longer squeeze the push plate 31, so that the pump tube 21 will return to the liquid-absorbing state in time , so that the pump tube 21 can effectively suck liquid.

[0057] As an embodiment of the present invention, the other end of the limiting rod 33 is provided ...

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Abstract

The invention belongs to the technical field of water quality analysis, and particularly relates to a method and a device for quantitatively analyzing trace urea. The method for quantitatively analyzing the trace urea comprises the following steps that: S1, water firstly passes through an injection pump P1 and a flow sensor F1; S2, after entering a pretreatment unit, the inlet water sequentially enters an ultraviolet decomposer A and an organic adsorber B; S3, the pretreated inlet water is pumped into a microsyringe C through a peristaltic pump W; S4, during sample introduction, the sample solution is mixed with carrier water, and then the mixture enters a detection unit; S5, the carrier water enters a detection unit to analyze the urea concentration. According to the method and the devicefor quantitatively analyzing trace urea, the urea concentration of raw water or produced water prepared from ultrapure water in a semiconductor / liquid crystal panel factory can be accurately measured, and the method has the advantages of high accuracy, high precision and high device integration degree.

Description

technical field [0001] The invention belongs to the technical field of water quality analysis, in particular to a method and device for quantitative analysis of trace urea. Background technique [0002] Ultrapure water is a necessary auxiliary material for the production of semiconductor / LCD panel factories, and the water quality requirements are quite high. Preparation of ultrapure water Raw water basically comes from municipal tap water, which is multi-stage treated by pretreatment system, manufacturing system, and polishing system to obtain ultrapure water, which is used in the production of semiconductor / LCD panel factory products. [0003] Municipal tap water is sometimes mixed with trace amounts of urea, the concentration is generally 50-200ppb, and the conversion to TOC is only 10-40ppb; while the ultrapure water preparation system has limited ability to remove urea, which eventually causes the TOC of the produced water to exceed the standard, affecting the production...

Claims

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Application Information

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IPC IPC(8): G01N27/06
CPCG01N27/06
Inventor 陈炜彧罗嘉豪周伟熊江磊李军冠张学良罗峥翟新桥
Owner CHINA ELECTRONICS SYST ENG NO 2 CONSTR
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