Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

213nm ultraviolet light output method and system

A 213nm, output method technology, applied in the laser field, can solve the problems of low efficiency and inconvenient adjustment of system devices, and achieve the effects of high efficiency, increased damage risk, and small absorption

Active Publication Date: 2021-08-13
RAINBOW SOURCE LASER RSLASER
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The embodiment of the present invention provides a universal motion 213nm ultraviolet light output method and method to solve the problems of low efficiency and inconvenient adjustment of the generation system device in the existing 213nm laser generation method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • 213nm ultraviolet light output method and system
  • 213nm ultraviolet light output method and system
  • 213nm ultraviolet light output method and system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0040] In the following description, for the purpose of illustration rather than limitation, specific details such as specific structures and techniques are set forth in order to provide a thorough understanding of the embodiments provided by the present invention. It will be apparent, however, to one skilled in the art that the invention may be practiced in other embodiments without these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the present invention with unnecessary detail.

[0041] figure 1 It shows a schematic diagram of the implementation flow of the output method of 213nm ultraviolet light provided by the application, including the following steps, corresponding devices such as figure 2 Shown:

[0042] Step S11: Control the laser to generate 1064nm fundamental frequency laser pulses, and the 1064nm laser pulses pass through the frequency doublin...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the technical field of laser, and provides a 213nm ultraviolet light output method and system. The method comprises the steps of controlling a laser to generate a laser pulse, enabling the laser pulse to generate 532nm frequency-doubled light after passing through a frequency doubling crystal, and enabling the 532nm frequency-doubled light and residual 1064nm fundamental frequency light to generate 266nm laser pulse after passing through a quadruplicated frequency crystal, and enabling the 266nm laser pulse and the residual 1064nm fundamental frequency light to be irradiated to a frequency quintupled crystal so as to generate 213nm ultraviolet light. According to the method provided by the invention, the problem that polarization needs to be converted in the process of generating the 213nm laser pulse by performing sum frequency on the frequency doubled light and the frequency tripled light can be avoided.

Description

technical field [0001] The invention relates to the field of laser technology, in particular to a method and system for outputting 213nm ultraviolet light. Background technique [0002] Ultraviolet wavelength light sources are widely used in the manufacture of semiconductor integrated circuits, and the shorter the wavelength of the light source, the higher the integration level of integrated circuits that can be supported. As the integration of semiconductor chips becomes higher and higher, the characteristic line width of plate making becomes thinner and thinner, and the wavelength of the photolithography light source required becomes shorter and shorter. [0003] At present, ArF excimer lasers are mainly used as photolithography light sources in industrial production, although ArF excimer lasers can output a deep ultraviolet wavelength of 193nm. However, the working medium of excimer laser is toxic gas, which will pollute the environment and endanger personal safety, and ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01S3/109H01S3/11
CPCH01S3/109H01S3/11
Inventor 王家赞江锐储玉喜张旭东范元媛沙鹏飞
Owner RAINBOW SOURCE LASER RSLASER
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com