Erbium-doped polarization-maintaining active optical fiber and preparation method thereof
A technology of optical fiber and fiber core, applied in the field of erbium-doped polarization-maintaining active optical fiber and its preparation
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Embodiment 1
[0042] A method for preparing an erbium-doped polarization-maintaining optical fiber, comprising the steps of:
[0043] (1) Pretreatment of the substrate tube to preheat the substrate tube and effectively eliminate impurities and air bubbles on the inner wall of the substrate tube. The preheating temperature: 800°C, and the preheating time: 5 minutes;
[0044](2) Carry out in-tube deposition. The deposition process is followed by pure silicon cladding deposition, stress layer deposition, and pure silicon cladding deposition. The deposition temperature of the pure silicon cladding 1 is 1900 ° C. 4 The deposition flow rate is 20-300sccm, the deposition rate is 10mm / min, and the number of deposition layers is 2 layers; the stress layer deposition 2 temperature is 1700°C, SiO 2 Flow: 200sccm, GeCl 4 Flow: 50sccm, BCl 3 Flow rate: 800sccm, deposition rate is 20mm / min; the deposition temperature of the pure silicon cladding 1 is 1900°C, SiCl 4 The deposition flow rate is 20sccm, ...
Embodiment 2
[0051] A method for preparing an erbium-doped polarization-maintaining optical fiber, comprising the steps of:
[0052] (1) Pretreatment of the substrate tube to preheat the substrate tube and effectively eliminate impurities and air bubbles on the inner wall of the substrate tube. The preheating temperature: 900°C, and the preheating time: 7 minutes;
[0053] (2) In-tube deposition is carried out, and the deposition process is followed by pure silicon cladding deposition, stress layer deposition, and pure silicon cladding deposition; wherein the deposition temperature of the pure silicon cladding 1 is 2000 ° C, SiCl 4 The deposition flow rate is 50 sccm, the deposition rate is 50 mm / min, and the number of deposition layers is 3 layers; the stress layer deposition 2 temperature is 1800 ° C, SiO 2 Flow: 250sccm, GeCl 4 Flow: 60sccm, BCl 3 Flow rate: 900sccm, deposition rate is 40mm / min; the deposition temperature of the pure silicon cladding 1 is 2100°C, SiCl 4 The depositio...
Embodiment 3
[0060] A method for preparing an erbium-doped polarization-maintaining optical fiber, comprising the steps of:
[0061] (1) Pretreatment of the substrate tube to preheat the substrate tube and effectively eliminate impurities and air bubbles on the inner wall of the substrate tube. The preheating temperature: 1000°C, and the preheating time: 10 minutes;
[0062] (2) Carry out in-tube deposition. The deposition process is followed by pure silicon cladding deposition, stress layer deposition, and pure silicon cladding deposition, wherein the deposition temperature of the pure silicon cladding 1 is 2200°C, SiCl 4 The deposition flow rate is 300sccm, the deposition rate is 100mm / min, and the number of deposition layers is 5 layers; the stress layer deposition 2 temperature is 1900°C, SiO 2 Flow: 300sccm, GeCl 4 Flow: 100sccm, BCl 3 Flow rate: 1000sccm, deposition rate is 60mm / min; the deposition temperature of the pure silicon cladding layer 1 is 2200°C, SiCl 4 The deposition f...
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