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Ultraviolet lithography method for patterning and etching PEDOT:PSS transparent electrode on flexible hydrophobic group substrate

A transparent electrode and hydrophobic base technology, which is applied in the field of ultraviolet lithography, can solve problems such as difficult pattern etching, and achieve the effects of increasing adhesion, increasing adhesion stability, and increasing stability

Active Publication Date: 2021-06-29
HARBIN INST OF TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The purpose of the present invention is to solve the problem that it is difficult to achieve a good patterned etching when spin-coating a water-based solution on a flexible hydrophobic-based substrate, and to provide a patterned etched PEDOT:PSS transparent electrode on a flexible hydrophobic-based substrate UV lithography method

Method used

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  • Ultraviolet lithography method for patterning and etching PEDOT:PSS transparent electrode on flexible hydrophobic group substrate
  • Ultraviolet lithography method for patterning and etching PEDOT:PSS transparent electrode on flexible hydrophobic group substrate
  • Ultraviolet lithography method for patterning and etching PEDOT:PSS transparent electrode on flexible hydrophobic group substrate

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specific Embodiment approach 1

[0023] DETAILED DESCRIPTION OF THE INVENTION First: The present embodiment is patterned on a flexible hydrophobic substrate: an ultraviolet photolithography method of PSS transparent electrodes, and is completed in the following steps: 1. Coating polyaltritis on the cleaned substrate Impromine, after drying, animalized substrate;

[0024] Second, in the imidized substrate, the photoresist, dry, repeat the rubber, drying step, to obtain a photoresist layer; the rotation speed of the hierarchy machine is 1000 rpm-3000 rpm, the spin coating time is 30s -60S;

[0025] Third, using an ultraviolet exciithography, a mask is exposed to the photoresist, and then develops a substrate with a preset pattern photoresist layer after drying;

[0026] Fourth, use a homogenate in the photoresist layer with a preset pattern, a solution of PSS, heating, drying, drying temperature is 50 ° C to 70 ° C, time is 60s-180s; then placed in organic Soak and oscillated in the solvent, ultrasonic cleaning, an...

specific Embodiment approach 2

[0027] DETAILED DESCRIPTION OF THE INVENTION Different: The present embodiment differs from the specific embodiment that the hierarchical rotation speed is 1000 rpm to 5000 rpm, and the spin coating time is 30 s-60s. Others are the same as those of the specific embodiments.

specific Embodiment approach 3

[0028] BEST MODE FOR CARRYING OUT THE INVENTION The present embodiment is different from that of the particular embodiment: the solid content of the polyimide solution is 20% and the viscosity is 5000-6000 cp. Others are the same as those of the specific embodiments.

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Abstract

The invention relates to an ultraviolet lithography method for patterning and etching a PEDOT:PSS transparent electrode on a flexible hydrophobic group substrate. The invention aims to solve the problem that in the prior art, when a water-based solution is spin-coated on a flexible hydrophobic group substrate, good patterning and etching is difficult to achieve. The ultraviolet lithography method comprises the steps of: spin-coating polyimide on the cleaned substrate, spin-coating photoresist after curing, and drying to obtain a photoresist layer; patterning the photoresist layer by exposure of an ultraviolet lithography machine, and drying to obtain a substrate with a photoresist layer with a preset pattern; and depositing a PEDOT:PSS film on the substrate with the preset patterned photoresist layer by a spin-coating method, soaking the PEDOT:PSS film in an organic solvent, carrying out ultrasonic cleaning, and carrying out nitrogen blow-drying. The ultraviolet lithography method is applied to the field of organic film electrode processing etching and application research.

Description

Technical field [0001] The present invention relates to an ultraviolet photolithography method of pattern etching PEDOT: PSS transparent electrode on a flexible hydrophobic substrate. Background technique [0002] With the rapid consumption of traditional energy such as coal, oil, in order to prevent the use of resources, the use of new energy, such as solar cells, etc., as an important green industry. Among them, a new transparent electrode PEDOT: PSS film and a patterning etching treatment of the film and the film are the technical foundation for the deep development of the battery and the wide application of the film. In addition, the development of current civil display technology has put forward higher requirements for wearable devices, flexible display, etc., which urgently requires new flexible electrodes and patterned etching techniques for flexible substrate electrodes. The flexible substrate is mostly organic highlier, strong hydrophobic, and new transparent electrode P...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18H01B13/00G03F7/20
CPCH01L31/1888H01B13/00G03F7/2002Y02E10/549
Inventor 田浩李帅谭鹏孟祥达
Owner HARBIN INST OF TECH
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