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Production method of 5N selenium

A production method and product technology, which are applied in the production field of 5N selenium, can solve the problems of difficult product quality control, environmental pollution, and high production costs, and achieve the effects of simple and easy operation, reduced contamination, and low investment.

Inactive Publication Date: 2021-10-01
江西中晶新材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] At present, the purification methods of selenium mainly include distillation sublimation method, hydrogen selenide thermal decomposition method, chemical method (or ion exchange method) and sulfite circulation method. These methods all have environmental pollution, and the production capacity is small, and the product quality is difficult to control. Defects with high production costs

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  • Production method of 5N selenium
  • Production method of 5N selenium
  • Production method of 5N selenium

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0056] The production method of present embodiment 5N selenium comprises the following steps:

[0057] (1) The 4N selenium raw material is crushed into 4N selenium particles with a particle size not greater than 7.5mm, and the 4N selenium particles after the crushing are cleaned with dilute hydrochloric acid with a mass fraction of 1%. The cleaning time is 10min to remove the 4N selenium particles on the surface The oxidation slag is rinsed with water after cleaning, until it is neutrally dried. The drying temperature is 220°C, and the drying time is 2 hours, so as to remove some low-boiling impurities in the 4N selenium particles.

[0058] (2) Soak the rectification raw material kettle and utensils with mixed acid (the mass ratio of concentrated hydrochloric acid and concentrated nitric acid is 1.5:1) for 10 minutes, wash with deionized water after soaking, and dry after washing. Add the 4N selenium particles treated in step (1) into the rectification raw material kettle, cov...

Embodiment 2

[0062] The production method of present embodiment 5N selenium comprises the following steps:

[0063] (1) The 4N selenium raw material is crushed into 4N selenium particles with a particle size not greater than 7.5mm, and the 4N selenium particles after the crushing are cleaned with 1.5% dilute hydrochloric acid for a cleaning time of 8 minutes to remove the 4N selenium particles on the surface The oxidation slag is rinsed with water after cleaning, until it is neutrally dried, the drying temperature is 250°C, and the drying time is 1.5h, so as to remove some low-boiling impurities in the 4N selenium particles.

[0064] (2) Soak the rectification raw material kettle and utensils with mixed acid (the mass ratio of concentrated hydrochloric acid and concentrated nitric acid is 1.7:1) for 10 minutes, wash with deionized water after soaking, and dry after washing. Add the 4N selenium particles treated in step (1) into the rectification raw material kettle, cover the charging plug...

Embodiment 3

[0068] The production method of present embodiment 5N selenium comprises the following steps:

[0069] (1) The 4N selenium raw material is crushed into 4N selenium particles with a particle size not greater than 7.5mm, and the 4N selenium particles after the crushing are cleaned with 2.5% dilute hydrochloric acid for a cleaning time of 12 minutes to remove the 4N selenium particles on the surface of the 4N selenium particles. The oxidation slag is rinsed with water after cleaning, until it is neutrally dried, the drying temperature is 300°C, and the drying time is 1h, so as to remove some low-boiling impurities in the 4N selenium particles.

[0070] (2) Soak the rectification raw material kettle and utensils with mixed acid (the mass ratio of concentrated hydrochloric acid and concentrated nitric acid is 1.3:1) for 10 minutes, wash with deionized water after soaking, and dry after washing. Add the 4N selenium particles treated in step (1) into the rectification raw material ke...

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Abstract

The invention provides a 5N selenium production method, which comprises: S1, crushing a 4N selenium raw material into 4N selenium particles, pre-treating the 4N selenium particles, and removing impurities in the 4N selenium particles; and S2, carrying out gas-phase normal-pressure rectification on the pretreated 4N selenium particles, and cooling the rectified product to obtain 5N selenium. According to the production method, high-purity 5N selenium can be obtained, and the production method is efficient, environmentally friendly, low in investment and capable of saving energy. Meanwhile, compared with gas-phase vacuum rectification, the production method of the 5N selenium disclosed by the invention adopts gas-phase normal-pressure rectification. The process is simpler and easier to operate, can directly produce the 5N selenium particles, reduces contamination of the granulation process, and is suitable for producing a large number of 5N selenium particles.

Description

technical field [0001] The invention belongs to the technical field of selenium production, and in particular relates to a production method of 5N selenium. Background technique [0002] Selenium is a VIA group (oxygen group) element in the periodic table of elements. Selenium exists in the form of compounds in nature and is widely used in sulfide minerals. 5N selenium means that the content of selenium in the selenium product is more than 99.999%, that is, the sum of other impurity elements in the product is less than 10ppm. In recent years, high-purity selenium (5N selenium) has been applied in the field of semiconductors. As one of the main raw materials of compound semiconductors, its application fields are relatively wide and the market prospect is broad. [0003] At present, the purification methods of selenium mainly include distillation sublimation method, hydrogen selenide thermal decomposition method, chemical method (or ion exchange method) and sulfite circulatio...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B19/02
CPCC01B19/02C01P2006/80
Inventor 詹科程平
Owner 江西中晶新材料有限公司
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