A kind of ultraviolet light-emitting diode with p-i-n type multi-quantum well structure

A multi-quantum well structure, p-i-n technology, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of reducing the number of holes, suppressing the light output capability of UV-LED, and lowering the activation efficiency of p-type impurities.

Active Publication Date: 2022-06-24
SOUTHEAST UNIV
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Problems solved by technology

The polarized electric field will cause the conduction band and valence band edge of the quantum well in the UV-LED to be tilted, so that the wave functions of electrons and holes are separated in space, resulting in a reduction in the probability of radiative recombination of electrons and holes, seriously Affect the internal quantum efficiency or luminous efficiency of UV-LED devices
[0003] In addition, when the Al composition of the p-type AlGaN layer of AlGaN-based UV-LEDs increases, the activation efficiency of p-type impurities (such as Mg) becomes low, which reduces the number of holes injected into the active region, and finally inhibits the UV- LED Light Output Capability

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  • A kind of ultraviolet light-emitting diode with p-i-n type multi-quantum well structure
  • A kind of ultraviolet light-emitting diode with p-i-n type multi-quantum well structure
  • A kind of ultraviolet light-emitting diode with p-i-n type multi-quantum well structure

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Embodiment Construction

[0018] The present invention will be further explained below in conjunction with the accompanying drawings.

[0019] like figure 1 As shown, a UV-LED with a p-i-n type multi-quantum well structure of the present invention, a substrate 101, an AlN buffer layer 102, an n-type AlGaN layer 103, and a p-i-n type multi-quantum well active region 104 are sequentially arranged from bottom to top , an electron blocking layer 105, a p-type AlGaN layer 106, a p-type GaN ohmic contact layer 107, and an n-type electrode 108 arranged on the n-type AlGaN layer 103 and a p-type electrode 109 arranged on the p-type GaN ohmic contact layer 107 .

[0020] The quantum barriers in the p-i-n type multi-quantum well active region 104 are, from bottom to top, n-type doped quantum barriers with different doping concentrations, undoped i-type quantum barriers, and p-type doped quantum barriers with different doping concentrations. Quantum barriers, that is, from bottom to top quantum barriers are di...

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Abstract

The invention discloses an ultraviolet light-emitting diode with a p-i-n type multi-quantum well structure, which is sequentially arranged with a substrate, an AlN buffer layer, an n-type AlGaN layer, and a p-i-n type multi-quantum well Active region, electron blocking layer, p-type AlGaN layer, p-type GaN ohmic contact layer, n-type electrode arranged on n-type AlGaN layer, and p-type electrode arranged on p-type GaN ohmic contact layer. The ultraviolet light-emitting diode with p-i-n type multi-quantum well structure provided by the present invention can improve carrier concentration and injection efficiency, and can utilize the concentration difference of carriers in adjacent regions with different doping concentrations to form a The electric field with the opposite direction of the original built-in electric field can weaken the original built-in electric field between the p-type region and the n-type region, and reduce the quantum confinement Stark effect caused by the built-in polarization electric field, so that electrons and holes The radiative recombination efficiency is improved, and the luminous power of the ultraviolet light-emitting diode is enhanced.

Description

technical field [0001] The invention relates to the manufacturing field of semiconductor optoelectronic materials and devices, in particular to an ultraviolet light emitting diode with a p-i-n type multi-quantum well structure. Background technique [0002] AlGaN-based ultraviolet light-emitting diodes (UV-LEDs) have the advantages of low energy consumption, environmental friendliness, and adjustable emission wavelengths, and can be widely used in printing ink curing, high-density data information storage, sterilization, healthcare, water and air purification and other fields. Due to the lack of GaN or AlN homogeneous substrates, AlGaN-based UV-LEDs usually use heterogeneous substrates, such as sapphire, silicon carbide, silicon and other substrates for growth. However, due to the large lattice mismatch between the heterogeneous substrate and the polar c-plane sapphire and other heterogeneous substrates, there are strong spontaneous polarization and piezoelectric The polar...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L33/00H01L33/06H01L33/32
CPCH01L33/0012H01L33/06H01L33/32
Inventor 张雄房瑞庭胡国华崔一平
Owner SOUTHEAST UNIV
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