Adhesive for sealing semiconductor
A semiconductor and glue-using technology, which is applied in the field of semiconductor sealing adhesives, can solve the problems of low viscosity and achieve moderate thixotropic index, good packaging effect and low viscosity
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Embodiment 1
[0033] The adhesive for semiconductor sealing in this embodiment is formed by mixing component A and component B with a mass ratio of 1.2:1;
[0034] Component A includes the following raw materials: 68 parts of epoxy resin, 12 parts of thixotropic agent, 2 parts of toughening agent, 5 parts of inorganic filler, and 2 parts of auxiliary agent;
[0035] Component B includes the following raw materials: 45 parts of curing agent and 0.1 part of curing accelerator.
[0036] Wherein, the epoxy resin is composed of bisphenol A type epoxy resin, alicyclic epoxy resin and polyaromatic ring structure epoxy resin with a mass ratio of 1:1:0.5. The thixotropic agent is fumed silica with a particle size of 10 μm. The toughening agent is a mixture of glycol and hydroxyl polybutadiene with a mass ratio of 1:1.2. The inorganic filler is graphite carbon black. The curing agent is a mixture of organosilicon-modified anhydrides and anhydrides with a mass ratio of 1:5. The acid anhydride comp...
Embodiment 2
[0044] The adhesive for semiconductor sealing in this embodiment is formed by mixing component A and component B with a mass ratio of 0.8:1;
[0045] Component A includes the following raw materials: 60 parts of epoxy resin, 10 parts of thixotropic agent, 1 part of toughening agent, 8 parts of inorganic filler, and 1 part of auxiliary agent;
[0046] Component B includes the following raw materials: 40 parts of curing agent and 0.6 parts of curing accelerator.
[0047] Wherein, the epoxy resin is composed of bisphenol A type epoxy resin, alicyclic epoxy resin and polyaromatic ring structure epoxy resin with a mass ratio of 1:2:0.8. The thixotropic agent is fumed silica with a particle size of 7 μm. The toughening agent is a mixture of glycol and hydroxyl polybutadiene with a mass ratio of 1:1. The inorganic filler is graphite carbon black. The curing agent is a mixture of organosilicon-modified anhydrides and anhydrides with a mass ratio of 1:6. Silicone-modified acid anhydr...
Embodiment 3
[0050] The adhesive for semiconductor sealing in this embodiment is formed by mixing component A and component B with a mass ratio of 1:1;
[0051] Component A includes the following raw materials: 76 parts of epoxy resin, 20 parts of thixotropic agent, 2 parts of toughening agent, 10 parts of inorganic filler, and 10 parts of auxiliary agent;
[0052] Component B includes the following raw materials: 52 parts of curing agent and 1.6 parts of curing accelerator.
[0053] Wherein, the epoxy resin is composed of bisphenol A type epoxy resin, alicyclic epoxy resin and polyaromatic ring structure epoxy resin with a mass ratio of 1:0.8:1.4. The thixotropic agent is fumed silica with a particle size of 12 μm. The toughening agent is a mixture of glycol and hydroxyl polybutadiene with a mass ratio of 1:1.5. The inorganic filler is graphite carbon black. The curing agent is a mixture of organosilicon-modified anhydrides and anhydrides with a mass ratio of 1:9. Silicone-modified ac...
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