Chemical deposition method and device for high-purity low-hydroxyl high-uniformity quartz glass

A technology of quartz glass and chemical deposition, which is applied in glass molding, glass manufacturing equipment, manufacturing tools, etc., can solve the problems of poor uniformity and high hydroxyl content, and achieve high production efficiency, reduced impurity content, and high deposition efficiency.

Pending Publication Date: 2021-06-01
江苏亨芯石英科技有限公司 +1
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Problems solved by technology

[0007] For this reason, the technical problem to be solved by the present invention is to overcome the problems of high hydroxyl content and poor uniformity in the CVD process, and provide a chemical deposition method for quartz glass with high purity, low hydroxyl and high uniformity. The content of metal impurities in quartz glass is extremely low

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  • Chemical deposition method and device for high-purity low-hydroxyl high-uniformity quartz glass
  • Chemical deposition method and device for high-purity low-hydroxyl high-uniformity quartz glass
  • Chemical deposition method and device for high-purity low-hydroxyl high-uniformity quartz glass

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[0033] The present invention will be further described below in conjunction with specific examples, so that those skilled in the art can better understand the present invention and implement it, but the given examples are not intended to limit the present invention.

[0034] See figure 1 , the present invention provides a method for depositing high-purity, low-hydroxyl, and high-uniformity quartz glass, including low-density SiO 2 There are three main processes of deposition, sintering and fine annealing of the loose body 12, that is, the vapor phase axial deposition process (VAD) is used to first deposit and form low-density SiO 2 The loose body 12 is then sintered; the sintering process is dehydrated, dehydroxylated, degassed and densified until vitrification is achieved; after the sintering is completed, the obtained quartz glass is subjected to fine annealing to fully release the stress inside the quartz glass to ensure its Uniformity, finally obtain the finished product ...

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Abstract

The invention relates to a chemical deposition method of high-purity low-hydroxyl high-uniformity quartz glass, which comprises the following steps: (1) depositing a silicon source in a deposition cavity by adopting a vapor phase axial deposition method to obtain a low-density SiO2 loose body; wherein in the deposition process, the interior of the deposition cavity is controlled to be in a negative pressure environment, and the temperature is not higher than 500 DEG C; (2) in a closed environment filled with dehydroxylation airflow and oxygen, heating the low-density SiO2 loose body to 1100-1300 DEG C, so that the low-density SiO2 loose body is dehydrated, dehydroxylated and densified; then, placing the low-density SiO2 loose body in an inert gas environment, heating to 1470-1600 DEG C, and vitrifying the low-density SiO2 loose body to form transparent quartz glass; and (3) annealing the transparent quartz glass to obtain the high-purity low-hydroxyl high-uniformity quartz glass. The invention further discloses a device adopting the chemical deposition process. According to the chemical deposition method of the high-purity low-hydroxyl high-uniformity quartz glass, the production process is high in continuity, and the content of metal impurities in the produced quartz glass is extremely low.

Description

technical field [0001] The invention relates to the technical field of quartz preparation, in particular to a chemical deposition method of high-purity, low-hydroxyl and high-uniformity quartz glass and a corresponding device. Background technique [0002] Quartz glass is a special glass composed of a single component of silicon dioxide. It has a series of special physical and chemical properties, and is known as the "King of Glass" by experts in the field of new materials. It has high temperature resistance, low expansion coefficient, and It has a series of advantages such as good thermal shock resistance, stable chemical properties and excellent electrical insulation properties, and excellent optical properties, with a transmittance of more than 84% in the full spectrum range. [0003] Quartz glass has become an indispensable and important material in modern science and technology and modern industry. It is widely used in high-tech fields such as aerospace, laser nuclear t...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03B20/00C03B8/04
CPCC03B20/00
Inventor 杨金鑫肖华郑勇钟嫒吴龙波李凯翟国华巫维捷刘宝任其广
Owner 江苏亨芯石英科技有限公司
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