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Preparation method of anti-opal secondary structure imitating butterfly compound eyes with high transmission and anti-reflection film

A technology of anti-opal and secondary structure, which is applied to the surface coating liquid devices, instruments, optical components, etc., and can solve the problem of high reflectivity of battery panels

Active Publication Date: 2022-05-24
JILIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the prior art, the reflectivity of transparent parts such as battery panels and lenses is relatively high

Method used

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  • Preparation method of anti-opal secondary structure imitating butterfly compound eyes with high transmission and anti-reflection film
  • Preparation method of anti-opal secondary structure imitating butterfly compound eyes with high transmission and anti-reflection film
  • Preparation method of anti-opal secondary structure imitating butterfly compound eyes with high transmission and anti-reflection film

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preparation example Construction

[0039] like figure 2 and Figure 5 As shown, a preparation method of a butterfly-like compound eye inverse opal secondary structure high-transparency and anti-reflection film of the present invention comprises the following steps:

[0040] Step S100, providing a substrate.

[0041] Specifically, the substrate can be a transparent substrate, or any substrate that needs to increase light transmission and reduce reflection. For example, a silicon-based substrate or a glass substrate is used as the substrate. When a silicon-based substrate is used, it can be applied to silicon-based thin-film solar cells, and more Much of the light passes through the film to reach the solar cell and convert it into electricity. In the embodiment of the present invention, in order to increase the transmittance of the substrate and reduce the reflectivity of the substrate, any other substrate that needs to increase the transmittance and reduce the reflectivity can use the method of the present in...

specific Embodiment 1

[0084] 1. The microspheres are dissolved in a mixed solution of ethanol and water. The microspheres are selected from silica spheres with a radius of 3-4 microns. The ratio of microspheres, ethanol and water = 0.05:35:5, spin coating Speed ​​110 rpm, spin coating for 1 minute, acceleration time 10 seconds, deceleration time 10 seconds, place in ventilated place for 9 minutes, spin again after evaporating the solvent, repeat 4 times.

[0085] 2. Configure a film-forming solution, and the solution is cured to form a film. The film-forming solution is epoxy resin. The film-forming solution is an epoxy resin solution, the mass ratio of the main agent and the curing agent is 3:1, the spin coating speed is 800 rpm, the spin coating is 1 minute, including the acceleration time of 10 seconds, the deceleration time of 10 seconds, and the curing temperature. 85 ℃, curing time of 6 hours, curing in a blast drying oven.

[0086]3. Configure the dissolving solution, the ratio of acetone,...

specific Embodiment 2

[0088] 1. The microspheres are dissolved in a mixed solution of ethanol and water. The microspheres are selected from polystyrene spheres with a radius of 3-4 microns. The ratio of microspheres, ethanol and water = 0.05:36:6, spin coating Speed ​​120 rpm, spin coating for one minute, acceleration time 10 seconds, deceleration time 10 seconds, place in ventilated place for 10 minutes, evaporate solvent and spin again, repeat 5 times.

[0089] 2. Configure a film-forming solution, and the solution is cured to form a film. The film-forming solution is polydimethylsiloxane, the ratio of the main agent and the curing agent is 11:1, the spin coating speed is 900 rpm, and the spin coating is one minute, including the acceleration time of 10 seconds, the deceleration time of 10 seconds, and the curing temperature. 80 ℃, curing time 120 minutes, curing in a blast drying oven.

[0090] 3. Configure the dissolving solution, the ratio of acetone, ethyl acetate and butyl acetate is 6:4:1,...

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Abstract

The invention discloses a method for preparing a high-transparency and anti-reflection film imitating butterfly compound eyes and anti-opal secondary structure. The method includes the steps of: providing a substrate; depositing at least one layer of micron spheres on the substrate; forming a film on the ball to fix the microsphere; removing the film layer on the side of the first layer of the microsphere away from the substrate; making a nanopillar array on the side of the first layer of the microsphere away from the substrate, The high transmission and anti-reflection film with anti-opal secondary structure imitating butterfly compound eyes is obtained. Deposit microspheres on the substrate, and form a nanocolumn array on the first layer of microspheres to obtain a high-transparency and anti-reflection film with a secondary structure imitating butterfly compound eyes. The raised microspheres can suppress the specular reflection of the surface, and the microspheres can Produces a gradient refractive index effect to achieve an anti-reflection effect on light.

Description

technical field [0001] The invention relates to the technical field of films, in particular to a preparation method of a butterfly-like compound eye inverse opal secondary structure high transmittance and antireflection film. Background technique [0002] In production and life, sunlight has been studied and utilized as a kind of renewable energy. Sunlight was an important lighting tool in ancient times and even in modern times. It has been a rule since ancient times. However, due to the existence of the propagation medium, light will be reflected and refracted when passing through different media. The existence of reflected light reduces the intensity of light, which is not conducive to the utilization and absorption of light. For the surface of solar cells, the reflection of sunlight on the surface reduces the absorption of light and the conversion efficiency of solar panels; on the surface of the optical lens of high-precision instruments, the reflection of light on the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B05D5/06B05D1/00B05D3/06B05D3/02B05D7/24B05D1/36C09D163/00C09D183/04G02B1/118
CPCB05D5/063B05D1/005B05D3/067B05D3/0254B05D7/24B05D7/54C09D163/00C09D183/04G02B1/118
Inventor 牛士超丁汉良韩志武李博王泽薛浩周亮孟宪存张俊秋陈友迟德强刘德雷
Owner JILIN UNIV
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