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Cobalt chrome etching process

An etching, cobalt-chromium alloy technology, applied in the field of controlled etching compositions, can solve problems such as intergranular erosion of CoCr materials

Active Publication Date: 2021-09-07
MAT TECH BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These methods are only suitable for surface removal of material as the mixture is volatile and rapidly depleted and is subject to aggressive metal ion driven decomposition of peroxides
Furthermore, such solutions often lead to significant intergranular attack (IGA) of CoCr materials

Method used

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  • Cobalt chrome etching process
  • Cobalt chrome etching process
  • Cobalt chrome etching process

Examples

Experimental program
Comparison scheme
Effect test

no. 1 approach

[0046] Thus, according to the first disclosed embodiment of the present invention, the chemical etching composition may comprise at least two mineral acids, iron, and low to moderate concentrations of certain constituent metals of the alloy to be etched. For example, when the alloy to be etched is a cobalt-chromium-molybdenum alloy, the composition may contain any two or more inorganic acids listed herein, and 50-225 g / l iron (Fe), 1-10 g / l chromium ( Cr), 0.1 - 5 g / l molybdenum (Mo) and optionally cobalt (Co), eg 0 to 10 g / l cobalt (Co).

[0047] According to certain other aspects of the first embodiment, the chemical etching composition comprises at least 50 g / l iron (Fe), or at least 70 g / l, or at least 90 g / l, or at least 110 g / l, or at least 130 g / l, or At least 150 g / l, or at least 170 g / l, or at least 200 g / l. According to certain other aspects, the chemical etching composition comprises at most 225 g / l iron (Fe), such as at most 200 g / l, or at most 160 g / l, or at most...

no. 2 approach

[0051] According to a second embodiment of the present disclosure, the chemical etching composition may comprise at least two mineral acids and a high concentration of certain constituent metals of the alloy to be etched. For example, when the alloy to be etched is a cobalt-chromium-molybdenum alloy, the composition may contain any two or more of the mineral acids listed herein, and 7-355 g / l cobalt (Co), about 3-170 g / l chromium (Cr), and about 1–40 g / l molybdenum (Mo). The composition may be substantially free of iron or completely free of iron.

[0052]According to certain other aspects of the second embodiment, the chemical etching composition comprises at least 3 g / l chromium (Cr), or at least 10 g / l, or at least 20 g / l, or at least 30 g / l, or at least 40 g / l, or At least 50 g / l, or at least 70 g / l, or at least 90 g / l, or at least 110 g / l, or at least 130 g / l, or at least 150 g / l. According to certain other aspects, the chemical etching composition comprises at most 170...

Embodiment

[0103] The following examples provide formulations that can be used to etch various cobalt chromium alloys. The alloy material was activated prior to each chemical etching step listed in these examples. Exemplary activation steps that form part of the disclosed methods include exposing the alloy material to a mineral acid immediately prior to exposure to the chemical etching composition, such as immersing or spraying the alloy material with a mineral acid immediately prior to exposure to the chemical etching composition disclosed herein . For example, a workpiece can be dipped or sprayed with a 10% to 100% (v / v) aqueous solution of hydrochloric acid and exposed within a few minutes (e.g., less than 120 seconds, or even less than 30 seconds) to one of the chemical etching solutions, such as Details are given in Examples I-III below. While it is specifically stated herein that the activation solution comprises hydrochloric acid, other inorganic acids or mixtures thereof will p...

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Abstract

Compositions and methods for etching cobalt chromium alloys are disclosed. The compositions generally include at least two mineral acids, certain component metals of the alloy to be etched, and optionally iron (Fe). For example, when etching a cobalt chromium molybdenum alloy, the metals may include chromium (Cr), molybdenum (Mo), and optionally, cobalt (Co). The at least two mineral acids may include hydrochloric acid (HCl), nitric acid (HNO3), and hydrofluoric acid (HF). The methods provide for etching an entire surface of a substrate or etching a surface of a substrate in a pattern using selective coating patterns and / or coating removal. Thus, unlimited patterns, as well as etch depths and variations in etch depths are achievable using the compositions and methods disclosed.

Description

[0001] related application [0002] This application claims priority to U.S. Provisional Patent Application No. 62 / 779,545, filed December 14, 2018, and U.S. Provisional Patent Application No. 62 / 892,744, filed August 28, 2019, both of which are incorporated by reference in their entirety Incorporated into this article. technical field [0003] The present invention generally relates to compositions for controlled etching of cobalt chromium based alloys and methods for etching cobalt chromium. Background technique [0004] Cobalt-chrome, commonly known as Cobalt-Chrome (CoCr), is generally corrosion-resistant and extremely hard. These outstanding properties result from the crystalline nature of cobalt, the strengthening effect of chromium and other alloying elements, the formation of extremely hard carbides, and the corrosion resistance imparted by chromium. These properties make CoCr alloys ideal in industrial, medical and technical fields. It also makes the alloy very d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25F3/02H01L31/0224
CPCC23F1/26C23F1/28C23F1/02C09K13/08C23F1/04C09K13/12
Inventor 迈克尔·维德拉丹尼尔·乔恩·舒策
Owner MAT TECH BV
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