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Cleaning method of solar cell

A technology for solar cells and cleaning fluids, applied in the direction of cleaning methods using liquids, cleaning methods and utensils, chemical instruments and methods, etc., can solve the problems of low solar cell preparation efficiency, save preparation time, reduce quantity, and reduce preparation Process effect

Pending Publication Date: 2021-09-28
ANHUI HUASUN ENERGY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Therefore, the technical problem to be solved by the present invention is to overcome the problem of low production efficiency of solar cells in the prior art, thereby providing a cleaning method for solar cells

Method used

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  • Cleaning method of solar cell
  • Cleaning method of solar cell
  • Cleaning method of solar cell

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0044] Please refer to figure 2 , in the present embodiment, the cleaning method of solar cell, comprises the following steps:

[0045] Step A1: providing a semiconductor substrate layer.

[0046] In this embodiment, the semiconductor substrate layer includes an N-type silicon substrate, specifically, the semiconductor substrate layer is an N-type single crystal silicon substrate.

[0047] Step A2: Perform pretreatment on the semiconductor substrate layer, the pretreatment includes precleaning, removing the damaged layer and first oxidative cleaning.

[0048] Step A21: pre-cleaning the semiconductor substrate layer to remove impurities on the surface of the semiconductor substrate layer.

[0049] Through pre-cleaning, organic matter and metal impurity pollutants on the surface of the semiconductor substrate layer are removed.

[0050] Step A22: removing the damaged layer on the surface of the semiconductor substrate layer.

[0051] Since a damaged layer is formed on the s...

Embodiment 2

[0077] In this embodiment, before performing the slow pulling cleaning process, the surface of the semiconductor substrate layer is cleaned with an acidic cleaning solution.

[0078] Specifically, please refer to image 3 , in other embodiments, the cleaning method of solar cell, comprises the steps:

[0079] Step B1: providing a semiconductor substrate layer.

[0080] In this embodiment, the semiconductor substrate layer includes an N-type silicon substrate, specifically, the semiconductor substrate layer is an N-type single crystal silicon substrate.

[0081] Before the surface of the semiconductor substrate layer is subjected to the texturing treatment, the semiconductor substrate layer is pre-cleaned, the damaged layer is removed and the first oxidative cleaning process is carried out referring to the aforementioned content.

[0082] Step B2: performing texturing treatment on the surface of the semiconductor substrate layer.

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Abstract

The invention belongs to the technical field of solar cell manufacturing, and provides a cleaning method of a solar cell. The cleaning method comprises the following steps that: the surface of a semiconductor substrate layer is texturized; and cleaning treatment is performed on the texturized surface of the semiconductor substrate layer. The cleaning treatment further comprises the steps that: a cleaning tank is provided, volatile cleaning liquid is contained in the cleaning tank, and the volatile cleaning liquid comprises volatile cleaning substances; and the surface of the semiconductor substrate layer is cleaned in the cleaning tank by adopting a slow lifting cleaning process. The volatile cleaning liquid left on the surface of the semiconductor substrate layer is quickly volatilized into the environment by adopting the slow lifting cleaning process and the volatile cleaning liquid; the surface of the semiconductor substrate layer is relatively dry, so that processes such as pre-dehydration and drying are not needed to be performed on the semiconductor substrate layer, the cleanliness of the surface of the semiconductor substrate layer is relatively high, meanwhile, the preparation process of the solar cell is reduced, the preparation time of the solar cell is saved, and the productivity and the preparation efficiency are improved.

Description

technical field [0001] The invention belongs to the technical field of solar cell manufacturing, and in particular relates to a cleaning method for a solar cell. Background technique [0002] During the texturing process of solar cells, it is inevitable that organic or metal impurities will be introduced. These organic or metal impurities will diffuse into the silicon wafer and form a recombination center, which will affect the open circuit voltage Voc and short circuit current Isc of the solar cell, and ultimately affect the photoelectricity of the solar cell. affect the conversion efficiency. In the preparation process of solar cells, silicon wafers need to be cleaned after texturing to remove pollutants on the silicon wafers after texturing, and prepare for the next step of chemical vapor deposition (Chemical Vapor Deposition, CVD) amorphous silicon. Good high cleanliness surface. [0003] The cleaning method after traditional solar cell texturing usually needs to go th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/02H01L31/18B08B3/08
CPCH01L21/02057H01L31/1804B08B3/08Y02P70/50Y02E10/547
Inventor 周肃符欣陈光羽徐晓华王文静龚道仁杨龙程尚之
Owner ANHUI HUASUN ENERGY CO LTD